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Walter Zygmunt

Applied Materials

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Publication

Featured researches published by Walter Zygmunt.

Archive | 2005

HDP-CVD deposition process for filling high aspect ratio gaps

Zhengquan Tan; Dongqing Li; Walter Zygmunt

Archive | 2003

Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD

Zhengquan Tan; Dongqing Li; Walter Zygmunt; Tetsuya Ishikawa

Archive | 1999

Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using differential plasma power

Pravin K. Narwankar; Sameer Desai; Walter Zygmunt; Laxman Murugesh

Archive | 2008

HDP-CVD SiON films for gap-fill

Hemant P. Mungekar; Young S. Lee; Agnieszka Jakubowicz; Zhong Qiang Hua; Rionard Purnawan; Sanjay Kamath; Walter Zygmunt

Archive | 2000

Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps through wafer heating

Pravin K. Narwankar; Sameer Desai; Walter Zygmunt; Laxman Murugesh

Archive | 2003

Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using RF power

Pravin K. Narwankar; Sameer Desai; Walter Zygmunt; Laxman Murugesh

Archive | 1999

Method and apparatus for forming a layer on a substrate by high-density plasma chemical vapor deposition (HDP-CVD)

Sandeep A. Desai; Laxman Murugesh; Pravin K. Narwankar; Walter Zygmunt

Archive | 1999

Verfahren und vorrichtung zur profiländerung von lücken mit hohem aspektverhältnis durch anwendung von differentialplasmaenergie Method and device for profile modification of high aspect ratio gaps by application of differential plasma energy

Sameer Desai; Laxman Murugesh; Pravin K. Narwankar; Walter Zygmunt

Archive | 1999

Verfahren und Vorichtung zur Abscheidung eines Filmes auf einem Substrat mittels CVD mit hoher Plasmadichte (HDP-CVD)

Sandeep A. Desai; Laxman Murugesh; Pravin K. Narwankar; Walter Zygmunt

Archive | 1999

Verfahren und vorrichtung zur profiländerung von lücken mit hohem aspektverhältnis durch anwendung von differentialplasmaenergie A method and apparatus for profile change of gaps with a high aspect ratio by application of differential plasma energy

Pravin K. Narwankar; Sameer Desai; Walter Zygmunt; Laxman Murugesh

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Collaboration

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Laxman Murugesh

Applied Materials

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Pravin K. Narwankar

Applied Materials

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Sameer Desai

Applied Materials

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Dongqing Li

Applied Materials

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Sandeep A. Desai

Applied Materials

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Zhengquan Tan

Applied Materials

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Agnieszka Jakubowicz

Applied Materials

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Hemant P. Mungekar

Applied Materials

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Rionard Purnawan

Applied Materials

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Sanjay Kamath

Applied Materials

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