Xuewei Feng

Black Phosphorus Based Field Effect Transistors with Simultaneously Achieved Near Ideal Subthreshold Swing and High Hole Mobility at Room Temperature.

Black phosphorus (BP) has emerged as a promising two-dimensional (2D) material for next generation transistor applications due to its superior carrier transport properties. Among other issues, achieving reduced subthreshold swing and enhanced hole mobility simultaneously remains a challenge which requires careful optimization of the BP/gate oxide interface. Here, we report the realization of high performance BP transistors integrated with HfO2 high-k gate dielectric using a low temperature CMOS process. The fabricated devices were shown to demonstrate a near ideal subthreshold swing (SS) of ~69 mV/dec and a room temperature hole mobility of exceeding >400 cm2/Vs. These figure-of-merits are benchmarked to be the best-of-its-kind, which outperform previously reported BP transistors realized on traditional SiO2 gate dielectric. X-ray photoelectron spectroscopy (XPS) analysis further reveals the evidence of a more chemically stable BP when formed on HfO2 high-k as opposed to SiO2, which gives rise to a better interface quality that accounts for the SS and hole mobility improvement. These results unveil the potential of black phosphorus as an emerging channel material for future nanoelectronic device applications.

Few-Layer Black Phosphorus Carbide Field-Effect Transistor via Carbon Doping

Black phosphorus carbide (b-PC) is a new family of layered semiconducting material that has recently been predicted to have the lightest electrons and holes among all known 2D semiconductors, yielding a p-type mobility (≈105 cm2 V-1 s-1 ) at room temperature that is approximately five times larger than the maximum value in black phosphorus. Here, a high-performance composite few-layer b-PC field-effect transistor fabricated via a novel carbon doping technique which achieved a high hole mobility of 1995 cm2 V-1 s-1 at room temperature is reported. The absorption spectrum of this material covers an electromagnetic spectrum in the infrared regime not served by black phosphorus and is useful for range finding applications as the earth atmosphere has good transparency in this spectral range. Additionally, a low contact resistance of 289 Ω µm is achieved using a nickel phosphide alloy contact with an edge contacted interface via sputtering and thermal treatment.

Impact and Origin of Interface States in MOS Capacitor with Monolayer MoS 2 and HfO 2 High- k Dielectric

Two-dimensional layered semiconductors such as molybdenum disulfide (MoS2) at the quantum limit are promising material for nanoelectronics and optoelectronics applications. Understanding the interface properties between the atomically thin MoS2 channel and gate dielectric is fundamentally important for enhancing the carrier transport properties. Here, we investigate the frequency dispersion mechanism in a metal-oxide-semiconductor capacitor (MOSCAP) with a monolayer MoS2 and an ultra-thin HfO2 high-k gate dielectric. We show that the existence of sulfur vacancies at the MoS2-HfO2 interface is responsible for the generation of interface states with a density (Dit) reaching ~7.03 × 1011 cm−2 eV−1. This is evidenced by a deficit S:Mo ratio of ~1.96 using X-ray photoelectron spectroscopy (XPS) analysis, which deviates from its ideal stoichiometric value. First-principles calculations within the density-functional theory framework further confirms the presence of trap states due to sulfur deficiency, which exist within the MoS2 bandgap. This corroborates to a voltage-dependent frequency dispersion of ~11.5% at weak accumulation which decreases monotonically to ~9.0% at strong accumulation as the Fermi level moves away from the mid-gap trap states. Further reduction in Dit could be achieved by thermally diffusing S atoms to the MoS2-HfO2 interface to annihilate the vacancies. This work provides an insight into the interface properties for enabling the development of MoS2 devices with carrier transport enhancement.

Black phosphorus transistors with enhanced hole transport and subthreshold swing using ultra-thin HfO 2 high-k gate dielectric

We report the realization of high performance BP transistors integrated with an ultra-thin HfO2 high-k gate dielectric using a low temperature CMOS process. The fabricated devices were shown to demonstrate an enhanced hole mobility of >400 cm2/Vs and subthreshold swing (SS) of ~69 mV/dec at room temperature. These figure-of-merits are benchmarked to be the best-of-its-kind, which outperform previously reported BP transistors realized on traditional SiO2 gate dielectric. X-ray photoelectron spectroscopy analysis further reveals the evidence of a more chemically stable BP interface when formed on HfO2 high-k as opposed to SiO2, which gives rise to a lower interface states density that accounts for the SS and hole mobility improvement. These results unveil the potential of BP as a new channel material for future nanoelectronics applications.

Anomalously enhanced thermal stability of phosphorene via metal adatom doping: An experimental and first-principles study

Atomically thin black phosphorus, also known as phosphorene, is an emerging two-dimensional (2D) material, which has attracted increasing attention due to its unique electronic and optoelectronic properties. However, the reduced thermal stability of phosphorene limits its suitability for high-temperature fabrication processes, which could be detrimental for the performance of phosphorenebased devices. Here, we investigate the impact of doping by Al and Hf transition metal adatoms on the thermal stability of phosphorene. The formation of Al–P covalent bonds was found to significantly improve the thermal coefficients of the Ag1, B2g, and Ag2 phonon modes to 0.00044, 0.00081, and 0.00012 cm–1·°C–1, respectively, which are two orders of magnitude lower than those observed for pristine P–P bonds (~0.01 cm–1·°C–1). First-principles calculations within the density functional theory framework reveal that the observed thermal stability enhancement in the Al-doped material reflects a significantly higher Al binding energy, due to the stronger Al–P bonds compared to the weak van der Waals interactions between adjacent P atoms in the undoped material. The present work thus paves the way towards phosphorene materials with improved structural stability, which could be promising candidates for potential nanoelectronic and optoelectronic applications.

A surface potential based compact model for two-dimensional field effect transistors with disorders induced transition behaviors

A surface potential based compact model for two-dimensional field effect transistors (2D-FETs) is proposed to incorporate the structural disorders induced transition behaviors among variable range hopping (VRH), nearest neighbor hopping (NNH), and band-like transport in most 2D materials. These functions coupled with effective transport energy and multiple trapping and releasing theory enable our developed model to predict the temperature and carrier density dependent current characteristics. Its validity is confirmed by the experimental results such as the metal insulator transition (MIT) in transition metal dichalcogenides and VRH-NNH transition in black phosphorus nanoribbon. Based on this model, the band-tail effects on the crossover gate voltage of MIT behavior are quantitatively investigated. It is found that the transition behavior is closely related to the distribution of the band-tail states. Furthermore, this model is implemented in Verilog-A for circuit-level prediction and evaluation of 2D-FETs to provide deeper insight into the relationship between material properties, device physics, and circuit performances.A surface potential based compact model for two-dimensional field effect transistors (2D-FETs) is proposed to incorporate the structural disorders induced transition behaviors among variable range hopping (VRH), nearest neighbor hopping (NNH), and band-like transport in most 2D materials. These functions coupled with effective transport energy and multiple trapping and releasing theory enable our developed model to predict the temperature and carrier density dependent current characteristics. Its validity is confirmed by the experimental results such as the metal insulator transition (MIT) in transition metal dichalcogenides and VRH-NNH transition in black phosphorus nanoribbon. Based on this model, the band-tail effects on the crossover gate voltage of MIT behavior are quantitatively investigated. It is found that the transition behavior is closely related to the distribution of the band-tail states. Furthermore, this model is implemented in Verilog-A for circuit-level prediction and evaluation of 2D-FET...