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Dive into the research topics where Tatsuya Asahata is active.

Publication


Featured researches published by Tatsuya Asahata.


Journal of Micromechanics and Microengineering | 2005

A nanofactory by focused ion beam

Toshiaki Fujii; Koji Iwasaki; Masanao Munekane; Toshitada Takeuchi; Masakatsu Hasuda; Tatsuya Asahata; Masahiro Kiyohara; Toshiharu Kogure; Yukimitsu Kijima; Takashi Kaito

A focused ion beam (FIB) system is process equipment used to make a wide variety of small structures of various materials by irradiating a focused gallium ion beam of nanometer-order diameter to a surface of specimens and by utilizing spattering etching and ion beam induced deposition. In order to realize greater diversity of structures with use of the FIB system, we developed a technology of making three-dimensional structures by using gas assist etching, and a precision wheel stage to be used in the focused ion beam (FIB) system. Using these technologies with the FIB system, we achieved a nano processing machine which can be called a nano milling machine or a nano lathe.


Microscopy and Microanalysis | 2014

3D Atom Probe Microscopy Sample Preparation by Using L-Shape FIB-SEM-Ar Triple Beam

Xin Man; Tatsuya Asahata; Atsushi Uemoto; Hidekazu Susuki; Hiroyuki Suzuki; Masakatsu Hasuda; Toshiaki Fujii

3D atom probe microscopy (3DAPM) is used as the technique of analyzing the three-dimensional information including chemical composition and atomic structure with near atomic-scale resolution [1]. The near atomic-scale resolution is realized by extracting atoms on a sample surface one by one with electric field evaporation. The needle-like sample with a tip diameter of about 50 nm is required in order to apply the local high electric field to the sample surface.


MRS Proceedings | 2006

3D Structure Fabrication by FIB Milling and Deposition

Toshiaki Fujii; Koji Iwasaki; Masanao Munekane; Yo Yamamoto; Toshitada Takeuchi; Masakatsu Hasuda; Yutaka Ikku; Hiromi Tashiro; Tatsuya Asahata; Masahiro Kiyohara; Takashi Kaito

Focused Ion Beam (FIB) system is equipment used to make a wide variety of micro and Nano structures. Structures can be created using various materials by irradiating focused gallium ion beam on to the surface of specimens and by sputtering, etching and ion beam induced deposition. In order to realize greater diversity for nano construction by using the FIB system, we have developed technologies incorporating: - Built-in pattern signal generator - Multiple Gas Unit for gas assisted etching and beam induced deposition - A precision wheel for the stage. This latest FIB system has a narrow Ion beam with a diameter of better than 4nm. Beam current is controlled from 0.15pA to 20nA. These performances contribute significantly to the study 3D structures fabrication and modification.


Journal of Alloys and Compounds | 2013

Application of orthogonally arranged FIB–SEM for precise microstructure analysis of materials

Toru Hara; Koichi Tsuchiya; Kaneaki Tsuzaki; Xin Man; Tatsuya Asahata; Atsushi Uemoto


Archive | 2006

Method of determining processing position in charged particle beam apparatus, and infrared microscope used in the method

Masahiro Kiyohara; Makoto Sato; Tatsuya Asahata


Archive | 2013

CROSS-SECTION PROCESSING AND OBSERVATION METHOD AND CROSS-SECTION PROCESSING AND OBSERVATION APPARATUS

Atsushi Uemoto; Xin Man; Tatsuya Asahata


Archive | 2005

Method and apparatus for measuring thin film sample, and method and apparatus for manufacturing thin film sample

Yutaka Ikku; Tatsuya Asahata; Hidekazu Suzuki


Archive | 2015

Cross section processing method and cross section processing apparatus

Hidekazu Suzuki; Tatsuya Asahata; Atsushi Uemoto


Archive | 2013

Composite charged particle beam apparatus

Xin Man; Yo Yamamoto; Atsushi Uemoto; Tatsuya Asahata


Archive | 2007

Method and apparatus of measuring thin film sample and method and apparatus of fabricating thin film sample

Yutaka Ikku; Tatsuya Asahata; Hidekazu Suzuki

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