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Dive into the research topics where Tomoki Machida is active.

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Featured researches published by Tomoki Machida.


Applied Physics Letters | 2009

Fabrication of graphene nanoribbon by local anodic oxidation lithography using atomic force microscope

Satoru Masubuchi; M. Ono; Katsuhisa Yoshida; Kazuhiko Hirakawa; Tomoki Machida

We conducted local anodic oxidation (LAO) lithography in single-layer, bilayer, and multilayer graphenes using tapping-mode atomic force microscope. The width of insulating oxidized area depends systematically on the number of graphene layers. An 800-nm-wide bar-shaped device fabricated in single-layer graphene exhibits the half-integer quantum Hall effect. We also fabricated a 55-nm-wide graphene nanoribbon (GNR). The conductance of the GNR at the charge neutrality point was suppressed at low temperature, which suggests the opening of an energy gap due to lateral confinement of charge carriers. These results show that LAO lithography is an effective technique for the fabrication of graphene nanodevices.


Applied Physics Letters | 2003

Coherent control of nuclear-spin system in a quantum-Hall device

Tomoki Machida; T. Yamazaki; Kenji Ikushima; Susumu Komiyama

Coherent control of local nuclear spins in a solid-state device is demonstrated. By unequally populating spin-resolved quantum-Hall edge channels, nuclear spins in a limited region along the edge channels are strongly polarized via the hyperfine interaction. Pulsed rf magnetic fields, generated by a built-in micrometal strip, cause the nuclear-spin state to evolve coherently. The nuclear-spin state reached during the pulse duration is finally read out via the edge-channel conductance, which shows Rabi oscillation.


Applied Physics Letters | 2014

Large current modulation in exfoliated-graphene/MoS2/metal vertical heterostructures

Rai Moriya; Takehiro Yamaguchi; Yoshihisa Inoue; Sei Morikawa; Yohta Sata; Satoru Masubuchi; Tomoki Machida

Graphene-based vertical field effect transistors have attracted considerable attention in the light of realizing high-speed switching devices; however, the functionality of such devices has been limited by either their small ON-OFF current ratios or ON current densities. We fabricate a graphene/MoS2/metal vertical heterostructure by using mechanical exfoliation and dry transfer of graphene and MoS2 layers. The van der Waals interface between graphene and MoS2 exhibits a Schottky barrier, thus enabling the possibility of well-defined current rectification. The height of the Schottky barrier can be strongly modulated by an external gate electric field owing to the small density of states of graphene. We obtain large current modulation exceeding 10^5 simultaneously with a large current density of ~10^4 A/cm^2 , thereby demonstrating the superior performance of the exfoliated-graphene/MoS2/metal vertical field effect transistor


Applied Physics Express | 2013

Electrical Spin Injection into Graphene through Monolayer Hexagonal Boron Nitride

Takehiro Yamaguchi; Yoshihisa Inoue; Satoru Masubuchi; Sei Morikawa; Masahiro Onuki; Kenji Watanabe; Takashi Taniguchi; Rai Moriya; Tomoki Machida

We demonstrate electrical spin injection from a ferromagnet to a bilayer graphene (BLG) through a monolayer (ML) of single-crystal hexagonal boron nitride (h-BN). A Ni81Fe19/ML h-BN/BLG/h-BN structure is fabricated using a micromechanical cleavage and dry transfer technique. The transport properties across the ML h-BN layer exhibit tunnel barrier characteristics. Spin injection into BLG has been detected through non local magnetoresistance measurements.


Nano Letters | 2011

Atomic Force Microscopy Based Tunable Local Anodic Oxidation of Graphene

Satoru Masubuchi; Miho Arai; Tomoki Machida

We have fabricated graphene/graphene oxide/graphene (G/GO/G) junctions by local anodic oxidation lithography using atomic force microscopy (AFM). The conductance of the G/GO/G junction decreased with the bias voltage applied to the AFM cantilever V(tip). For G/GO/G junctions fabricated with large and small |V(tip)|. GO was semi-insulating and semiconducting, respectively. AFM-based LAO lithography can be used to locally oxidize graphene with various oxidation levels and achieve tunability from semiconducting to semi-insulating GO.


Applied Physics Letters | 2007

Spin transport through a single self-assembled InAs quantum dot with ferromagnetic leads

Kohei Hamaya; Satoru Masubuchi; Minoru Kawamura; Tomoki Machida; M. Jung; Kenji Shibata; Kazuhiko Hirakawa; Tomoyasu Taniyama; S. Ishida; Yasuhiko Arakawa

The authors have fabricated a lateral double barrier magnetic tunnel junction (MTJ) which consists of a single self-assembled InAs quantum dot (QD) with ferromagnetic Co leads. The MTJ shows clear hysteretic tunnel magnetoresistance (TMR) effect, which is evidence for spin transport through a single semiconductor QD. The TMR ratio and the curve shapes are varied by changing the gate voltage.


Applied Physics Letters | 2002

Local control of dynamic nuclear polarization in quantum Hall devices

Tomoki Machida; T. Yamazaki; Susumu Komiyama

We manipulate and detect local nuclear spin polarization in integer quantum Hall (IQH) systems using micrometal strips fabricated on top of Al0.3Ga0.7As/GaAs Hall bar devices. The radio-frequency (rf) magnetic fields generated by transmitting rf electrical currents through the micrometal strips causes nuclear magnetic resonance in a limited region along IQH edge channels, and resulting changes in the nuclear spin polarization are detected via Hall resistance of the devices.


Applied Physics Letters | 2015

Electric field modulation of Schottky barrier height in graphene/MoSe2 van der Waals heterointerface

Yohta Sata; Rai Moriya; Sei Morikawa; Naoto Yabuki; Satoru Masubuchi; Tomoki Machida

We demonstrate a vertical field-effect transistor based on a graphene/MoSe2 van der Waals (vdW) heterostructure. The vdW interface between the graphene and MoSe2 exhibits a Schottky barrier with an ideality factor of around 1.3, suggesting a high-quality interface. Owing to the low density of states in graphene, the position of the Fermi level in the graphene can be strongly modulated by an external electric field. Therefore, the Schottky barrier height at the graphene/MoSe2 vdW interface is also modulated. We demonstrate a large current ON-OFF ratio of 105. These results point to the potential high performance of the graphene/MoSe2 vdW heterostructure for electronics applications.


Physical Review Letters | 2014

Cubic Rashba spin-orbit interaction of a two-dimensional hole gas in a strained-Ge/SiGe quantum well.

Rai Moriya; Kentarou Sawano; Yusuke Hoshi; Satoru Masubuchi; Yasuhiro Shiraki; Andreas Wild; Christian Neumann; G. Abstreiter; Dominique Bougeard; Takaaki Koga; Tomoki Machida

The spin-orbit interaction (SOI) of a two-dimensional hole gas in the inversion symmetric semiconductor Ge is studied in a strained-Ge/SiGe quantum well structure. We observe weak antilocalization (WAL) in the magnetoconductivity measurement, revealing that the WAL feature can be fully described by the k-cubic Rashba SOI theory. Furthermore, we demonstrate electric field control of the Rashba SOI. Our findings reveal that the heavy hole (HH) in strained Ge is a purely cubic Rashba system, which is consistent with the spin angular momentum m(j) = ± 3/2 nature of the HH wave function.


Applied Physics Letters | 2007

Electric-field control of tunneling magnetoresistance effect in a Ni∕InAs∕Ni quantum-dot spin valve

Kohei Hamaya; M. Kitabatake; Kenji Shibata; M. Jung; Minoru Kawamura; Kazuhiko Hirakawa; Tomoki Machida; Tomoyasu Taniyama; S. Ishida; Y. Arakawa

The authors demonstrate an electric-field control of tunneling magnetoresistance (TMR) effect in a semiconductor quantum-dot spin-valve device. By using ferromagnetic Ni nanogap electrodes, they observe the Coulomb blockade oscillations at a small bias voltage. In the vicinity of the Coulomb blockade peak, the TMR effect is significantly modulated and even its sign is switched by changing the gate voltage, where the sign of the TMR value changes at the resonant condition.

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Kenji Watanabe

National Institute for Materials Science

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Takashi Taniguchi

National Institute for Materials Science

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