V. Mikhelashvili

InP based lasers and optical amplifiers with wire-/dot-like active regions

Long wavelength lasers and semiconductor optical amplifiers based on InAs quantum wire-/dot-like active regions were developed on InP substrates dedicated to cover the extended telecommunication wavelength range between 1.4 and 1.65 µm. In a brief overview different technological approaches will be discussed, while in the main part the current status and recent results of quantum-dash lasers are reported. This includes topics like dash formation and material growth, device performance of lasers and optical amplifiers, static and dynamic properties and fundamental material and device modelling. (Some figures in this article are in colour only in the electronic version)

Effects of annealing conditions on optical and electrical characteristics of titanium dioxide films deposited by electron beam evaporation

We report measured evolutions of the optical band gap, refractive index, and relative dielectric constant of TiO2 film obtained by electron beam gun evaporation and annealed in an oxygen environment. A negative shift of the flat band voltage with increasing annealing temperatures, for any film thickness, is observed. A dramatic reduction of the leakage current by about four orders of magnitude to 5×10−6 A/cm2 (at 1 MV/cm) after 700 °C and 60 min annealing is found for films thinner than 15 nm. An equivalent SiO2 thickness of the order of 3–3.5 nm is demonstrated. An approach is presented to establish that at different ranges of applied voltage the hopping, space charge limited current, and Fowler–Nordheim are the basic mechanisms of carrier transport into the TiO2 film.

Structural and electrical properties of electron beam gun evaporated Er2O3 insulator thin films

We present a detailed study of the evolution with annealing temperature (in an oxygen environment) of the morphological and structural properties of thin erbium oxide (Er2O3) films evaporated in an electron beam gun system. The electrical characteristics of metal-oxide-semiconductor structures are also described. Atomic force microscope and x-ray difractometry were used to map out the morphology and crystalline nature of films ranging in thickness from 4.5 to 100 nm. High-resolution cross-sectional transmission electron microscopy imaging and Auger electron spectroscopy reveal three sublayers: an outer dense nanocrystalline Er2O3 layer, a middle transition layer and amorphous SiO2 film placed close to the Si substrate. The effective dielectric constant depends on the thickness and the annealing temperature. A 1–2.8 nm interfacial SiO2 layer as well as an ErO inclusion with low polarizability are formed during the deposition and the annealing process has a profound effect on the dielectric constant and the leakages. The minimum effective oxide thickness is 2.4–2.8 nm and in the thinnest films we obtained a leakage current density as low as 1–5×10−8 A/cm2 at an electric field of 1 MV/cm. We observe a shift of the flatband voltage to the positive side and significant lowering of the positive charge down to ∼1×1010 cm−2. For a 4.5 nm film, the maximum total breakdown electric field was approximately 1×107 V/cm.We present a detailed study of the evolution with annealing temperature (in an oxygen environment) of the morphological and structural properties of thin erbium oxide (Er2O3) films evaporated in an electron beam gun system. The electrical characteristics of metal-oxide-semiconductor structures are also described. Atomic force microscope and x-ray difractometry were used to map out the morphology and crystalline nature of films ranging in thickness from 4.5 to 100 nm. High-resolution cross-sectional transmission electron microscopy imaging and Auger electron spectroscopy reveal three sublayers: an outer dense nanocrystalline Er2O3 layer, a middle transition layer and amorphous SiO2 film placed close to the Si substrate. The effective dielectric constant depends on the thickness and the annealing temperature. A 1–2.8 nm interfacial SiO2 layer as well as an ErO inclusion with low polarizability are formed during the deposition and the annealing process has a profound effect on the dielectric constant and the...

Characteristics of electron-beam-gun-evaporated Er2O3 thin films as gate dielectrics for silicon

Structural properties of an ultrathin, 4.5 nm, erbium-oxide film and electrical properties of metal–oxide–semiconductor structure based on it are described. The evolution of the dielectric constant, total charge density, breakdown electric field, and leakage current density with annealing temperature in an oxygen environment are reported. The dielectric constant in the as-deposited state is relatively low, ∼7, possibly because the initial deposition forms ErO (with low polarizibility) rather than Er2O3. Annealing causes a transformation of ErO to Er2O3 but at the same time it initiates the growth of an interfacial SiO2 layer so that the effective dielectric constant is reduced to 5.5. Using the 4.5 nm film following annealing at up to 750 °C, we demonstrate an effective oxide thickness in the range 2.4–3.2 nm, with a leakage current density as low as 1–2×10−8 A/cm2 at an electric field of 106 V/cm and a breakdown electric field of 0.8–1.7×107 V/cm. A shift of the flat band voltage to the positive side and...

On the nature of quantum dash structures

We describe a theoretical model for the linear optical gain properties of a quantum wire assembly and compare it to the well known case of a quantum dot assembly. We also present a technique to analyze the gain of an optical amplifier using bias dependent room temperature amplified spontaneous emission spectra. Employing this procedure in conjunction with the theoretical gain model, we demonstrate that InAs/InP quantum dash structures have quantum-wire-like characteristics. The procedure was used to extract the net gain coefficient, the differential gain, and the relative current component contributing to radiative recombination.

Structural properties and electrical characteristics of electron-beam gun evaporated erbium oxide films

We report properties of Er2O3 films deposited on silicon using electron-beam gun evaporation. We describe the evolution with thickness and annealing temperature of the morphology, structure, and electrical characteristics. An effective relative dielectric constant in the range of 6–14, a minimum leakage current density of 1–2×10−8 A/cm2 at an electric field of 106 V/cm and breakdown electric field of 0.8–1.7×107 V/cm are demonstrated. Breakdown electric field and leakage current densities are correlated with the surface morphology. The obtained characteristics make the Er2O3 films a promising substitute for SiO2 as an ultrathin gate dielectric.

On the extraction of linear and nonlinear physical parameters in nonideal diodes

We describe a parameter extraction technique for the simultaneous determination of physical parameters in nonideal Schottky barrier, p-n and p-i-n diodes. These include the ideality factor, saturation current, barrier height, and linear or nonlinear series, and parallel leakage resistances. The suggested technique which deals with the extraction of bias independent parameters makes use of the forward biased current–voltage (I–V) characteristics and the voltage-dependent differential slope curve α(V)=[d(ln I)]/[d(ln V)]. The method allows (a) establishment of the current flow mechanisms at low and high bias levels, (b) extensive of the permissible ranges of determined parameters beyond what is possible in other published methods, and (c) to automation and computerization of the measurement processes. The method is verified experimentally using metal–semiconductor structures based on Si, InGaP, and HgCdTe as well as an InGaAs/InGaAsP multiple quantum well laser diode exemplifying a p-n junction.

Extraction of Schottky diode parameters with a bias dependent barrier height

We describe a technique to extract device parameters of a Schottky barrier diode whose barrier height is bias dependent and which contains a linear series resistance. The extracted parameters include the saturation current (zero bias barrier height), the voltage dependence of the barrier height and of the ideality factor as well as series resistance. The technique makes use of forward biased current‐voltageOI‐VU characteristic and voltage-dependent diAerential slope curve aa dl nI OU = dl nV OU . The method is verified using simulated and experimental I‐V curves of an Al‐pSi structure. The proposed procedure is not limited to Schottky barrier diodes but may be applied to other diode types based on P‐N junction. ” 2001 Elsevier Science Ltd. All rights reserved.

Structural evolution of SnO2TiO2 nanocrystalline films for gas sensors

Thin films (50‐200 nm) of SnO2TiO2 were deposited on SiO2:(001)Si substrates by RF-sputtering and by molecular beam before they were annealed in vacuum at 200‐900°C. In-situ TEM, XRD, SEM, Raman and IR-spectroscopy were used to analyze the structure transformations in the SnO2TiO2 films. In the as-deposited state, the films are amorphous. They crystallize at higher temperatures (starting at about 500°C) forming nanosized grains. The problem of the spinodal decomposition in the SnO2TiO2 system observed earlier at high temperatures is discussed also for low-temperature processing. The stoichiometry of the films of both groups (reactive ion sputtered and high-vacuum e-gun sputtered) is being compared.

Gain and noise saturation of wide-band InAs-InP quantum dash optical amplifiers: model and experiments

We present a theoretical model for gain and noise saturation in quantum dash (QDash) semiconductor optical amplifiers. The model is based on the density matrix formalism and addresses static saturation spectra. The calculations are confirmed by a series of experiments which highlight the unique properties of these amplifiers. We demonstrate a high gain, a wide bandwidth, and high saturation power. The saturation spectrum is shown to be asymmetric, emphasizing saturation at short wavelength. The asymmetry stems from the high energy tail of the density of state function in those quantum wire (QWire) like gain media as well as from the interactions with the wetting layer.