Thomas H. Myers

Radiative and interfacial recombination in CdTe heterostructures

Double heterostructures (DH) were produced consisting of a CdTe film between two wide band gap barriers of CdMgTe alloy. A combined method was developed to quantify radiative and non-radiative recombination rates by examining the dependence of photoluminescence (PL) on both excitation intensity and time. The measured PL characteristics, and the interface state density extracted by modeling, indicate that the radiative efficiency of CdMgTe/CdTe DHs is comparable to that of AlGaAs/GaAs DHs, with interface state densities in the low 1010 cm−2 and carrier lifetimes as long as 240 ns. The radiative recombination coefficient of CdTe is found to be near 10−10 cm3s−1. CdTe film growth on bulk CdTe substrates resulted in a homoepitaxial interface layer with a high non-radiative recombination rate.

Impact of extended defects on recombination in CdTe heterostructures grown by molecular beam epitaxy

Heterostructures with CdTe and CdTe1-xSex (x ∼ 0.01) absorbers between two wider-band-gap Cd1-xMgxTe barriers (x ∼ 0.25–0.3) were grown by molecular beam epitaxy to study carrier generation and recombination in bulk materials with passivated interfaces. Using a combination of confocal photoluminescence (PL), time-resolved PL, and low-temperature PL emission spectroscopy, two extended defect types were identified and the impact of these defects on charge-carrier recombination was analyzed. The dominant defects identified by confocal PL were dislocations in samples grown on (211)B CdTe substrates and crystallographic twinning-related defects in samples on (100)-oriented InSb substrates. Low-temperature PL shows that twin-related defects have a zero-phonon energy of 1.460 eV and a Huang-Rhys factor of 1.50, while dislocation-dominated samples have a 1.473-eV zero-phonon energy and a Huang-Rhys factor of 1.22. The charge carrier diffusion length near both types of defects is ∼6 μm, suggesting that recombinati...

MBE growth and characterization of Mn-doped InN

The majority of InN doping studies have primarily focused on Mg, as it has previously been used to successfully realize p-type GaN. Here, we consider an alternative dopant—Mn—as a possible acceptor candidate in InN. Magnetotransport, x ray photoelectron spectroscopy, and photoluminescence were used to investigate electrical and optical properties of a series of Mn-doped InN thin films grown using molecular beam epitaxy. Evidence of acceptor behavior was observed only for moderate (1017 cm−3) doping levels. At a doping level around 1017 cm−3, light hole features appear in the quantitative mobility spectrum analysis, the surface Fermi level shifts downwards towards the valence band, and low energy features appear in the low temperature photoluminescence spectra.

X-Ray Photoelectron Spectroscopy Study of Oxide Removal Using Atomic Hydrogen for Large-Area II–VI Material Growth

This study investigates using atomic hydrogen to clean GaSb (211)B and (111)B substrates as an alternative to thermal desorption under an Sb overpressure. X-ray photoelectron spectroscopy measurement verified the oxide removal on the atomic hydrogen-cleaned GaSb. Atomic force microscopy was used to characterize the surface morphologies of GaSb after atomic hydrogen cleaning with various conditions. All substrates investigated contained a high density of pits that became larger as higher deoxidation temperatures were used, with or without atomic hydrogen. Growth of homoepitaxial GaSb (100) and (211)B was used to compare stoichiometry changes with various oxide removal conditions, and growth effects on sequential epilayers.

Time-resolved correlative optical microscopy of charge-carrier transport, recombination, and space-charge fields in CdTe heterostructures

From time- and spatially resolved optical measurements, we show that extended defects can have a large effect on the charge-carrier recombination in II–VI semiconductors. In CdTe double heterostructures grown by molecular beam epitaxy on the InSb (100)-orientation substrates, we characterized the extended defects and found that near stacking faults the space-charge field extends by 2–5 μm. Charge carriers drift (with the space-charge field strength of 730–1,360 V cm−1) and diffuse (with the mobility of 260 ± 30 cm2 V−1 s−1) toward the extended defects, where the minority-carrier lifetime is reduced from 560 ns to 0.25 ns. Therefore, the extended defects are nonradiative recombination sinks that affect areas significantly larger than the typical crystalline grains in II–VI solar cells. From the correlative time-resolved photoluminescence and second-harmonic generation microscopy data, we developed a band-diagram model that can be used to analyze the impact of extended defects on solar cells and other elect...

Factors influencing photoluminescence and photocarrier lifetime in CdSeTe/CdMgTe double heterostructures

CdSeTe/CdMgTe double heterostructures were produced with both n-type and unintentionally doped absorber layers. Measurements of the dependence of photoluminescence intensity on excitation intensity were carried out, as well as measurements of time-resolved photoluminescence decay after an excitation pulse. It was found that decay times under very low photon injection conditions are dominated by a non-radiative Shockley-Read-Hall process described using a recombination center with an asymmetric capture cross section, where the cross section for holes is larger than that for electrons. As a result of the asymmetry, the center effectively extends photoluminescence decay by a hole trapping phenomenon. A reduction in electron capture cross section appeared at doping densities over 1016cm−3. An analysis of the excitation intensity dependence of room temperature photoluminescence revealed a strong relationship with doping concentration. This allows estimates of the carrier concentration to be made through a non-...

Comparative Study of High-

Electrical interface quality of various high- k dielectrics on GaSb, including Al₂O₃, HfO₂, LaAlO₃, GdScO₃, and HfO₂/Ga₂O₃ bilayer has been studied and compared with reference low (AlGaSb) and high D_it (native oxide) interfaces using photoluminescence intensity measurements for the first time. Al₂O₃ and HfO₂/Ga₂O₃ bilayer dielectrics are identified with the lowest interface recombination velocity (S=7×10⁴ cm/s) and consequently D_it integrated across essentially the entire bandgap. However, S for even the best identified high- k dielectrics is elevated by 140× over the low D_it AlGaSb reference indicating the need of further improvements for envisioned use in Sb based MOSFETs.

k/{\rm GaSb}

We show that Be exhibits amphoteric behavior in GaN, involving switching between substitutional and interstitial positions in the lattice. This behavior is observed through the dominance of Be_{Ga} in the positron annihilation signals in Be-doped GaN, while the emergence of V_{Ga} at high temperatures is a consequence of the Be impurities being driven to interstitial positions. The similarity of this behavior to that found for Na and Li in ZnO suggests that this could be a universal property of light dopants substituting for heavy cations in compound semiconductors.

Interfaces for Use in Antimonide Based MOSFETs

Time-resolved and time integrated photoluminescence (PL) studies are reported for undoped and doped CdMgTe/CdSeTe double heterostructures (DHs) grown by molecular beam epitaxy. Undoped DHs are studied with absorber layer thickness varying from 0.5 to 2.5 µm. The n-type free-carrier concentration is varied ~7 × 1015, 8.4 × 1016, and 8.4 × 1017 cm−3 using iodine as a dopant in different absorber layer thicknesses (0.25–2.0 µm). Optical injection is varied from 1 × 1010 to 3 × 1011 photons/pulse/cm2, corresponding to the initial injection of photo-carriers up to ~8 × 1015 cm−3, to examine the effects of excess carrier concentration on the PL lifetimes. Undoped DHs exhibit an initial rapid decay followed by a slower dependence with carrier lifetimes up to ~485 ns. The dependence of carrier lifetimes on the thickness of the absorber layers (0.5–2.5 µm) suggests interface recombination velocities () ~ 1288 and 238 cm s−1 in the initial and later decay times, respectively, corresponding to high and low photo-carrier concentrations. The Shockley–Read–Hall model is used to describe the results in which variations are observed in for undoped DHs. The lifetimes of doped DHs show a consistent trend with thickness. The ~ 80–200 cm s−1 is estimated for doping n ~ 7 × 1015 cm−3 and 240–410 cm s−1 for n ~ 8.4 × 1016 cm−3. The observed decrease in carrier lifetimes with increasing n is consistent with growing importance of the radiative recombination rate due to the excess carrier concentration. The effect of carrier concentration on the PL spectrum is also discussed.

Amphoteric Be in GaN: Experimental Evidence for Switching between Substitutional and Interstitial Lattice Sites

We used time-resolved photoluminescence micro-scopy to analyze charge carrier transport and recombination in CdTe double heterostructures fabricated by molecular beam epitaxy (MBE). This allowed us to determine the charge carrier mobility in this system, which was found to be 500-625 cm2/(V·s). Charge carrier lifetimes in the 15-100 ns range are limited by the interface recombination, and the data indicate higher interface recombination velocity near extended defects. This study describes a new method to analyze the spatial distribution of the interface recombination velocity and the interface defects in semiconductor heterostructures.