Takeshi Bessho

High-Speed Growth of 4H-SiC Single Crystal Using Si-Cr Based Melt

In this study, we have investigated the rate-limiting process of 4H-SiC solution growth using Si-Cr based melt, and have tried high-speed growth. It is revealed that the rate-limiting process of SiC growth under our experimental condition is interface kinetics, which can be controlled by such factors as temperature and supersaturation of carbon. By enhancing the interface kinetics, SiC crystal has been grown at a high rate of 2 mm/h. The FWHM values of X-ray rocking curves and threading dislocation density of the grown crystals are almost the same as those of seed crystal. Possibility of high-speed and high-quality growth of 4H-SiC has been indicated.

Top-Seeded Solution Growth of 4H-SiC Bulk Crystal Using Si-Cr Based Melt

We have grown high-quality long cylindrical (12 mm thick) 4H-SiC bulk crystals by the meniscus formation technique, which was first applied for the solution growth of bulk SiC. It enabled long-term growth by suppressing parasitic reactions such as polycrystal precipitation around the seed crystal. In addition, we could control the growth angle from −22° to 61° by adjusting the meniscus height. The thickness of the grown cylindrical crystals was 12 mm, which is the largest reported until now, and corresponded to a growth rate of 0.6 mm/h. Smooth morphology growth was maintained on the (000-1) C-face. In cross-sectional transmission optical microscopy images, few solvent inclusions and voids were observed. XRD measurements revealed that the FWHM values of the grown crystals were almost the same as those of the seed crystal.

Transmission Electron Microscopy Analysis of a Threading Dislocation with c+a Burgers Vector in 4H-SiC

A threading dislocation (TD) in 4H-SiC, which was interpreted as a right-handed threading screw dislocation (TSD) by synchrotron monochromatic-beam X-ray topography (SMBXT) and molten KOH etching with Na2O2 additive (KN etching), was characterized by large-angle convergent-beam electron diffraction (LACBED) and weak-beam dark-field methods. It was found that this TD was a so-called c+a dislocation with Burgers vector of b=[0001]+(1/3)[2110], which is often misinterpreted as TSD (c-dislocation) by SMBXT and KN etching. The rotation direction of the screw component within the c+a TD determined by LACBED agreed with the SMBXT observation.

Crystallinity Evaluation of 4H-SiC Single Crystal Grown by Solution Growth Technique Using Si-Ti-C Solution

Crystallinity of 4H-SiC bulk crystal obtained by solution growth technique was characterized mainly by KOH etching of the off-ground and serially ground specimen. Marked reduction of basal plane dislocation, threading edge and screw dislocations during the growth of on-axis crystal was confirmed. Cross-sectional TEM observation revealed the rapid reduction behavior of threading dislocations microscopically. AFM observation of as-grown morphology showed that screw dislocation dipoles is related to the reduction of threading screw dislocations and single domain formation, which is essential for establishing the high crystallinity.

Effects of molecular structure on microscopic heat transport in chain polymer liquids

In this paper, we discuss the molecular mechanism of the heat conduction in a liquid, based on nonequilibrium molecular dynamics simulations of a systematic series of linear- and branched alkane liquids, as a continuation of our previous study on linear alkane [T. Ohara et al., J. Chem. Phys. 135, 034507 (2011)]. The thermal conductivities for these alkanes in a saturated liquid state at the same reduced temperature (0.7Tc) obtained from the simulations are compared in relation to the structural difference of the liquids. In order to connect the thermal energy transport characteristics with molecular structures, we introduce the new concept of the interatomic path of heat transfer (atomistic heat path, AHP), which is defined for each type of inter- and intramolecular interaction. It is found that the efficiency of intermolecular AHP is sensitive to the structure of the first neighbor shell, whereas that of intramolecular AHP is similar for different alkane species. The dependence of thermal conductivity on different lengths of the main and side chain can be understood from the natures of these inter- and intramolecular AHPs.

Top-seeded solution growth of 3 inch diameter 4H-SiC bulk crystal using metal solvents

We performed top-seeded solution growth of 4H-SiC for obtaining longer length crystal. Si-Cr and Si-Ti melts were used as solvents. Meniscus formation technique was applied to the present study. Special attention was paid to improve the process stability during long-term growth. One of major technological problems in the solution growth is that the precipitation of polycrystalline SiC which hiders the stable single crystal growth. Another problem is the fluctuation of supersaturation at the growth interface during the growth. Through the optimization of growth process conditions, we have successfully grown 4H-SiC single crystals up to 14 mm long with three-inch-diameter, and evaluated their crystalline quality.

Diffusion of Transition Metals in 4H-SiC and Trials of Impurity Gettering

The diffusion of transition metals in 4H-SiC has been investigated by secondary ion mass spectrometry using epilayers and substrates implanted with titanium (Ti), chromium (Cr), iron (Fe), or nickel (Ni). Implanted Cr, Fe, and Ni atoms diffuse by subsequent Ar annealing at 1780 °C in n-type 4H-SiC epilayers. In n+-type substrates, the diffusivities of Ti, Cr, and Fe are almost negligible, while only Ni diffuses. By the helium implantation following the implantation of transition metals, no diffusion of Ti, Cr and Fe is observed in epilayers. The diffusion of transition metals in SiC is discussed based on the results of first-principles calculation.

Two-component spin-coated Ag/CNT composite films based on a silver heterogeneous nucleation mechanism adhesion-enhanced by mechanical interlocking and chemical grafting

In this paper, a new method for the synthesis of silver carbon nanotube (Ag/CNT) composite films as conductive connection units for flexible electronic devices is presented. This method is about a two-component solution process by spin coating with an after-treatment annealing process. In this method, multi-walled carbon nanotubes (MWCNTs) act as the core of silver heterogeneous nucleation, which can be observed and analyzed by a field-emission scanning electron microscope. With the effects of mechanical interlocking, chemical grafting, and annealing, the interfacial adhesive strength between films and PET sheets was enhanced to 12 N cm-1. The tensile strength of the Ag/CNT composite films was observed to increase by 38% by adding 5 g l-1 MWCNTs. In the four-probe method, the resistivity of Ag/CNT-5 declined by 78.2% compared with pristine Ag films. The anti-fatigue performance of the Ag/CNT composite films was monitored by cyclic bending deformation and the results revealed that the growth rate of electrical resistance during the deformation was obviously retarded. As for industrial application, this method provides an efficient low-cost way to prepare Ag/CNT composite films and can be further applied to other coating systems.

Growth of Large Diameter 4H-SiC by TSSG Technique

4H-SiC single crystal with 3-inch diameter was grown by top seeded solution growth (TSSG) technique. We used a new convection control member called “Immersion Guide (IG)” which causes the high and homogenous fluid flow in the solution. As a result, we achieved relatively high growth rate and morphological stability

Dislocation Revelation from (0001) Carbon-face of 4H-SiC by Using Vaporized KOH at High Temperature

A novel etching technique using vaporized KOH to reveal various types of dislocations from the C-face of 4H-SiC has been proposed. Three different pit geometries have been observed, which can be attributed to three dislocation types commonly found in 4H-SiC. Pit positions on the Si-face and C-face have been compared to study the dislocation propagation behaviors across the sample thickness. Activation energy EA=49 kcal/mol has been obtained, indicating a surface-reaction-dominant process. This etching technique has provided an effective and inexpensive method of making inch-scale mapping of dislocation distribution for C-face epitaxial and bulky 4H-SiC.