Teruo Yokoyama
Fujitsu
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Publication
Featured researches published by Teruo Yokoyama.
IEEE Electron Device Letters | 1987
Teruo Yokoyama; Masahisa Suzuki; Tohru Yamamoto; Junji Saito; Tomonori Ishikawa
We have investigated the backgating effect in high electron mobility transistors (HEMTs) fabricated on MBE-grown GaAs/AlGaAs layers, which is undesirable for LSI fabrication. Comparing five different types of devices, we related the backgating effect to the interface between the GaAs substrate and the undoped GaAs buffer layer. By using a thermally etched GaAs substrate, we successfully reduced the backgating to the same order as that of ion-implanted GaAs MESFETs.
IEEE Electron Device Letters | 1990
Teruo Yokoyama; Masahisa Suzuki; Takeshi Maeda; Tomonori Ishikawa; Takashi Mimura; M. Abe
The fabrication of Se-doped AlGaAs/GaAs high electron mobility transistors (HEMTs) is discussed. Because the DX center concentration in Se-doped AlGaAs layers is lower than in Si-doped layers, the drain-current collapses much less at 77 K. The Se-doped HEMTs are therefore suitable for application in low-temperature LSI.<<ETX>>
Archive | 1997
Toshiaki Moriuchi; Teruo Yokoyama
Archive | 1992
Teruo Yokoyama; Masahisa Suzuki; Tomonori Ishikawa; Takeshi Igarashi
Archive | 1995
Toshiaki Moriuchi; Teruo Yokoyama
Archive | 1994
Hiroyuki Oguri; Teruo Yokoyama
Archive | 1990
Teruo Yokoyama; Masahisa Suzuki; Tomonori Ishikawa; Takeshi Igarashi
Archive | 1995
Toshiaki Moriuchi; Teruo Yokoyama
Archive | 2002
Hiroyuki Oguri; Teruo Yokoyama
Archive | 1995
Toshiaki Moriuchi; Teruo Yokoyama
Collaboration
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National Institute of Information and Communications Technology
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