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Dive into the research topics where Tatiana V. Amotchkina is active.

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Featured researches published by Tatiana V. Amotchkina.


Applied Optics | 2008

Estimation of the average residual reflectance of broadband antireflection coatings

Alexander V. Tikhonravov; Michael K. Trubetskov; Tatiana V. Amotchkina; J. A. Dobrowolski

We deal with optimal two-material antireflection (AR) coatings for the visible and adjacent spectral regions. It has been shown before that, for a given set of input parameters (refractive indices of the substrate, ambient medium and high- and low-index coating materials, and for a given spectral width of the AR coating), such designs consist of one or more clusters of layers of approximately constant optical thickness and number of layers. We show that, through the analysis of many different optimal coatings, it is possible to derive two parameters for a simple empirical expression that relates the residual average reflectance in the AR region to the number of clusters. These parameters are given for all possible combinations of relative spectral bandwidth equal to 2, 3, and 4; low-index to ambient-medium index ratio equal to 1.38 and 1.45; and high-to-low index ratio equal to 1.4, 1.5, and 1.7. The agreement between the numerically and the empirically calculated values of residual average reflectance is excellent. From the information presented the optical thin-film designer can quickly calculate the required number of layers and the overall optical thickness of an AR coating having the desired achievable residual average reflectance.


Applied Optics | 2006

New optimization algorithm for the synthesis of rugate optical coatings

Alexander V. Tikhonravov; Michael K. Trubetskov; Tatiana V. Amotchkina; Michael A. Kokarev; Norbert Kaiser; Olaf Stenzel; Steffen Wilbrandt; Dieter Gäbler

A model of a rugate coating that takes into account production potentialities of the Leybold Syrus Pro 1100 deposition system is presented. An efficient algorithm for the synthesis of rugate coatings is proposed. Numerical results are also presented.


Applied Optics | 2006

Investigation of the effect of accumulation of thickness errors in optical coating production by broadband optical monitoring

Alexander V. Tikhonravov; Michael K. Trubetskov; Tatiana V. Amotchkina

We present a theoretical approach enabling one to perform a preproduction investigation of the effect of accumulation of thickness errors in the course of optical coating production using broadband optical monitoring. On the basis of this approach we investigate and compare thickness errors that may be associated with such factors as random and systematic errors in measurement data, instabilities of deposition rates, and inaccuracies of on-line algorithms predicting termination instants for layer depositions.


Applied Optics | 2002

Effect of systematic errors in spectral photometric data on the accuracy of determination of optical parameters of dielectric thin films

Alexander V. Tikhonravov; Michael K. Trubetskov; Michael A. Kokarev; Tatiana V. Amotchkina; Angela Duparré; Etienne Quesnel; Detlev Ristau; Stefan Günster

The determination of optical parameters of thin films from experimental data is a typical task in the field of optical-coating technology. The optical characterization of a single layer deposited on a substrate with known optical parameters is widely used for this purpose. Results of optical characterization are dependent on not only the choice of the thin-film model but also on the quality of experimental data. The theoretical results presented highlight the effect of systematic errors in measurement data on the determination of thin-film parameters. Application of these theoretical results is illustrated by the analysis of experimental data for magnesium fluoride thin films.


Applied Optics | 2011

Optical parameters of oxide films typically used in optical coating production

Alexander V. Tikhonravov; Michael K. Trubetskov; Tatiana V. Amotchkina; Gary W. DeBell; Vladimir Pervak; Anna Sytchkova; Maria Luisa Grilli; Detlev Ristau

Wavelength dependencies of refractive indices of thin film materials differ for various deposition conditions, and it is practically impossible to attribute a single refractive index wavelength dependence to any typical thin film material. Besides objective reasons, differences in the optical parameters of thin films may also be connected with nonadequate choices of models and algorithms used for the processing of measurement data. The main goal of this paper is to present reliable wavelength dependencies of refractive indices of the most widely used slightly absorbing oxide thin film materials. These dependencies can be used by other researchers for comparison and verification of their own characterization results.


Advances in Optical Thin Films | 2004

Key role of the coating total optical thickness in solving design problems

Alexander V. Tikhonravov; Michael K. Trubetskov; Tatiana V. Amotchkina; Michael A. Kokarev

A key role of the design total optical thickness in the synthesis process is demonstrated by practical examples and confirmed by rigorous theoretical results. A special development of the needle optimization procedure called the synthesis by gradual evolution is proposed. This synthesis process does not require any starting design. It automatically constructs a set of designs with various combinations of three major design parameters: merit function value, number of design layers, design total optical thickness. This provides the optical coating engineer with additional opportunities in choosing the most practical design.


Applied Optics | 2009

Measurement of group delay of dispersive mirrors with white-light interferometer

Tatiana V. Amotchkina; Alexander V. Tikhonravov; Michael K. Trubetskov; Dirk Grupe; Alexander Apolonski; Vladimir Pervak

A new model for the determination of group delay (GD) and GD dispersion of dispersive mirrors is presented. The algorithm based on this model enables one to process interferometric data provided by a white-light interferometer and to obtain GD wavelength dependence over a broad spectral range.


Applied Optics | 2006

Statistical approach to choosing a strategy of monochromatic monitoring of optical coating production

Alexander V. Tikhonravov; Michael K. Trubetskov; Tatiana V. Amotchkina

We presents what we believe to be a new approach to choosing a sequence of monitoring wavelengths for monochromatic monitoring of optical coating production. The new approach is based on a preproduction estimation of expected levels of errors in thickness of layers of a deposited coating. It is demonstrated that the proposed monitoring strategy reduces the effect of accumulation of thickness errors. An advantage of the new monitoring strategy becomes especially noticeable when the number of monitored layers is equal to several dozens.


Applied Optics | 2012

Optical characterization and reverse engineering based on multiangle spectroscopy

Alexander V. Tikhonravov; Tatiana V. Amotchkina; Michael K. Trubetskov; Robert J. Francis; Vesna Janicki; Jordi Sancho-Parramon; Hrvoje Zorc; Vladimir Pervak

We perform characterization of thin films and reverse engineering of multilayer coatings on the basis of multiangle spectral photometric data provided by a new advanced spectrophotometer accessory. Experimental samples of single thin films and multilayer coatings are produced by magnetron sputtering and electron-beam evaporation. Reflectance and transmittance data at two polarization states are measured at incidence angles from 7 to 40 deg. We demonstrate that multiangle reflectance and transmittance data provide reliable characterization and reverse-engineering results.


Applied Optics | 2011

Comparison of algorithms used for optical characterization of multilayer optical coatings

Tatiana V. Amotchkina; Michael K. Trubetskov; Vladimir Pervak; Sebastian Schlichting; Henrik Ehlers; Detlev Ristau; Alexander V. Tikhonravov

Two algorithms used for the on-line and off-line characterization of multilayer optical coatings are experimentally compared using test samples produced by two different deposition processes and different monitoring approaches. One of these algorithms, called the triangular algorithm, demonstrates its superiority in all considered situations. We performed experiments with multilayer samples formed by high-density thin films, which allowed us to neglect possible errors in the film refractive indices and concentrate only on errors in the thicknesses of the layers of the produced coatings.

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Detlev Ristau

Leibniz University of Hanover

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