Tomohiro Kusano
Mitsubishi Chemical Corporation
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Publication
Featured researches published by Tomohiro Kusano.
Proceedings of International Conference on Planarization/CMP Technology 2014 | 2014
Tomohiro Kusano; Toshiaki Shibata; Atsushi Itou; Fumikazu Mizutani
To develop the post Cu-CMP cleaner, we investigate galvanic corrosion of Co as used barrier metal by electrochemical measurements. To elucidate relationship between cleaner composition and galvanic corrosion, corrosion potential is investigated by Tafel plot and corrosion current is measured by Liner Sweep Voltammetry (LSV). As results, LSV indicates variation of galvanic corrosion caused by chelator and inhibitor. Furthermore, result of LSV shows well agreement with etching rate of Co wafer which electrically connected with Cu wafer.
Archive | 2008
Kenji Shizuka; Kaoru Terada; Kenji Okahara; Tomohiro Kusano
Archive | 2008
Kenji Shizuka; Kaoru Terada; Kenji Okahara; Tomohiro Kusano
Archive | 2011
Masato Kijima; Jeong Min Kim; Tomohiro Kusano; Kenji Shizuka; Shoji Takano; 賢治 志塚; 正人 木島; 智博 草野; 彰司 高野
Archive | 2008
Chikayoshi Inoue; Naoaki Kumagai; Tomohiro Kusano; Kenji Okahara; 京由 井上; 賢二 岡原; 直昭 熊谷; 智博 草野
Archive | 2011
Shoji Takano; Kenji Shizuka; Tomohiro Kusano; Jungmin Kim; Masato Kijima
Archive | 2011
Shoji Takano; Kenji Shizuka; Jungmin Kim; Tomohiro Kusano; Masato Kijima
Archive | 2008
Kenji Shizuka; Kaoru Terada; Kenji Okahara; Tomohiro Kusano
Archive | 2013
Shoji Takano; Kenji Shizuka; Jungmin Kim; Tomohiro Kusano; Masato Kijima
Archive | 2009
彰司 ▲高▼野; Teimin Kin; Tomohiro Kusano; Kenji Shizuka; Shoji Takano; 賢治 志塚; 智博 草野
