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Dive into the research topics where Hans-Jürgen Mann is active.

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Featured researches published by Hans-Jürgen Mann.


Optical Design and Engineering II | 2005

Reflective high-NA projection lenses

Hans-Jürgen Mann; Wilhelm Ulrich

Dioptric systems are usually the first choice for the design of an optical system, e.g. a projection lens or a microscope. But in some cases refractive designs suffer from serious drawbacks like chromatic aberration or material problems (cost, quality, absorption, birefringence, etc.). In such cases reflective systems are an attractive alternative. Reflective systems can be subdivided into two classes: on one hand there are systems with central pupil obscuration, e.g. reflective microscopes or telescopes in astronomy, which have a high aperture but only a small field size, on the other hand there are unobscured systems, e.g. reflective relay systems or EUV projection lenses, which have a large field but only small aperture. By the combination of an unobscured and an obscured mirror system one obtains systems with large field and high numerical aperture. We present new designs, which prove this design principle.


Archive | 2003

Projection system for EUV lithography

Russell Hudyma; Hans-Jürgen Mann; Udo Dinger


Archive | 2001

Reduction objective for extreme ultraviolet lithography

Udo Dinger; Hans-Jürgen Mann


Archive | 2005

High aperture lens with an obscured pupil

Hans-Jürgen Mann; David Shafer; Wilhelm Ulrich


Archive | 2004

Projection Lens for a Microlithographic Projection Exposure Apparatus

Toralf Gruner; Hans-Jürgen Mann


Archive | 2003

Projection objective for a projection exposure apparatus

Wilhelm Ulrich; Johannes Wangler; Hans-Jürgen Mann; Wolfgang Singer


Archive | 2005

Objective lens esp. as micro-lithography projection objective, has objective divided into first part-objective with single mirror and second part-objective with primary and secondary mirror

Hans-Jürgen Mann; David Fairfield Shafer; Wilhelm Ulrich


Archive | 2007

Groupwise corrected objective

Michael Schottner; Hans-Jürgen Mann; Martin Lowisch


Archive | 2011

ILLUMINATION OPTICS FOR A METROLOGY SYSTEM FOR EXAMINING AN OBJECT USING EUV ILLUMINATION LIGHT AND METROLOGY SYSTEM COMPRISING AN ILLUMINATION OPTICS OF THIS TYPE

Hans-Jürgen Mann; Alois Herkommer


Archive | 2009

Spiegel zur Verwendung in einer Mikrolithographie-Projektionsbelichtungsanlage

Hartmut Enkisch; Hans-Jürgen Mann; Sascha Migura; Oliver Natt; Martin Rocktäschel; Franz-Josef Stickel

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