Quanyuan Shang
Applied Materials
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Publication
Featured researches published by Quanyuan Shang.
Proceedings of 5th Asian Symposium on Information Display. ASID '99 (IEEE Cat. No.99EX291) | 1999
C. C. Tsai; Quanyuan Shang; Takako Takehara; William R. Harshbarger; Kam S. Law
PECVD is one of the most critical technologies for manufacturing AM LCD devices. Advanced PECVD systems have been developed for low temperature deposition of a-Si, SiN/sub x/, SiO/sub 2/, SiON, and n-Si films. Typically, cluster tool configurations are used since they provide excellent process control with single substrate processing and flexible process flows. Recent reports indicate that good polysilicon TFTs have been manufactured using laser crystallization of a-Si precursor films. This paper reviews the development of PECVD systems for volume manufacturing of LCDs and discusses process technology and requirements for future manufacturing.
Archive | 2003
Soo Young Choi; Quanyuan Shang; Robert I. Greene; Li Hou
Archive | 1996
Quanyuan Shang; Kam S. Law; Dan Maydan
Archive | 1998
Quanyuan Shang; Sheng Sun; Kam S. Law; Emanuel Beer
Archive | 2001
Ernst Keller; Quanyuan Shang
Archive | 1995
Quanyuan Shang; Kam S. Law; Dan Maydan
Archive | 1997
Kam S. Law; Robert Robertson; Quanyuan Shang; Jeff Olsen; Carl Sorensen
Archive | 1997
Quanyuan Shang; Robert Robertson; Kam S. Law; Dan Maydan
Archive | 2006
Robert Z. Bachrach; Quanyuan Shang; Yan Ye
Archive | 2002
Kam S. Law; Quanyuan Shang; William R. Harshbarger; Dan Maydan; Soo Young Choi; Beom Soo Park; Sanjay Yadav; John M. White
