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Publication
Featured researches published by Toshimasa Nakayama.
Advances in Resist Technology and Processing IV | 1987
Hidekatsu Kohara; Hatsuyuki Tanaka; Masanori Miyabe; Yoshiaki Arai; Shingo Asaumi; Toshimasa Nakayama
Optical lithography is achieving itself into submicron region. In the limitation of resolution for stepper there is a decrease in contrast and so it requires more exposure amount than that of D. Also it is not possible to achieve faithful transcription of fine pattern dimension. The resolution of TSMR-8800 which is developed as high resolution positive photoresist is 0.6 μm. Faithful transcription of the mask pattern is possible for 0.7 μm line and space pattern. It shows good properties compared with conventional photoresist.
Archive | 1986
Hidekatsu Kohara; Hatsuyuki Tanaka; Masanori Miyabe; Yoshiaki Arai; Shingo Asaumi; Toshimasa Nakayama
Archive | 1986
Hatsuyuki Tanaka; Hidekatsu Kohara; Yoshiyuki Sato; Shingo Asaumi; Toshimasa Nakayama; Akira Yokota; Hisashi Nakane
Archive | 1987
Hatsuyuki Tanka; Yoshiyuki Sato; Hidekatsu Kohara; Toshimasa Nakayama
Archive | 1988
Shingo Asaumi; Hidekatsu Kohara; Hatsuyuki Tanaka; Masanori Miyabe; Toshimasa Nakayama
Archive | 1987
Hidekatsu Kohara; Nobuo Tokutake; Masanori Miyabe; Toshimasa Nakayama; Shingo Asaumi; Hatsuyuki Tanaka; Yoshiaki Arai
Archive | 1988
Hatsuyuki Tanaka; Masakazu Kobayashi; Kazumasa Wakiya; Toshimasa Nakayama
Archive | 1987
Hatsuyuki Tanaka; Yoshiyuki Sato; Hidekatsu Kohara; Toshimasa Nakayama
Archive | 1987
Shingo Asaumi; Hidekatsu Kohara; Hatsuyuki Tanaka; Toshimasa Nakayama
Kobunshi Ronbunshu | 1996
Shingo Asaumi; Hidekatsu Kohara; Toshimasa Nakayama; Akira Yokota
