Tatsuya Asahata
Hitachi
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Publication
Featured researches published by Tatsuya Asahata.
Journal of Micromechanics and Microengineering | 2005
Toshiaki Fujii; Koji Iwasaki; Masanao Munekane; Toshitada Takeuchi; Masakatsu Hasuda; Tatsuya Asahata; Masahiro Kiyohara; Toshiharu Kogure; Yukimitsu Kijima; Takashi Kaito
A focused ion beam (FIB) system is process equipment used to make a wide variety of small structures of various materials by irradiating a focused gallium ion beam of nanometer-order diameter to a surface of specimens and by utilizing spattering etching and ion beam induced deposition. In order to realize greater diversity of structures with use of the FIB system, we developed a technology of making three-dimensional structures by using gas assist etching, and a precision wheel stage to be used in the focused ion beam (FIB) system. Using these technologies with the FIB system, we achieved a nano processing machine which can be called a nano milling machine or a nano lathe.
Microscopy and Microanalysis | 2014
Xin Man; Tatsuya Asahata; Atsushi Uemoto; Hidekazu Susuki; Hiroyuki Suzuki; Masakatsu Hasuda; Toshiaki Fujii
3D atom probe microscopy (3DAPM) is used as the technique of analyzing the three-dimensional information including chemical composition and atomic structure with near atomic-scale resolution [1]. The near atomic-scale resolution is realized by extracting atoms on a sample surface one by one with electric field evaporation. The needle-like sample with a tip diameter of about 50 nm is required in order to apply the local high electric field to the sample surface.
MRS Proceedings | 2006
Toshiaki Fujii; Koji Iwasaki; Masanao Munekane; Yo Yamamoto; Toshitada Takeuchi; Masakatsu Hasuda; Yutaka Ikku; Hiromi Tashiro; Tatsuya Asahata; Masahiro Kiyohara; Takashi Kaito
Focused Ion Beam (FIB) system is equipment used to make a wide variety of micro and Nano structures. Structures can be created using various materials by irradiating focused gallium ion beam on to the surface of specimens and by sputtering, etching and ion beam induced deposition. In order to realize greater diversity for nano construction by using the FIB system, we have developed technologies incorporating: - Built-in pattern signal generator - Multiple Gas Unit for gas assisted etching and beam induced deposition - A precision wheel for the stage. This latest FIB system has a narrow Ion beam with a diameter of better than 4nm. Beam current is controlled from 0.15pA to 20nA. These performances contribute significantly to the study 3D structures fabrication and modification.
Journal of Alloys and Compounds | 2013
Toru Hara; Koichi Tsuchiya; Kaneaki Tsuzaki; Xin Man; Tatsuya Asahata; Atsushi Uemoto
Archive | 2006
Masahiro Kiyohara; Makoto Sato; Tatsuya Asahata
Archive | 2013
Atsushi Uemoto; Xin Man; Tatsuya Asahata
Archive | 2005
Yutaka Ikku; Tatsuya Asahata; Hidekazu Suzuki
Archive | 2015
Hidekazu Suzuki; Tatsuya Asahata; Atsushi Uemoto
Archive | 2013
Xin Man; Yo Yamamoto; Atsushi Uemoto; Tatsuya Asahata
Archive | 2007
Yutaka Ikku; Tatsuya Asahata; Hidekazu Suzuki