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Dive into the research topics where Tobias Stolley is active.

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Featured researches published by Tobias Stolley.


Proceedings of SPIE | 2012

Roll-to-roll manufacturing of electronic devices

N. A. Morrison; Tobias Stolley; U. Hermanns; U. Kroemer; A. Reus; A. Lopp; Manuel Campo; Heike Landgraf

Roll-to-Roll (R2R) production of thin film based electronic devices (e.g. solar cells, activematrix TFT backplanes & touch screens) combine the advantages of the use of inexpensive, lightweight & flexible substrates with high throughput production. Significant cost reduction opportunities can also be found in terms of processing tool capital cost, utilized substrate area and process gas flow when compared with batch processing systems. Nevertheless, material handling, device patterning and yield issues have limited widespread utilization of R2R manufacturing within the electronics industry.


Journal of The Society for Information Display | 2006

Layer-thickness simulation for static thin-film deposition on Gen 6/Gen 7 substrates

Andreas Lopp; Stefan Bangert; Wolfgang Buschbeck; Markus Hanika; Michael König; Jörg Dr. Krempel-Hesse; Harald Rost; Jürgen Schroeder; Tobias Stolley

— The movement of particles from a target to a substrate during the sputter process was studied using the Monte Carlo Simulation technique. The momentum and energy distribution of the ejected particles were taken into account along with the change of momentum and energy in their collisions with gas atoms. The momentum transfer from the ejected target atom to the gas atom was used to estimate the gas rarefaction in front of the target. Layer-thickness distributions of different target materials were calculated and compared with experimental measurements. The results were used to optimize the uniformity of static thin-film depositions on Gen 6/Gen 7 substrates from a large-area cathode array.


SID Symposium Digest of Technical Papers | 2005

6.2: Layer-Thickness Simulation for Static Thin-Film Deposition on Gen6/Gen7 Substrates

Andreas Lopp; Stefan Bangert; Wolfgang Buschbeck; Markus Hanika; Michael König; Jörg Dr. Krempel-Hesse; Harald Rost; Jürgen Schroeder; Tobias Stolley

Monte Carlo simulations were performed to examine the layer thickness distribution of a sputter deposition process. The numerical results were used to optimize the uniformity of a large area cathode array for static thin film deposition on Gen6/Gen7 substrates. The influence of different target materials was investigated.


Solar Energy Materials and Solar Cells | 2012

Anti-reflective microcrystalline silicon oxide p-layer for thin-film silicon solar cells on ZnO

Konrad Schwanitz; Stefan Klein; Tobias Stolley; Martin Rohde; Daniel Severin; Roland Trassl


Archive | 2012

Thin film solar fabrication process, deposition method for tco layer, and solar cell precursor layer stack

Elisabeth Sommer; Philipp Obermeyer; Thomas Werner Zilbauer; Inge Vermeir; Daniel Severin; Niels Kuhr; Markus Kress; Christof Kurthen; Ursula Schmidt; Stefan Klein; Susanne Buschbaum; Konrad Schwanitz; Christian Stoemmer; Tobias Stolley; Martin Rohde; Andreas Rembeck


Archive | 2005

Coater with a large-area assembly of rotatable magnetrons

Stefan Bangert; Frank Fuchs; Ralph Lindenberg; Andreas Lopp; Uwe Schüssler; Tobias Stolley


Archive | 2004

Cathodic sputtering apparatus

Frank Fuchs; Stefan Bangert; Ralph Lindenberg; Helmut Grimm; Tobias Stolley; Uwe Schüssler


Thin Solid Films | 2014

Plasma enhanced chemical vapor deposition process optimization for thin film silicon tandem junction solar cells

Martin Rohde; Matthias Zelt; Onno Gabriel; Sebastian Neubert; Simon Kirner; Daniel Severin; Tobias Stolley; B. Rau; Bernd Stannowski; Rutger Schlatmann


Physica Status Solidi (c) | 2011

Large area thin film silicon modules with 10% efficiency for production

Stefan Klein; Stephan Wieder; Susanne Buschbaum; Martin Rohde; Konrad Schwanitz; Tobias Stolley; Christian Stömmer; Daniel Severin; Axel Straub; Ursula Schmidt; Khaled Ahmed


Archive | 2003

Arrangement for transporting a flat substrate in a vacuum chamber

Stefan Bangert; Frank Fuchs; Uwe Schuessler; Ralph Lindenberg; Tobias Stolley

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