W. R. Trutna
Hewlett-Packard
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Featured researches published by W. R. Trutna.
Optics Letters | 1988
P. Zorabedian; W. R. Trutna
We compared the angular alignment tolerance and the tuning range of a novel interference-filter-tuned semiconductor external-cavity laser based on a degenerate resonator with characteristics similar to those of a conventional grating-tuned external-cavity laser using a 1300-nm In GaAsP Fabry-Perot laser with an antireflection-coated facet as the gain medium. The interference-filter cavity had a 260-fold greater alignment tolerance (+/-26 versus +/-0.1 mrad) and nearly the same tuning range (90 versus 110 nm) as the grating-tuned cavity.
Optics Letters | 1987
W. R. Trutna; D. K. Donald; Moshe Nazarathy
Single-mode operation of a monolithic semiconductor-laser-pumped unidirectional ring Nd:YAG laser has been demonstrated at 1319 and 1338 nm. The ring design optimizes the polarization eigenvalue difference between counterpropagating modes of the ring. The laser threshold is 4.5 mW, and the magnetic-field requirement for unidirectional operation is approximately 100 G.
Optics Letters | 1993
W. R. Trutna; David W. Dolfi; Curt A. Flory
Integrated-optic acousto-optic filters have large asymmetric sidelobes that have not been explained in previous publications. We show that this is caused by waveguide birefringence nonuniformity. For the devices described here, the dominant cause of the nonuniformity is a thermal gradient associated with the generation and absorption of the surface acoustic wave. When the thermal birefringence gradient is included in the coupled-mode model, asymmetric sidelobes in good agreement with observations are predicted. In addition, we show that waveguide inhomogeneities also lead to birefringence nonuniformity and can be used to tailor the birefringence to supress sidelobes in a two-section acousto-optic filter.
Optics Letters | 1993
Lewis B. Aronson; Glenn Rankin; W. R. Trutna; David W. Dolfi
A two-section integrated acousto-optic tunable filter with significantly reduced sidelobes has been fabricated. The sidelobe reduction was achieved with birefringence apodization in the form of variable-width Ti-stripe waveguides. The design and fabrication of the device, which includes integrated proton-exchanged TE and TM-pass polarizers, are described. Experimental tuning curves for each filter section and the overall device are presented and compared with calculated results. The largest sidelobes were found to be 24 dB below the peak transmission, which represents a 5.3-dB improvement over an ideal filter without birefringence apodization. The FWHM of the filter is 1.36 nm, which is only 16% larger than predicted for its interaction length of 17 mm/section.
Optics Letters | 1990
P. Zorabedian; W. R. Trutna
We have demonstrated an alignment-stabilized cavity configuration for a grating-tuned external-cavity semiconductor laser using a cylinder lens to form a line focus on the surface of the grating. The grating in the stabilized cavity has a 350-fold greater angular misalignment tolerance than in a conventional collimated-beam cavity, while the same spectral resolution is maintained.
Applied Physics Letters | 1986
David K. Donald; S.Y. Wang; Tirumala R. Ranganath; Steven A. Newton; W. R. Trutna
Up to 20 dB of photocurrent amplification with a frequency response of 2 GHz has been observed in GaAs Schottky photodiodes. The amplification may be caused by a reduction in Schottky built‐in potential under illumination. The device may find application in improving the sensitivity of optical receivers.
Optics Letters | 1990
W. R. Trutna; D. K. Donald
A two-piece, single-mode, piezoelectrically tuned Nd:YAG ring laser has been demonstrated at 1338 nm. The laser was derived from a previously demonstrated monolithic unidirectional ring laser that has been cut in two to allow the cavity to be tuned by varying the gap between the two pieces. More than 1 mW of output power was produced when the laser was pumped by a 30-mW, 809-nm GaAlAs semiconductor laser. Continuous tuning over the 13.5-GHz longitudinal mode spacing with millisecond sweep times was demonstrated.
Optical Microlithography III: Technology for the Next Decade | 1984
W. R. Trutna; Mung Chen
A diffraction grating alignment system has been demonstrated on a GCA stepper. Registration of better than 0.2 microns, 3 sigma has been achieved on NMOS production wafers.
Archive | 1983
W. R. Trutna
Archive | 1981
Mung Chen; W. R. Trutna; Michael P.C. Watts; Keith G. Bartlett; Gary Hillis