Tobias Meisch

Response of GaN to energetic ion irradiation : conditions for ion track formation

We investigated the response of wurzite GaN thin films to energetic ion irradiation. Both swift heavy ions (92 MeV Xe23+, 23 MeV I6+) and highly charged ions (100 keV Xe40+) were used. After irradiation, the samples were investigated using atomic force microscopy, grazing incidence small angle X-ray scattering, Rutherford backscattering spectroscopy in channelling orientation and time of flight elastic recoil detection analysis. Only grazing incidence swift heavy ion irradiation induced changes on the surface of the GaN, when the appearance of nanoholes is accompanied by a notable loss of nitrogen. The results are discussed in the framework of the thermal spike model.

Composition dependent valence band order in c-oriented wurtzite AlGaN layers

The valence band order of polar wurtzite aluminum gallium nitride (AlGaN) layers is analyzed for a dense series of samples, grown heteroepitaxially on sapphire substrates, covering the complete composition range. The excitonic transition energies, found by temperature dependent photoluminescence (PL) spectroscopy, were corrected to the unstrained state using input from X-ray diffraction. k⋅p theory yields a critical relative aluminum concentration xc=(0.09±0.05) for the crossing of the uppermost two valence bands for strain free material, shifting to higher values for compressively strained samples, as supported by polarization dependent PL. The analysis of the strain dependent valence band crossing reconciles the findings of other research groups, where sample strain was neglected. We found a bowing for the energy band gap to the valence band with Γ9 symmetry of bΓ9=0.85eV, and propose a possible bowing for the crystal field energy of bcf=−0.12eV. A comparison of the light extraction efficiency perpendic...

Cathodoluminescence of GaInN quantum wells grown on nonpolar a plane GaN: Intense emission from pit facets

GaxIn1−xN quantum wells grown by metal organic vapor phase epitaxy on a plane GaN grown on r plane sapphire substrate typically show relatively large surface pits. We show by correlation of low temperature photoluminescence, cathodoluminescence, scanning and transmission electron microscopy that the different semipolar side facets of these pits dominate the overall luminescence signal of such layers.

Three-dimensional reciprocal space mapping of diffuse scattering for the study of stacking faults in semipolar (\bf 11{\overline 2}2) GaN layers grown from the sidewall of an r-patterned sapphire substrate

Three-dimensional reciprocal space mapping of semipolar (11{\overline 2}2) GaN grown on stripe-patterned r-plane (1{\overline 1}02) sapphire substrates is found to be a powerful and crucial method for the analysis of diffuse scattering originating from stacking faults that are diffracting in a noncoplanar geometry. Additionally, by measuring three-dimensional reciprocal space maps (3D-RSMs) of several reflections, the transmission electron microscopy visibility criteria could be confirmed. Furthermore, similar to cathodoluminescence, the 3D-RSM method could be used in future as a reliable tool to distinguish clearly between the diffuse scattering signals coming from prismatic and from basal plane stacking faults and from partial dislocations in semipolar (11{\overline 2}2) GaN. The fitting of the diffuse scattering intensity profile along the stacking fault streaks with a simulation based on the Monte Carlo approach has delivered an accurate determination of the basal plane stacking fault density. A reduction of the stacking fault density due to the intercalation of an SiN interlayer in the GaN layer deposited on the sidewall of the pre-patterned sapphire substrate has led to an improvement of the optoelectronic properties, influenced by the crystal quality, as has been demonstrated by a locally resolved cathodoluminescence investigation.

Growth of cubic GaN quantum dots

Zinc‐blende GaN quantum dots were grown on 3C‐AlN(001) by two different methods in a molecular beam epitaxy system. The quantum dots in method A were fabricated by the Stranski‐Krastanov growth process. The quantum dots in method B were fabricated by droplet epitaxy, a vapor‐liquid‐solid process. The density of the quantum dots was controllable in a range of 108 cm−2 to 1012 cm−2. Reflection high energy electron diffraction analysis confirmed the zinc‐blende crystal structure of the QDs. Photoluminescence spectroscopy revealed the optical activity of the QDs, the emission energy was in agreement with the exciton ground state transition energy of theoretical calculations.

The influence of prestrained metalorganic vapor phase epitaxial gallium-nitride templates on hydride vapor phase epitaxial growth

We have varied the strain situation in metalorganic vapor phase epitaxial (MOVPE) grown gallium-nitride (GaN) by exchanging the nucleation layer and by inserting a submono-SixNy-interlayer in the first few hundred nanometers of growth on sapphire substrates. The influence on the MOVPE template and subsequent hydride vapor phase epitaxial (HVPE) growth could be shown by in-situ measurements of the sample curvature. Using the results of these investigations, we have established a procedure to confine the curvature development in MOVPE and HVPE growth to a minimum. By increasing the layer thickness in HVPE, we could create self-separated, freestanding GaN layers with small remaining curvature.

Synchrotron-based photoluminescence excitation spectroscopy applied to investigate the valence band splittings in AlN and Al0.94Ga0.06N

We demonstrate that synchrotron-based photoluminescence excitation (PLE) spectroscopy is a versatile tool for determining valence band splittings of AlN and high aluminum content AlGaN. PLE results are independently confirmed by synchrotron-based spectroscopic ellipsometry. The splittings between the ordinary and the extraordinary absorption edges are found to be −240 meV and −170 meV for AlN and Al0.94Ga0.06N, respectively. These values differ from the crystal field energy due to residual strain.

Three-dimensional cathodoluminescence characterization of a semipolar GaInN based LED sample

A semipolar GaInN based light-emitting diode (LED) sample is investigated by three-dimensionally resolved cathodoluminescence (CL) mapping. Similar to conventional depth-resolved CL spectroscopy (DRCLS), the spatial resolution perpendicular to the sample surface is obtained by calibration of the CL data with Monte-Carlo-simulations (MCSs) of the primary electron beam scattering. In addition to conventional MCSs, we take into account semiconductor-specific processes like exciton diffusion and the influence of the band gap energy. With this method, the structure of the LED sample under investigation can be analyzed without additional sample preparation, like cleaving of cross sections. The measurement yields the thickness of the p-type GaN layer, the vertical position of the quantum wells, and a defect analysis of the underlying n-type GaN, including the determination of the free charge carrier density. The layer arrangement reconstructed from the DRCLS data is in good agreement with the nominal parameters defined by the growth conditions.A semipolar GaInN based light-emitting diode (LED) sample is investigated by three-dimensionally resolved cathodoluminescence (CL) mapping. Similar to conventional depth-resolved CL spectroscopy (DRCLS), the spatial resolution perpendicular to the sample surface is obtained by calibration of the CL data with Monte-Carlo-simulations (MCSs) of the primary electron beam scattering. In addition to conventional MCSs, we take into account semiconductor-specific processes like exciton diffusion and the influence of the band gap energy. With this method, the structure of the LED sample under investigation can be analyzed without additional sample preparation, like cleaving of cross sections. The measurement yields the thickness of the p-type GaN layer, the vertical position of the quantum wells, and a defect analysis of the underlying n-type GaN, including the determination of the free charge carrier density. The layer arrangement reconstructed from the DRCLS data is in good agreement with the nominal parameters ...

LEDs on HVPE grown GaN substrates: Influence of macroscopic surface features

We demonstrate the strong influence of GaN substrate surface morphology on optical properties and performance of light emitting devices grown on freestanding GaN. As-grown freestanding HVPE GaN substrates show excellent AFM RMS and XRD FWHM values over the whole area, but distinctive features were observed on the surface, such as macro-pits, hillocks and facets extending over several millimeters. Electroluminescence measurements reveal a strong correlation of the performance and peak emission wavelength of LEDs with each of these observed surface features. This results in multiple peaks and non-uniform optical output power for LEDs on as-grown freestanding GaN substrates. Removal of these surface features by chemical mechanical polishing results in highly uniform peak wavelength and improved output power over the whole wafer area.

Ga(In)N Photonic Crystal Light Emitters with Semipolar Quantum Wells

We present directional photonic crystal light emitters produced as periodic semipolar GaInN quantum wells, grown by selective area metal organic vapour phase epitaxy. The emitted angle-dependent modal structure for sub-micrometer stripes and embedded photonic crystal structures is analyzed experimentally in detail, and the introduction of an Al0.12Ga0.88N cladding layer is investigated. We provide a complete simulation based on the finite-difference time-domain method, which allows to identify all leaky modes as well as their spectral and angular dependence.