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Featured researches published by Tõnis Arroval.


Polymer-plastics Technology and Engineering | 2015

Oxygen Barrier Properties of Al2O3- and TiO2-coated LDPE Films

Sven Lange; Tõnis Arroval; Rando Saar; Ilmar Kink; Jaan Aarik; Andres Krumme

Current work focuses on establishing optimal growth conditions for covering commercial grade polymer blown films with a gas barrier oxide layer. As opposed to regular solid state substrates, low density polymers host an abundance of free space in the form of pores and voids between large polymer chains (MW > 1000) and a heterogeneous crystallized phase. In the following we will show how the structural peculiarities of the polymer matrix influence the ALD process for growing TiO2 and Al2O3 gas blocking layers on top of the LDPE substrate. Possible causes of low gas barrier performance, thermal expansion coefficient differences, are proposed and commercial process additives, such as slip or antioxidants, are suggested. GRAPHICAL ABSTRACT


Nanotechnology | 2017

Enhanced flexibility and electron-beam-controlled shape recovery in alumina-coated Au and Ag core–shell nanowires

Sergei Vlassov; Boris Polyakov; Mikk Vahtrus; Magnus Mets; Mikk Antsov; Sven Oras; Aivar Tarre; Tõnis Arroval; Rünno Lõhmus; Jaan Aarik

The proper choice of coating materials and methods in core-shell nanowire (NW) engineering is crucial to assuring improved characteristics or even new functionalities of the resulting composite structures. In this paper, we have reported electron-beam-induced reversible elastic-to-plastic transition in Ag/Al2O3 and Au/Al2O3 NWs prepared by the coating of Ag and Au NWs with Al2O3 by low-temperature atomic layer deposition. The observed phenomenon enabled freezing the bent core-shell NW at any arbitrary curvature below the yield strength of the materials and later restoring its initially straight profile by irradiating the NW with electrons. In addition, we demonstrated that the coating efficiently protects the core material from fracture and plastic yield, allowing it to withstand significantly higher deformations and stresses in comparison to uncoated NW.


Thin Solid Films | 2013

Atomic layer deposition of TiO2 from TiCl4 and O3

Lauri Aarik; Tõnis Arroval; Raul Rammula; Hugo Mändar; Väino Sammelselg; Jaan Aarik


Journal of Crystal Growth | 2012

Atomic layer deposition of ferromagnetic iron oxide films on three-dimensional substrates with tin oxide nanoparticles

Aile Tamm; Mukesh C. Dimri; Jekaterina Kozlova; Aleks Aidla; Tanel Tätte; Tõnis Arroval; Uno Mäeorg; Hugo Mändar; Raivo Stern; Kaupo Kukli


Thin Solid Films | 2014

Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors

Lauri Aarik; Tõnis Arroval; Raul Rammula; Hugo Mändar; Väino Sammelselg; Boris Hudec; K. Hušeková; K. Fröhlich; Jaan Aarik


Thin Solid Films | 2012

Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

Kaupo Kukli; Jaan Aarik; Aleks Aidla; Indrek Jõgi; Tõnis Arroval; Jun Lu; Timo Sajavaara; Mikko Laitinen; Alma-Asta Kiisler; Mikko Ritala; Markku Leskelä; John Peck; Jim Natwora; Joan Geary; Ronald Spohn; Scott Houston Meiere; David Thompson


Semiconductor Science and Technology | 2012

Atomic layer deposition of high-permittivity TiO2?dielectrics with low leakage current on RuO2?in TiCl4-based processes

Jaan Aarik; Boris Hudec; K. Hušeková; Raul Rammula; Aarne Kasikov; Tõnis Arroval; Teet Uustare; K. Fröhlich


Thin Solid Films | 2016

Effect of substrate-enhanced and inhibited growth on atomic layer deposition and properties of aluminum–titanium oxide films

Tõnis Arroval; Lauri Aarik; Raul Rammula; Vegard Kruusla; Jaan Aarik


Journal of Crystal Growth | 2013

Atomic layer deposition of rutile-phase TiO2 on RuO2 from TiCl4 and O3: Growth of high-permittivity dielectrics with low leakage current

Jaan Aarik; Tõnis Arroval; Lauri Aarik; Raul Rammula; Aarne Kasikov; Hugo Mändar; Boris Hudec; K. Hušeková; K. Fröhlich


Physica Status Solidi (a) | 2014

Influence of growth temperature on the structure and electrical properties of high-permittivity TiO2 films in TiCl4-H2O and TiCl4-O3 atomic-layer-deposition processes

Tõnis Arroval; Lauri Aarik; Raul Rammula; Hugo Mändar; Jaan Aarik; Boris Hudec; K. Hušeková; K. Fröhlich

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Boris Hudec

Slovak Academy of Sciences

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K. Fröhlich

Slovak Academy of Sciences

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K. Hušeková

Slovak Academy of Sciences

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