Wilhelm Knobloch

Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive

Positive photoresists with enhanced resolution and reduced crystallization containing novel tetra(hydroxyphenyl)alkanes

Epoxy resins based on triglycidyl isocyanurate

Positive photo resist with increased dissolving power and reduced crystallisation tendency as well as new tetra(hydroxyphenyl)alkane

Tetra (hydroxphenyl) alkanes

Curable laminating varnishes based on an epoxy resin and dicyandiamide.

Epoxy resin based on triglycidylisocyanurate

Epoxidharze auf Basis von Triglycidylisocyanurat

Positiv-Fotoresists mit erhöhtem Auflösungsvermögen und geringer Kristallisationsneigung, sowie neue Tetra(hydroxyphenyl)alkane Positive photoresists with higher resolution and less tendency to crystallize, and new tetra (hydroxyphenyl) alkanes

Positive photoresists having increased resolution and a low crystallization tendency as well as new Tetra (hydroxyphenyl) alkanes