William R. Harshbarger
Applied Materials
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Publication
Featured researches published by William R. Harshbarger.
Proceedings of 5th Asian Symposium on Information Display. ASID '99 (IEEE Cat. No.99EX291) | 1999
C. C. Tsai; Quanyuan Shang; Takako Takehara; William R. Harshbarger; Kam S. Law
PECVD is one of the most critical technologies for manufacturing AM LCD devices. Advanced PECVD systems have been developed for low temperature deposition of a-Si, SiN/sub x/, SiO/sub 2/, SiON, and n-Si films. Typically, cluster tool configurations are used since they provide excellent process control with single substrate processing and flexible process flows. Recent reports indicate that good polysilicon TFTs have been manufactured using laser crystallization of a-Si precursor films. This paper reviews the development of PECVD systems for volume manufacturing of LCDs and discusses process technology and requirements for future manufacturing.
Archive | 2002
Kam S. Law; Quanyuan Shang; William R. Harshbarger; Dan Maydan; Soo Young Choi; Beom Soo Park; Sanjay Yadav; John M. White
Archive | 2002
Kam S. Law; Quan Yuan Shang; William R. Harshbarger; Dan Maydan
Archive | 2002
Kam S. Law; Quan Yuan Shang; William R. Harshbarger; Dan Maydan
Archive | 2002
Quanyuan Shang; William R. Harshbarger; Robert L. Greene; Ichiro Shimizu
Archive | 2003
Haruhiro Harry Goto; William R. Harshbarger; Quanyuan Shang; Kam S. Law
Archive | 1999
William R. Harshbarger; Takako Takehara; Jeff Olsen; Regina Qiu; Yvonne Legrice; Guofu J. Feng; Robert Robertson; Kam S. Law
Archive | 2002
Mark Hsiao; Takako Takehara; Quanyuan Shang; William R. Harshbarger
Archive | 2000
Sheng Sun; Quanyuan Shang; William R. Harshbarger; Robert I. Greene
Archive | 2000
Haruhiro Harry Goto; William R. Harshbarger; Kam S. Law
