William Aberth

CHARACTERISTICS OF A LOW ENERGY DUOPLASMATRON NEGATIVE ION SOURCE.

A duoplasmatron has been constructed specifically to produce negative ion beams of less than 5 keV energy. Design parameters are given for construction and operation of the source. Ion beam energy analyses indicate an energy full width at half maximum of less than 10 eV, and when the ion beam energy is extrapolated to zero, a full width at half maximum of 3 eV is observed. Ion beams of H−, O−, OH−, F−, CN−, and NO2− were produced at 2 keV with beam intensities between 3×10−7 and 10×10−7 A, measured behind a 0.63 cm diam aperture 140 cm downstream from the source.

Use of a microchannel plate for ion beam tuning of analytical mass spectrometers

The application of a microchannel plate image intensifier to ion beam monitoring is described.

Construction of an einzel lens capable of high voltage operation

Construction details are given for a relatively inexpensive einzel lens capable of high voltage operation.