XiaoMin Yang

Heat-Assisted Magnetic Recording

Due to the limits of conventional perpendicular magnetic recording, it appears that alternative technologies are needed at areal densities >500 Gb/in2. Heat-assisted magnetic recording (HAMR) is a promising approach to extend areal densities to 1 Tb/in2 and beyond. All of the unique components necessary for a working HAMR system have been demonstrated. Although HAMR permits writing on high Hc media with lower magnetic fields and can produce higher write gradients than conventional magnetic recording, head/media spacing and the development of high Hc media with small grains remains challenging

Polyol Process Synthesis of Monodispersed FePt Nanoparticles

Monodispersed FePt nanoparticles are synthesized by reduction of iron(II) acetylacetonate and platinum(II) acetylacetonate with 1,2-hexadecanediol as the reducing reagent in the polyol process. As-prepared FePt nanoparticles are chemically disordered with fcc phase. Transmission electron microscopy (TEM) images show a self-assembled particle array with an average particle size of 3 nm and a standard deviation about 10%. The transformation from chemically disordered fcc to chemically ordered L10 phase is achieved by annealing at 650 degrees C for 30 min in Ar atmosphere where the oxygen level is less than 1 ppm. Magnetic hysteresis measurements show a coercivity of 9.0 kOe at 293K, and 16.7 kOe at 5 K for the annealed FePt nanoparticles.

Integrated Heat Assisted Magnetic Recording Head: Design and Recording Demonstration

Scaling the areal density, while maintaining a proper balance between media signal-to-noise ratio, thermal stability, and writability, will soon require an alternative recording technology. Heat assisted magnetic recording (HAMR) can achieve this balance by allowing high anisotropy media to be written by heating the media during the writing process (e.g., by laser light) to temporarily lower the anisotropy. Three major challenges of designing a HAMR head that tightly focuses light and collocates it with the magnetic field are discussed: 1) magnetic field delivery; 2) optical delivery; and 3) magnetic and optical field delivery integration. Thousands of these HAMR heads were built into sliders and head-gimbal assemblies, and optical and scanning electron micrograph images are shown. Scanning near-field optical microscopy (SNOM) characterization of the HAMR head shows that the predicted ~ lambda/4 full-width half-maximum (FWHM) spot size can be achieved using 488 nm light (124 nm was achieved). SNOM images also show that wafer level fabricated apertures were able to effectively eliminate sidelobes from the focused spot intensity profile. A magnetic force microscopy image of HAMR media shows that non-HAMR (laser power off) was not able to write transitions in the HAMR specific media even at very high write currents, but transitions could be written using HAMR (laser power on), even at lower write currents. A cross-track profile is shown for a fully integrated HAMR head where the magnetic pole physical width is ~350 nm, but the written track is ~200 nm, which demonstrates HAMR. A HAMR optimization contour shows that there is an optimum write current and laser power and that simply going to the highest write current and laser power does not lead to the best recording. Lastly, some prospects for advancing HAMR are given and a few key problems to be solved are mentioned.

Directed Block Copolymer Assembly versus Electron Beam Lithography for Bit-Patterned Media with Areal Density of 1 Terabit/inch2 and Beyond

The directed self-assembly of block copolymer (BCP) offers a new route to perfect nanolithographic patterning at sub-50 nm length scale with molecular scale precision. We have explored the feasibility of using the BCP approach versus the conventional electron beam (e-beam) lithography to create highly dense dot patterns for bit-patterned media (BPM) applications. Cylinder-forming poly(styrene-b-methyl methacrylate) (PS-b-PMMA) directly self-assembled on a chemically prepatterned substrate. The nearly perfect hexagonal arrays of perpendicularly oriented cylindrical pores at a density of approximately 1 Terabit per square inch (Tb/in.(2)) are achieved over an arbitrarily large area. Considerable gains in the BCP process are observed relative to the conventional e-beam lithography in terms of the dot size variation, the placement accuracy, the pattern uniformity, and the exposure latitude. The maximum dimensional latitude in the cylinder-forming BCP patterns and the maximum skew angle that the BCP can tolerate have been investigated for the first time. The dimensional latitude restricts the formation of more than one lattice configuration in certain ranges. More defects in BCP patterns are observed when using low molecular weight BCP materials or on non-hexagonal prepatterns due to the dimensional latitude restriction. Finally, the limitations and challenges in the BCP approach that are associated with BPM applications will be briefly discussed.

Challenges in 1 Teradot∕in.2 dot patterning using electron beam lithography for bit-patterned media

Electron beam lithography presents a great opportunity for bit-patterned media (BPM) applications due to its resolution capability and placement accuracy. However, there are still many challenges associated with this application including tool availability, resist capability, process development, and associated metrology needs. This paper will briefly discuss these challenges and show the results of sub-25 nm pitch (1 Tdots∕in.2) patterning from both a simulation and experimental perspective. The simulation results indicate that the energy contrast between the exposed and unexposed areas goes down quickly as the pitch size gets smaller and smaller, making it more difficult for image formation of high-resolution dot patterning. The strategy to overcome this issue is to optimize the development process, which aims at increasing the resist contrast and enlarging the process window. By using this approach, the authors have successfully demonstrated a pitch resolution down to 18 nm for a positive-tone resist Z...

Nanoscopic templates using self-assembled cylindrical diblock copolymers for patterned media

We demonstrated a process to create nanoscopic templates for the nanofabrication of patterned media using thin films of diblock copolymers. The self-assembled monolayers (SAMs) technique is used as a means to chemically modify the topographically confined trench surfaces to manipulate the wetting behavior of cylindrical diblock copolymers and perpendicularly oriented cylindrical poly (styrene-block-methyl methacrylate) (PS-b-PMMA) copolymers are obtained. Through optimizing the annealing conditions, long-range ordering in trenches is achieved after annealing at 170°C for about 24h. The ordering is strongly dependent on the line-edge-roughness (LER) of the trenches and the number of defects in the copolymer films inside the trenches. Efforts to decrease the various defects in the copolymer films and improve the trench LER are still in progress. With our approach, a negative phase 20nm nanoporous SiO2 template and a positive phase 20nm Ta nanodot template based on the self-assembled cylindrical PS-b-PMMA bl...

Step and flash imprint lithography for manufacturing patterned media

The ever-growing demand for hard drives with greater storage density has motivated a technology shift from continuous magnetic media to patterned media hard disks, which are expected to be implemented in future generations of hard disk drives to provide data storage at densities exceeding 1012 bits/in.2. Step and flash imprint lithography (S-FIL) technology has been employed to pattern the hard disk substrates. This article discusses the infrastructure required to enable S-FIL in high-volume manufacturing, namely, fabrication of master templates, template replication, high-volume imprinting with precisely controlled residual layers, and dual-sided imprinting. Imprinting of disks is demonstrated with substrate throughput currently as high as 180 disks/h (dual sided). These processes are applied to patterning hard disk substrates with both discrete tracks and bit-patterned designs.

Toward 1Tdot∕in.2 nanoimprint lithography for magnetic bit-patterned media: Opportunities and challenges

Nanoimprint lithography presents unique opportunities for patterned media applications due to its advantages of sub-10nm resolution capability, patterning of a whole disk in a single imprint step with reasonably high throughput, and the relatively low capital cost in comparison to other next generation lithography technologies. However, there are several critical issues that still remain very challenging. This article will briefly discuss these challenges in general and then focus on imprint lithography work including the fabrication of templates and demonstrate the imprinted results. In this work two types of polarities of high-density templates (pillar tone and hole tone) have been fabricated on fused silica substrates for the UV imprint process. The difficulties and limitations in each of the template fabrication processes will be discussed. The authors have successfully demonstrated template fabrication followed by imprinted results with a pitch of 24nm (1.1Tdots∕in.2) for both tones of templates. Initial imprinted results of dense dot patterns with a pitch as small as 18nm (2.0Tdots∕in.2) have been achieved. High-resolution scanning electron microscopy images are used as the primary metrology for both the dot size uniformity and the placement accuracy analysis. The difficulties and the limitations in template fabrication, the imprint process, and associated metrology will be discussed.Nanoimprint lithography presents unique opportunities for patterned media applications due to its advantages of sub-10nm resolution capability, patterning of a whole disk in a single imprint step with reasonably high throughput, and the relatively low capital cost in comparison to other next generation lithography technologies. However, there are several critical issues that still remain very challenging. This article will briefly discuss these challenges in general and then focus on imprint lithography work including the fabrication of templates and demonstrate the imprinted results. In this work two types of polarities of high-density templates (pillar tone and hole tone) have been fabricated on fused silica substrates for the UV imprint process. The difficulties and limitations in each of the template fabrication processes will be discussed. The authors have successfully demonstrated template fabrication followed by imprinted results with a pitch of 24nm (1.1Tdots∕in.2) for both tones of templates. Ini...

Aligned nanowires and nanodots by directed block copolymer assembly.

The directed self-assembly of block copolymers (BCPs) is a promising route to generate highly ordered arrays of sub-10 nm features. Ultradense arrays of a monolayer of spherical microdomains or cylindrical microdomains oriented parallel to the surface have been produced where the lateral ordering is guided by surface patterning and the lattice defined by the patterning can be commensurate or incommensurate with the natural period of the BCP. Commensurability between the two can be used to elegantly manipulate the lateral ordering and orientation of the BCP microdomains so as to form well-aligned arrays of 1D nanowires or 2D addressable nanodots. No modification of the substrate surface, aside from the patterning, was used, making the influence of lattice mismatch and pattern amplification on the size, shape and pitch of the BCP microdomains more transparent. A skew angle between incommensurate lattices, defining a stretching or compression of the BCP chains to compensate for the lattice mismatch, is presented.

Advanced Lithography for Bit Patterned Media

For bit patterned media (BPM) applications, while significant progress has recently been made in demonstrating high-resolution dot patterning using e-beam direct writing, and followed by the successful imprint process, many serious issues in fabrication still remain. This paper will only discuss the key challenges in the BPM lithography, including (1) the commercial availability of a high-resolution rotating stage e-beam system; (2) the approach and limitation of directed polymer self-assembly for resist pattern quality improvement and resolution enhancement; (3) the difficulties and limitations in the fabrication and replication of a 1 times template with a density beyond 1 Tbit per square inch (Tb/in2), while the defectivity, lifetime, and damage of the template are still questionable; (4) the tight requirements of size uniformity and placement accuracy; and (5) the needs of advanced metrology associated with the very small dot size and defect characterization. In this paper, we will address the above challenges and present some experimental data along with possible solutions for the challenges.