Ü. Özgür

A comprehensive review of ZnO materials and devices

The semiconductor ZnO has gained substantial interest in the research community in part because of its large exciton binding energy (60meV) which could lead to lasing action based on exciton recombination even above room temperature. Even though research focusing on ZnO goes back many decades, the renewed interest is fueled by availability of high-quality substrates and reports of p-type conduction and ferromagnetic behavior when doped with transitions metals, both of which remain controversial. It is this renewed interest in ZnO which forms the basis of this review. As mentioned already, ZnO is not new to the semiconductor field, with studies of its lattice parameter dating back to 1935 by Bunn [Proc. Phys. Soc. London 47, 836 (1935)], studies of its vibrational properties with Raman scattering in 1966 by Damen et al. [Phys. Rev. 142, 570 (1966)], detailed optical studies in 1954 by Mollwo [Z. Angew. Phys. 6, 257 (1954)], and its growth by chemical-vapor transport in 1970 by Galli and Coker [Appl. Phys. ...

On the efficiency droop in InGaN multiple quantum well blue light emitting diodes and its reduction with p-doped quantum well barriers

Multiple quantum well (MQW) InGaN light emitting diodes with and without electron blocking layers, with relatively small and large barriers, with and without p-type doping in the MQW region emitting at ∼420nm were used to determine the genesis of efficiency droop observed at injection levels of approximately ⩾50A∕cm2. Pulsed electroluminescence measurements, to avoid heating effects, revealed that the efficiency peak occurs at ∼900A∕cm2 current density for the Mg-doped barrier, near 550A∕cm2 for the lightly doped n-GaN injection layer, meant to bring the electron injection level closer to that of holes, and below 220A∕cm2 for the undoped InGaN barrier cases. For samples with GaN barriers (larger band discontinuity) or without p-AlGaN electron blocking layers the droop occurred at much lower current densities (⩽110A∕cm2). In contrast, photoluminescence measurements revealed no efficiency droop for optical carrier generation rates corresponding to the maximum current density employed in pulsed injection mea...

Refractive indices and absorption coefficients of MgxZn1−xO alloys

Indices of refraction for MgxZn1−xO epitaxial films grown by pulsed-laser deposition on sapphire substrates with x up to 0.36 were determined in the range of wavelength 457–968 nm by analysis of optical transmission spectra and prism-coupled waveguide measurements. The dispersion follows the first-order Sellmeier dispersion equation. Absorption coefficients, exciton energy gaps, and binding energies of MgxZn1−xO alloys were determined by transmission spectroscopy. The excitonic absorption features were clearly visible at room temperature despite alloy broadening. These results provide important information for the design and modeling of ZnO/MgZnO heterostructure optoelectronic devices.

Photoresponse of n-ZnO∕p-SiC heterojunction diodes grown by plasma-assisted molecular-beam epitaxy

High quality n-ZnO films on commercial p-type 6H–SiC substrates have been grown by plasma-assisted molecular-beam epitaxy, and n-ZnO∕p-SiC heterojunction mesa structures have been fabricated. Current-voltage characteristics of the structures had a very good rectifying diode-like behavior with a leakage current less than 2×10−4A∕cm2 at −10V, a breakdown voltage greater than 20V, a forward turn on voltage of ∼5V, and a forward current of ∼2A∕cm2 at 8V. Photosensitivity of the diodes was studied at room temperature and a photoresponsivity of as high as 0.045A∕W at −7.5V reverse bias was observed for photon energies higher than 3.0eV.

Stimulated emission and time-resolved photoluminescence in rf-sputtered ZnO thin films

Stimulated emission (SE) was measured from ZnO thin films grown on c-plane sapphire by rf sputtering. Free exciton transitions were clearly observed at 10 K in the photoluminescence (PL), transmission, and reflection spectra of the sample annealed at 950 °C. SE resulting from both exciton-exciton scattering and electron hole plasma formation was observed in the annealed samples at moderate excitation energy densities. The SE threshold energy density decreased with increasing annealing temperature up to ∼950 °C. The observation of low threshold exciton-exciton scattering-induced SE showed that excitonic laser action could be obtained in rf-sputtered ZnO thin films. At excitation densities below the SE threshold, time-resolved PL revealed very fast recombination times of ∼74 ps at room temperature, and no significant change at 85 K. The decay time for the SE-induced PL was below the system resolution of <45 ps.

High electron mobility in nearly lattice-matched AlInN∕AlN∕GaN heterostructure field effect transistors

High electron mobility was achieved in Al1−xInxN∕AlN∕GaN (x=0.20–0.12) heterostructure field effect transistors (HFETs) grown by metal-organic chemical vapor deposition. Reduction of In composition from 20% to 12% increased the room temperature equivalent two-dimensional-electron-gas density from 0.90×1013to1.64×1013cm−2 with corresponding electron mobilities of 1600 and 1410cm2∕Vs, respectively. The 10K mobility reached 17600cm2∕Vs for the nearly lattice-matched Al0.82In0.18N∕AlN∕GaN heterostructure with a sheet carrier density of 9.6×1012cm−2. For comparison, the AlInN∕GaN heterostructure without the AlN spacer exhibited a high sheet carrier density (2.42×1013cm−2) with low mobility (120cm2∕Vs) at room temperature. The high mobility in our samples is in part attributed to ∼1nm AlN spacer which significantly reduces the alloy scattering as well as provides a smooth interface. The HFETs having gate dimensions of 1.5×40μm2 and a 5μm source-drain separation exhibited a maximum transconductance of ∼200mS∕mm ...

Ordinary and extraordinary refractive indices for AlxGa1−xN epitaxial layers

Dispersion of the ordinary and extraordinary indices of refraction for wurtzite AlxGa1−xN epitaxial layers with x=0.00, 0.04, 0.08, 0.11, and 0.20 in the range of wavelengths 457<λ<980 nm were measured via a prism-coupled waveguide technique. The quantitative accuracy of x is ±10% and the accuracy of the refractive indices is ∼±0.01. The dispersion is found to be well described by a 1st-order Sellmeier dispersion formula. A simple functional form is presented that allows calculation of the refractive indices as functions of x and λ.

Epitaxial lateral overgrowth of (112¯2) semipolar GaN on (11¯00)m-plane sapphire by metalorganic chemical vapor deposition

The authors report the growth of semipolar (112¯2) GaN films on nominally on-axis (101¯0) m-plane sapphire substrates using metal organic chemical vapor deposition. High-resolution x-ray diffraction (XRD) results indicate a preferred (112¯2) GaN orientation. Moreover, epitaxial lateral overgrowth (ELO) of GaN was carried out on the (112¯2) oriented GaN templates. When the ELO stripes were aligned along [112¯0]sapphire, the Ga-polar wings were inclined by 32° with respect to the substrate plane with smooth extended nonpolar a-plane GaN surfaces and polar c-plane GaN growth fronts. When compared with the template, the on-axis and off-axis XRD rocking curves indicated significant improvement in the crystalline quality by ELO for this mask orientation (on-axis 1700arcsec for the template, 380arcsec for the ELO sample, when rocked toward the GaN m axis), as verified by transmission electron microscopy (TEM). For growth mask stripes aligned along [0001]sapphire with GaN m-plane as growth fronts, the surface was...

InGaN staircase electron injector for reduction of electron overflow in InGaN light emitting diodes

Ballistic and quasiballistic electron transport across the active InGaN layer are shown to be responsible for electron overflow and electroluminescence efficiency droop at high current levels in InGaN light emitting diodes both experimentally and by first-order calculations. An InGaN staircase electron injector with step-like increased In composition, an “electron cooler,” is proposed for an enhanced thermalization of the injected hot electrons to reduce the overflow and mitigate the efficiency droop. The experimental data show that the staircase electron injector results in essentially the same electroluminescence performance for the diodes with and without an electron blocking layer, confirming substantial electron thermalization. On the other hand, if no InGaN staircase electron injector is employed, the diodes without the electron blocking layer have shown significantly lower (three to five times) electroluminescence intensity than the diodes with the blocking layer. These results demonstrate a feasible method for the elimination of electron overflow across the active region, and therefore, the efficiency droop in InGaN light emitting diodes.

Systematic measurement of AlxGa1−xN refractive indices

Dispersion of the ordinary and extraordinary indices of refraction have been measured systematically for wurtzitic AlxGa1−xN epitaxial layers with 0.0⩽x⩽1.0 throughout the visible wavelength region. The dispersion, measured by a prism coupling waveguide technique, is found to be well described by a Sellmeier relation. Discrepancies among previous measurements of refractive index dispersion, as a consequence of different growth conditions and corresponding band gap bowing parameter, are reconciled when the Sellmeier relation is parameterized not by x but by band gap energy.