Xinbin Cheng

Preparation of spherical silica particles by Stöber process with high concentration of tetra-ethyl-orthosilicate.

In this paper, Stöber process with high concentration of tetra-ethyl-orthosilicate (TEOS) up to 1.24 M is used to prepare monodisperse and uniform-size silica particles. The reactions are carried out at [TEOS]=0.22-1.24 M, low concentrations of ammonia ([NH(3)]=0.81[TEOS]), and [H(2)O]=6.25[TEOS] in isopropanol. The solids content in the resulting suspension achieves a maximum value of 7.45% at 1.24 M TEOS. Various-sized particles in the range of 30-1000 nm are synthesized. The influences of TEOS, NH(3), and H(2)O on the size and size distribution of the particles are discussed. A modified monomer addition model combined with aggregation model is proposed to analyze the formation mechanism of silica particles.

Nanosecond laser-induced damage of nodular defects in dielectric multilayer mirrors [Invited]

Our recent studies on nodular damage in dielectric multilayer mirrors were first reviewed, and the main findings are taken as a foundation to further investigate the influence of seed absorptivity and asymmetrical boundary on the laser-induced damage of nodules. Experimental results showed that the seed absorptivity had a big influence on laser-induced damage thresholds (LIDTs) of the prepared nodules. A direct link between the cross-sectional |E|2 distributions and damage morphologies of nodules was found, which can perfectly explain the observed dependence of LIDTs on seed absorptivity. Another series of asymmetrical nodules were also studied in this work. The measured LIDTs of asymmetrical nodules were about 40%-70% lower than the LIDTs of the symmetrical nodules initiating from the same-sized SiO2 seeds. The weaker mechanical stability and the nonuniform |E|2 distributions are two main reasons for the lower laser damage resistance of the asymmetrical nodules.

Extreme ultraviolet broadband Mo/Y multilayer analyzers

Broadband extreme ultraviolet molybdenum/yttrium aperiodic multilayer analyzers were designed for polarization experiments in 8.5–11.7nm wavelength range. The multilayer analyzers were made using direct current magnetron sputtering and characterized using the soft x-ray polarimeter at BESSY-II facility. Measured s reflectivities at the Brewster angle are 5.5% for a multilayer designed for 8.5–10.1nm wavelength range and 6.1% for one designed for 9.1–11.7nm. The multilayers also exhibit high polarization degree up to 98.79%. In addition, the multilayer was also measured over 38°–52° angular range at the fixed wavelength of 10.2nm and the mean s reflectivity is 6.2%.

Physical insight toward electric field enhancement at nodular defects in optical coatings.

Although the finite-difference time-domain (FDTD) technique has been prevailingly used to calculate the electric field intensity (EFI) enhancement at nodular defects in high-reflection (HR) coatings, the physical insight as to how the nodular features contribute to the intensified EFI is not explicitly revealed yet, which in turn limits the solutions that improve the laser-induced damage threshold (LIDT) of nodules by decreasing the EFI enhancement. Here, a simplified model is proposed to describe the intensified EFI in nodules: 1) the nodule works as a microlens and its focal length can be predicted using a simple formula, 2) the portion of incident light that penetrates through the HR coating can be estimated by knowing the angular dependent transmittance (ADT) of the nodule, 3) strong EFI enhancement is created when the focal point is within the nodule and simultaneously a certain portion of light penetrates to the focal position. In the light of the proposed model, a broadband HR coating was used to reduce the EFI enhancement at the seed by a factor about 10, which leads to a 20 times increment of the LIDT. This work therefore not only deepens the physical understanding of EFI enhancement at nodules but also provides a new way to increase the LIDT of multilayer reflective optics.

Influence of cleaning process on the laser-induced damage threshold of substrates

The cleaning process of optical substrates plays an important role during the manufacture of high-power laser coatings. Two kinds of substrates, fused silica and BK7 glass, and two cleaning processes, called process 1 and process 2 having different surfactant solutions and different ultrasonic cleaning parameters, are adopted to compare the influence of the ultrasonic cleaning technique on the substrates. The evaluation standards of the cleaning results include contaminant-removal efficiency, weak absorption, and laser-induced damage threshold of the substrates. For both fused silica and BK7, process 2 is more efficient than process 1. Because acid and alkaline solutions can increase the roughness of BK7, process 2 is unsuitable for BK7 glass cleaning. The parameters of the cleaning protocol should be changed depending on the material of the optical components and the type of contamination.

Nanosecond pulsed laser damage characteristics of HfO 2 /SiO 2 high reflection coatings irradiated from crystal-film interface

The nano-precursors in the subsurface of Nd:YLF crystal were limiting factor that decreased the laser-induced damage threshold (LIDT) of HfO(2)/SiO(2) high reflection (HR) coatings irradiated from crystal-film interface. To investigate the contribution of electric-field (E-field) to laser damage originating from nano-precursors and then to probe the distribution of vulnerable nano-precursors in the direction of subsurface depth, two 1064 nm HfO(2)/SiO(2) HR coatings having different standing-wave (SW) E-field distributions in subsurface of Nd:YLF c5424181043036123rystal were designed and prepared. Artificial gold nano-particles were implanted into the crystal-film interface prior to deposition of HR coatings to study the damage behaviors in a more reliable way. The damage test results revealed that the SW E-field rather than the travelling-wave (TW) E-field contributed to laser damage. By comparing the SW E-field distributions and LIDTs of two HR coating designs, the most vulnerable nano-precursors were determined to be concentrated in a thin redeposition layer that is within 100 nm from the crystal-film interface.

Thin-film thickness-modulated designs for optical minus filter

We proposed an analytical method to design optical minus filters by the thickness modulation of discrete, homogeneous thin-film layers of a two-material multilayer coating. The main stack provides the narrow, second-order rejection band, and the correct thickness-modulation apodization and match layers can effectively suppress the sidelobes of the passband. Using this approach, we can design minus filters with layer thicknesses close to half-wave of the rejection wavelength, making this method well suited for accurate monitoring during the deposition.

Study of HfO2/SiO2 dichroic laser mirrors with refractive index inhomogeneity

HfO2/SiO2 dichroic mirrors, having high reflectance at 1064 nm and high transmittance at 532 nm, play an important role in high-power laser systems. However, the half-wave hole effect, caused mainly by the refractive index inhomogeneity of hafnia, affects the spectra and application of these mirrors. Two approaches to eliminate the half-wave hole effect have been proposed. Both approaches attempt to shift the location of the half-wave hole in comparison with the original wavelength. One approach broadens the reflectance band of the first harmonic wavelength and simultaneously adjusts the central reflectance band to a longer wavelength, whereas the other approach combines the two stacks to adjust the location of the half-wave hole far away from the wavelength of interest. Two kinds of dichroic mirrors have been successfully fabricated; moreover, it was found that the method of a two-stack combination, 0.9(HL)8 and 1.1(HL)8, provides designs that can be fabricated more easily and with better quality spectral characteristics.

Design and fabrication of ultra-steep notch filters.

We present the design and production approach of an ultra-steep notch filter. The notch filter that does not have thin layers is optimized utilizing the constrained optimization technique, and this is well suitable for accurate monitoring with the electron beam deposition technique. Single layer SiO(2) and Ta(2)O(5) films were deposited and carefully characterized in order to determine tooling factors and refractive indices wavelength dependencies accurately. We produced the ultra-steep notch filter with indirect monochromatic monitoring strategy and demonstrated the excellent correspondence to the theoretical spectral performance.

Interfacial damage in a Ta 2 O 5 /SiO 2 double cavity filter irradiated by 1064 nm nanosecond laser pulses

The Laser-Induced Damage Threshold (LIDT) and damage morphologies of a Ta(2)O(5)/SiO(2) double cavity filter irradiated by 1064-nm, 10-ns pulses were investigated. The depths of flat bottom pits were examined by an optical profiler and then calibrated according to the Electric-Field Intensity (EFI) distributions and the cross-sectional micrographs obtained using the Focus Ion Beam (FIB) technology. The statistics for depths of 60 damage sites suggested that the Ta(2)O(5) over SiO(2) interface was more vulnerable to Laser-Induced Damage (LID) than the SiO(2) over Ta(2)O(5) interface. After examining the morphologies of interfacial delaminations carefully, we found that the Ta(2)O(5) over SiO(2) interface instead had stronger mechanical strength. So, the higher density of susceptible defects at the Ta(2)O(5) over SiO(2) interface was considered to be the reason that LID was preferentially initiated at this type of interface. Based on the above findings, a phenomenological model was proposed to describe the formation of flat bottom pits.