A. Tikhonravov

Effects of interface roughness on the spectral properties of thin films and multilayers

We introduce two parameters, large-scale and small-scale rms roughness, to take into account the interface properties of thin films and multilayers in the calculation of their specular reflectance and transmittance. A theoretical motivation for the introduction of these two parameters instead of a standard single rms roughness is provided. Experimental power spectral density functions of several samples are used to illustrate ways in which the parameters introduced can be evaluated.

Investigations in the nonlinear behavior of dielectrics by using ultrashort pulses (Best Oral Presentation)

Ultra-short pulse systems are considered as innovative laser sources for a variety of applications in micro material structuring, medicine and diagnostics. Current commercial systems are still lacking in output power limiting the throughput and the economic efficiency within a production line. In the optimization of ultra short pulse sources of the next generation, special effects in optical components during interaction with ultra-short pulses play a major role. Especially, low damage thresholds and non-linear absorptance have already been observed within the activities of the EUREKA-project CHOCLAB II, which are concentrated on the evaluation of multiple-pulse damage and the absorptance of fs-optical components according to the International Standards ISO 11254-2 and ISO 11551. In this paper, a theoretical model on the basis of photo- and avalanche ionization is presented describing the incidence of damage as a consequence of a sufficient high density of conduction band electrons. Furthermore, the influence of the Kerr-effect and conduction band electrons on the optical properties of dielectrics is investigated theoretically. From our calculations, a significant increase in reflectance due to the dominant Kerr-effect can be deduced as well as a noticeable increase in absorptance induced by free electron heating already at energy density values clearly below the damage threshold. Finally, results of an experimental investigation in the influence of the internal field strength in a dielectric layer stack on the damage threshold are described. The experiments clearly support the assumption already stated in other publications, that the field intensity formed by the optical design plays a key role for damage resistance of optical coatings for ultrashort pulses.

Reliable determination of wavelength dependence of thin film refractive index

Depending on the choice of thin film models and measurement data used for the characterization analysis one can obtain essentially different characterization results. It is especially difficult to reliably determine refractive index wavelength dependencies in the case of low accuracy measurement data. We consider possible approaches aimed to improve a stability of refractive index determination. The ways of the verification of characterization results are also discussed. Practical examples used to illustrate the proposed approaches are connected with the most difficult case of the determination of the refractive indices of fluoride films in the VUV spectral region.

Reverse engineering of multilayer coatings for ultrafast laser applications

We propose a reliable reverse engineering approach for a postproduction characterization of complicated optical coatings for ultrafast laser applications. We perform the postproduction characterization on the basis of in situ broadband monitoring data and validate the results using ex situ transmittance data and group delay measurements.

Reliable optical characterization of e-beam evaporated TiO2 films deposited at different substrate temperatures

We studied e-beam evaporated TiO2 films deposited at two different substrate temperatures between 120°C and 300°C. We reliably characterized the film samples on the basis of in situ and ex situ measurements. We carried out annealing on the samples and studied the induced changes in the properties of the films. The results can be useful for further laser-induced damage threshold investigations.

Computational experiments on atomistic modeling of thin-film deposition

The molecular dynamic algorithm for simulation of thin-film growth is reported. The achieved performance of this algorithm is sufficient for detailed investigations of structural effects in thin films with practically meaningful dimensions.

Automated construction of monochromatic monitoring strategies

We focus our efforts on development of an advanced monochromatic monitoring strategy to assist the optical coating engineer in finding a single wavelength or a sequence of monitoring wavelengths that meet simultaneously several practical demands, namely, specified input and output swing values, specified amplitude of a monitoring signal variation, and the distance between trigger point and the last signal extremum. Additionally, the most important demand is that the number of different monitoring wavelengths must be as small as possible. Manual construction of such a monitoring strategy is almost impossible because of a large number of conditions to be satisfied. We propose an algorithm that automatically generates a monitoring spreadsheet so that all demands can be satisfied as closely as possible. We consider six typical design problems and obtain a series of solutions for each of them. Then, we provide computational simulations of deposition processes assuming that they are controlled by monochromatic monitoring with the monitoring strategy generated by our algorithm, and we demonstrate how an optical coating engineer can select design solutions that exhibit the highest production yields.

Accurate formulas for estimating the effect of surface micro-roughness on ellipsometric angles of dielectric thin films

Accurate formulas for the variations of ellipsometric angles caused by the surface micro-roughness are derived. These formulas are used for estimating sensitivities of the ellipsometric angles to the thickness of surface overlayer presenting surface micro-roughness.