Ulrich Matejka

AIMS EUV first light imaging performance

Overcoming the challenges associated with photomask defectivity is one of the key aspects associated with EUV mask infrastructure. In addition to establishing specific EUV mask repair approaches, the ability to identify printable mask defects that require repair as well as to verify if a repair was successful are absolutely necessary. Such verification can only be performed by studying the repaired region using actinic light at an exact emulation of the scanner illumination conditions of the mask as can be done by the AIMSTM EUV. ZEISS, in collaboration with the SEMATECH EUVL Mask Infrastructure (EMI) consortium are currently developing the AIMSTM EUV system and have recently achieved First Light on the prototype system, a major achievement. First light results will be presented in addition to the current development status of the system.

Status of the AIMS(TM) EUV Project

In previous conferences the status of the AIMS™ EUV project has been presented in which the basic layout scheme and preliminary design have been shown along with the targeted performance specification levels to be met. Presently the final design milestone of the project has been successfully completed and assembly of the prototype tool is underway. The final design concept will be presented along with the current status of the tool and simulated performance data.