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Dive into the research topics where Volker Haerle is active.

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Featured researches published by Volker Haerle.


Light-emitting diodes : research, manufacturing, and applications. Conference | 2003

Light extraction technologies for high efficiency GaInN-LED devices

Volker Haerle; Berthold Hahn; Stephan Kaiser; Andreas Weimar; Dominik Eisert; Stefan Bader; Andreas Ploessl; Franz Eberhard

Data are presented for an GaInN based thinfilm LED. The LED is fabricated by transferring the epilayers with laser lift off from sapphire to a GaAs host substrate. In combination with efficient surface roughening and highly reflective p-mirror metallisation an extraction efficiency of 70% and wall plug efficiency of 24% at 460nm have been shown. The chips showed 12mW @ 20mA with a Voltage of 3.2V. The technology is scalable from small size LEDs to high current Chips and is being transferred to mass production.


Novel In-Plane Semiconductor Lasers III | 2004

Nitride-based in-plane laser diodes with vertical currrent path

Ulrich T. Schwarz; Werner Wegscheider; Alfred Lell; Volker Haerle

The realization of group III--nitride laser diodes with a vertical current path on a n-conducting SiC substrate is described. The vertical current path and the possibility of cleaved laser facets result in a simpler process technology. Gain spectra measured by the Hakki-Paoli method show a modulation of the modal gain due to parasitic modes in the SiC substrate. As up to now no defect reduction technique was successfully transfered to GaN on SiC, degradation is the major issue. We discuss the impact of degradation on the gain spectra, facet degradation, and rule out formation of cracks during degradation. We show that the high heat conductivity of SiC may give an advantage with respect to degradation as it results in a only moderate temperature rise of the active region.


Archive | 2001

Radiation emitting semiconductor device

Dominik Eisert; Volker Haerle; Frank Kuehn; Manfred Mundbrod-Vangerow; Uwe Strauss; Ulrich Zehnder


Physica Status Solidi (a) | 2004

High brightness LEDs for general lighting applications Using the new ThinGaN™-Technology

Volker Haerle; Berthold Hahn; Stephan Kaiser; Andreas Weimar; Stefan Bader; Franz Eberhard; Andreas Plössl; Dominik Eisert


Archive | 2004

Method for the production of semi-conductor chips

Georg Bruederl; Berthold Hahn; Volker Haerle


Archive | 2000

Radiation-emitting semiconductor element has a semiconductor body formed by a stack of different semiconductor layers based on gallium nitride

Volker Haerle; Stefan Bader; Berthold Hahn; Hans-Juergen Lugauer


Archive | 2000

Lichtemittierendes Bauelement mit verbesserter Lichtauskopplung und Verfahren zu seiner Herstellung

Dominik Eisert; Volker Haerle; Frank Kuehn; Manfred Mundbrod-Vangerow; Uwe Strauß; Ulrich Zehnder


Archive | 2000

Radiation-emitting semiconductor component used in semiconductor devices has multiple layer structure, and radiation-permeable window

Dominik Eisert; Volker Haerle; Frank Kuehn; Manfred Mundbrod-Vangerow; Uwe Strauß; Ulrich Zehnder


Archive | 2000

Contact metallization used in production of semiconductors contains copper distributed in partial volume

Claudia Arnold; Georg Bruederl; Volker Haerle; Alfred Lell; Andreas Weimar


Archive | 2002

Production of a semiconductor component used in the production of substrate-less luminescent diodes comprises separating a semiconductor layer from a substrate by irradiating with a laser beam having a plateau-shaped spatial beam profile

Andreas Ploesl; Volker Haerle; Stephan Kaiser; Berthold Hahn; Michael Fehrer; Frank Otte

Collaboration


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Berthold Hahn

Osram Opto Semiconductors GmbH

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Dominik Eisert

Osram Opto Semiconductors GmbH

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Ulrich Zehnder

Osram Opto Semiconductors GmbH

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Michael Fehrer

Osram Opto Semiconductors GmbH

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Stefan Bader

Osram Opto Semiconductors GmbH

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Johannes Baur

Osram Opto Semiconductors GmbH

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Uwe Strauß

Osram Opto Semiconductors GmbH

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Hans-Juergen Lugauer

Osram Opto Semiconductors GmbH

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Frank Kuehn

Osram Opto Semiconductors GmbH

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