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Dive into the research topics where Teruo Yokoyama is active.

Publication


Featured researches published by Teruo Yokoyama.


IEEE Electron Device Letters | 1987

Reduction of backgating effect in MBE-Grown GaAs/AlGaAs HEMT's

Teruo Yokoyama; Masahisa Suzuki; Tohru Yamamoto; Junji Saito; Tomonori Ishikawa

We have investigated the backgating effect in high electron mobility transistors (HEMTs) fabricated on MBE-grown GaAs/AlGaAs layers, which is undesirable for LSI fabrication. Comparing five different types of devices, we related the backgating effect to the interface between the GaAs substrate and the undoped GaAs buffer layer. By using a thermally etched GaAs substrate, we successfully reduced the backgating to the same order as that of ion-implanted GaAs MESFETs.


IEEE Electron Device Letters | 1990

Se-doped AlGaAs/GaAs HEMTs for stable low-temperature operation

Teruo Yokoyama; Masahisa Suzuki; Takeshi Maeda; Tomonori Ishikawa; Takashi Mimura; M. Abe

The fabrication of Se-doped AlGaAs/GaAs high electron mobility transistors (HEMTs) is discussed. Because the DX center concentration in Se-doped AlGaAs layers is lower than in Si-doped layers, the drain-current collapses much less at 77 K. The Se-doped HEMTs are therefore suitable for application in low-temperature LSI.<<ETX>>


Archive | 1997

Semiconductor device having T-shaped gate electrode

Toshiaki Moriuchi; Teruo Yokoyama


Archive | 1992

Semiconductor integrated circuit having a reduced side gate effect

Teruo Yokoyama; Masahisa Suzuki; Tomonori Ishikawa; Takeshi Igarashi


Archive | 1995

Method for forming MESFET having T-shaped gate electrode

Toshiaki Moriuchi; Teruo Yokoyama


Archive | 1994

Heterojunction compound semiconductor device and method of manufacturing the same

Hiroyuki Oguri; Teruo Yokoyama


Archive | 1990

Semiconductor integrated circuit of compound semiconductor devices comprising isolation regions and method of making the same

Teruo Yokoyama; Masahisa Suzuki; Tomonori Ishikawa; Takeshi Igarashi


Archive | 1995

Method of forming a MESFET with a T-shaped gate electrode and device formed thereby

Toshiaki Moriuchi; Teruo Yokoyama


Archive | 2002

Heterojunction compound semiconductor device

Hiroyuki Oguri; Teruo Yokoyama


Archive | 1995

A process for the manufacture of a MESFET having a T-shaped gate electrode and thereby component produced

Toshiaki Moriuchi; Teruo Yokoyama

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Takashi Mimura

National Institute of Information and Communications Technology

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Tohru Yamamoto

Central Research Institute of Electric Power Industry

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