Vasile-Danut Cojocaru

Recrystallization temperature influence upon texture evolution of a SPD processed Ti-Nb-Ta-Zr-O alloy

The present study investigates the texture features occurred during recrystallization of a Ti-29Nb-9Ta-10Zr-0.2O (wt.%) alloy processed by multi-pass cold-rolling, up to 90% thickness reduction. Data concerning alloy component phases and the lattice parameters of identified phases were obtained and analysed for all thermo-mechanical processing stages. Crystallographic texture changes occurred during alloy thermo-mechanical processing (coldrolling and recrystallization), were investigated using X-ray diffraction; by acquiring the pole figures data of the main β-Ti phase. Data concerning observed texture components and texture fibers was analysed using 1 – Φ – 2 Bunge system in 2 = 0° and 45° sections. The γ textural fiber was analysed for all thermo-mechanical processing stages.

Texture analysis for a nanocrystalline Ti-Ta-Nb alloy

Titanium alloys are extensively used in a variety of applications due to their good mechanical properties and corrosion resistance. Recently, β-type Ti alloys composed of non-toxic elements have received much attention, because they feature not only high specific strength, bio-corrosion resistance, no allergic problems and biocompatibility. A Ti-25Ta-25Nb β-type titanium alloy was subjected to Severe Plastic Deformation processing and testing with the aim to observe the texture developed during SPD processing. Data concerning the pole figure and Orientation Distribution Function (ODF) for the (110), (200) and (211) β-Ti peaks was obtained by XRD investigations.

Characterization of Ti-O-N films deposited on Ti-Ta-Nb substrate by plasma laser deposition

In present days in-depth behaviour characterization of multifunctional deposited films for MEMS/BIO-MEMS applications, showed the need of adequate properties, in order to assure the demanded designed functions for envisaged applications, such as: physical, chemical, mechanical, tribological and biocompatible. The development of new materials for films deposition with high potential to be used in BIO-MEMS applications is a goal at national an international level. Recently, a new class of deposition materials consist in metal-oxy-nitrides Me-O-N (Me — transition metal) has been started to be investigated, because has been showed that the oxygen presence has as effect obtaining of mixture of specific properties for both nitrides (Me-N) and oxides (Me-O). A way to tailor the specific properties for deposited film consist in modifying the ratio O/N, in this way the deposited film specific properties are directed more towards to oxides/nitrides properties. In this paper partially data concerning O/N ratio influence upon films characteristics are presented.