William A. Steele

Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces

The optical damage threshold of indentation-induced flaws on fused silica surfaces was explored. Mechanical flaws were characterized by laser damage testing, as well as by optical, secondary electron, and photoluminescence microscopy. Localized polishing, chemical leaching, and the control of indentation morphology were used to isolate the structural features that limit optical damage. A thin defect layer on fracture surfaces, including those smaller than the wavelength of visible light, was found to be the dominant source of laser damage initiation during illumination with 355 nm, 3 ns laser pulses. Little evidence was found that either displaced or densified material or fluence intensification plays a significant role in optical damage at fluences >35 J/cm(2). Elimination of the defect layer was shown to increase the overall damage performance of fused silica optics.

High fluence laser damage precursors and their mitigation in fused silica

The use of any optical material is limited at high fluences by laser-induced damage to optical surfaces. In many optical materials, the damage results from a series of sources which initiate at a large range of fluences and intensities. Much progress has been made recently eliminating silica surface damage due to fracture-related precursors at relatively low fluences (i.e., less than 10 J/cm(2), when damaged by 355 nm, 5 ns pulses). At higher fluence, most materials are limited by other classes of damage precursors which exhibit a strong threshold behavior and high areal density (>10(5) cm(-2)); we refer to these collectively as high fluence precursors. Here, we show that a variety of nominally transparent materials in trace quantities can act as surface damage precursors. We show that by minimizing the presence of precipitates during chemical processing, we can reduce damage density in silica at high fluence by more than 100 times while shifting the fluence onset of observable damage by about 7 J/cm(2). A better understanding of the complex chemistry and physics of cleaning, rinsing, and drying will likely lead to even further improvements in the damage performance of silica and potentially other optical materials.

Laser Damage Precursors in Fused Silica

There is a longstanding, and largely unexplained, correlation between the laser damage susceptibility of optical components and both the surface quality of the optics, and the presence of near surface fractures in an optic. In the present work, a combination of acid leaching, acid etching, and confocal time resolved photoluminescence (CTP) microscopy has been used to study laser damage initiation at indentation sites. The combination of localized polishing and variations in indentation loads allows one to isolate and characterize the laser damage susceptibility of densified, plastically flowed and fractured fused silica. The present results suggest that: 1) laser damage initiation and growth are strongly correlated with fracture surfaces, while densified and plastically flowed material is relatively benign, and 2) fracture events result in the formation of an electronically defect rich surface layer which promotes energy transfer from the optical beam to the glass matrix.

Thermal annealing of laser damage precursors on fused silica surfaces

Abstract. Previous studies have identified two significant precursors of laser damage on fused silica surfaces at fluences <35  J/cm2: photoactive impurities from polishing and surface fractures. We evaluate isothermal heating as a means of remediating the defect structure associated with surface fractures. Vickers indentations are applied to silica surfaces at loads between 0.5 and 10 N, creating fracture networks. The indentations are characterized before and following thermal annealing under various time and temperature conditions using confocal time-resolved photo-luminescence (CTP) imaging, and R/1 damage testing with 3-ns, 355-nm laser pulses. Improvements in the damage thresholds with reductions in CTP intensity are observed at temperatures well below the glass transition temperature (Tg). The damage threshold on 0.5-N indentations improves from <8 to >35  J/cm2 after annealing at approximately 750°C. Larger fracture networks require longer or higher temperature treatment to achieve similar results. At an annealing temperature >1100°C, optical microscopy indicates morphological changes in some of the fractures surrounding the indentations, although remnants of the original fractures are still observed. We demonstrate the potential of using isothermal annealing to improve the laser damage resistance of silica optics, and provide a means of further understanding the physics of optical damage and mitigation.

MRF applications: measurement of process-dependent subsurface damage in optical materials using the MRF wedge technique

Understanding the behavior of fractures and subsurface damage in the processes used during optic fabrication plays a key role in determining the final quality of the optical surface finish. During the early stages of surface preparation, brittle grinding processes induce fractures at or near an optical surface whose range can extend from depths of a few μm to hundreds of μm depending upon the process and tooling being employed. Controlling the occurrence, structure, and propagation of these sites during subsequent grinding and polishing operations is highly desirable if one wishes to obtain high-quality surfaces that are free of such artifacts. Over the past year, our team has made significant strides in developing a diagnostic technique that combines magnetorheological finishing (MRF) and scanning optical microscopy to measure and characterize subsurface damage in optical materials. The technique takes advantage of the unique nature of MRF to polish a prescribed large-area wedge into the optical surface without propagating existing damage or introducing new damage. The polished wedge is then analyzed to quantify subsurface damage as a function of depth from the original surface. Large-area measurement using scanning optical microscopy provides for improved accuracy and reliability over methods such as the COM ball-dimple technique. Examples of the techniques use will be presented that illustrate the behavior of subsurface damage in fused silica that arises during a variety of intermediate optical fabrication process steps.

MRF applications: on the road to making large-aperture ultraviolet laser resistant continuous phase plates for high-power lasers

Over the past two years we have developed MRF tools and procedures to manufacture large-aperture (430 X 430 mm) continuous phase plates (CPPs) that are capable of operating in the infrared portion (1053 nm) of high-power laser systems. This is accomplished by polishing prescribed patterns of continuously varying topographical features onto finished plano optics using MRF imprinting techniques. We have been successful in making, testing, and using large-aperture CPPs whose topography possesses spatial periods as low as 4 mm and surface peak-to-valleys as high as 8.6 microns. Combining this application of MRF technology with advanced MRF finishing techniques that focus on ultraviolet laser damage resistance makes it potentially feasible to manufacture large-aperture CPPs that can operate in the ultraviolet (351 nm) without sustaining laser-induced damage. In this paper, we will discuss the CPP manufacturing process and the results of 351-nm/3-nsec equivalent laser performance experiments conducted on large-aperture CPPs manufactured using advanced MRF protocols.

Silica laser damage mechanisms, precursors, and their mitigation

Controlling laser damage is essential for reliable and cost-effective operation of high energy laser systems. We will review important optical damage precursors in silica up to UV fluences as high as 45J/cm2 (3ns) along with studies of the damage mechanisms involved and processes to mitigate damage precursors. We have found that silica surface damage is initiated by nano-scale precursor absorption followed by thermal coupling to the silica lattice and formation of a laser-supported absorption front. Residual polishing compound and defect layers on fracture surfaces are primarily responsible for optic damage below about 10J/cm2; they can be mitigated by an optimized oxide etch processes. At fluences above about 10J/cm2, precipitates of trace impurities are responsible for damage; they can be mitigated by eliminating the chances of impurity precipitation following wet chemical processing. Using these approaches, silica damage densities can be reduced by many orders of magnitude allowing large increases in the maximum operating fluences these optics see.

Impact of substrate surface scratches on the laser damage resistance of multilayer coatings

Substrate scratches can limit the laser resistance of multilayer mirror coatings on high-peak-power laser systems. To date, the mechanism by which substrate surface defects affect the performance of coating layers under high power laser irradiation is not well defined. In this study, we combine experimental approaches with theoretical simulations to delineate the correlation between laser damage resistance of coating layers and the physical properties of the substrate surface defects including scratches. A focused ion beam technique is used to reveal the morphological evolution of coating layers on surface scratches. Preliminary results show that coating layers initially follow the trench morphology on the substrate surface, and as the thickness increases, gradually overcoat voids and planarize the surface. Simulations of the electrical-field distribution of the defective layers using the finite-difference timedomain (FDTD) method show that field intensification exists mostly near the top surface region of the coating near convex focusing structures. The light intensification could be responsible for the reduced damage threshold. Damage testing under 1064 nm, 3 ns laser irradiation over coating layers on substrates with designed scratches show that damage probability and threshold of the multilayer depend on substrate scratch density and width. Our preliminary results show that damage occurs on the region of the coating where substrate scratches reside and etching of the substrate before coating does not seem to improve the laser damage resistance.

Quasi-continuum photoluminescence: Unusual broad spectral and temporal characteristics found in defective surfaces of silica and other materials

We previously reported a novel photoluminescence (PL) with a distribution of fast decay times in fused silica surface flaws that is correlated with damage propensity by high fluence lasers. The source of the PL was not attributable to any known silica point defect. Due to its broad spectral and temporal features, we here give this PL the name quasi-continuum PL (QC-PL) and describe the features of QC-PL in more detail. The primary features of QC-PL include broad excitation and emission spectra, a broad distribution of PL lifetimes from 20 ps to 5 ns, continuous shifts in PL lifetime distributions with respect to emission wavelength, and a propensity to photo-bleach and photo-brighten. We found similar PL characteristics in surface flaws of other optical materials, including CaF2, DKDP, and quartz. Based on the commonality of the features in different optical materials and the proximity of QC-PL to surfaces, we suggest that these properties arise from interactions associated with high densities of defects,...

Modeling Wet Chemical Etching of Surface Flaws on Fused Silica

Fluoride-based wet chemical etching of fused silica optical components is useful to open up surface fractures for diagnostic purposes, to create surface topology, and as a possible mitigation technique to remove damaged material. To optimize the usefulness of etching, it is important to understand how the morphology of etched features changes as a function of the amount of material removed. In this study, we present two geometric etch models that describe the surface topology evolution as a function of the amount etched. The first model, referred to as the finite-difference etch model, represents the surface as an array of points in space where at each time-step the points move normal to the local surface. The second model, referred to as the surface area-volume model, more globally describes the surface evolution relating the volume of material removed to the exposed surface area. These etch models predict growth and coalescence of surface fractures such as those observed on scratches and ground surfaces. For typical surface fractures, simulations show that the transverse growth of the cracks at long etch times scales with the square root of etch time or the net material removed in agreement with experiment. The finite-difference etch model has also been applied to more complex structures such as the etching of a CO2 laser-mitigated laser damage site. The results indicate that etching has little effect on the initial morphology of this site implying little change in downstream scatter and modulation characteristics upon exposure to subsequent high fluence laser light. In the second part of the study, the geometric etch model is expanded to include fluid dynamics and mass transport. This later model serves as a foundation for understanding related processes such as the possibility of redeposition of etch reaction products during the etching, rinsing or drying processes.