Vladimir Nagorny
Mattson Technology, Inc.
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Publication
Featured researches published by Vladimir Nagorny.
advanced semiconductor manufacturing conference | 2015
Vladimir Nagorny; Vijay Vaniapura; Vijay Surla
High Efficiency plasma Source (HES) was proposed before for use in a dry strip process [1]. Some extremely high ash rate significantly exceeding 10um/min from reference blanket photoresist wafer has been achieved. HES performance with different process chemistries, reliability of the source and repeatability of results was validated under many conditions, including extreme ones, such as cycling very long processes at high power (5kW). Repeatable process results with reliable hardware performance were obtained from the tool equipped with HES plasma source in a regular 300mm configuration. In this paper we report some of these results as well as some data from 450mm C&F process chamber.
Archive | 2011
Vladimir Nagorny; Dongsoo Lee; Andreas Kadavanich
Archive | 2007
Martin Zucker; Daniel J. Devine; Vladimir Nagorny; Jonathan Mohn
Archive | 2010
Valery A. Godyak; Charles Crapuchettes; Vladimir Nagorny
Archive | 2012
Vladimir Nagorny; Charles Crapuchettes
Archive | 2016
Vladimir Nagorny
Archive | 2014
Vladimir Nagorny; Steven Parks; Martin Zucker
Archive | 2010
Valery A. Godyak; Charles Crapuchettes; Vladimir Nagorny
Archive | 2010
Martin Zucker; Daniel J. Devine; Vladimir Nagorny; Jonathan Mohn
Archive | 2009
Valery A. Godyak; Vladimir Nagorny; Dongsoo Lee
