Y. J. Hyun

Pressure-induced orientation control of the growth of epitaxial silicon nanowires.

Single crystal silicon nanowires (SiNWs) were synthesized with silane reactant using Au nanocluster-catalyzed one-dimensional growth. We have shown that under our experimental conditions, SiNWs grown epitaxially on Si(111) via the vapor-liquid-solid growth mechanism change their growth direction as a function of the total pressure. Structural characterization of a large number of samples shows that SiNWs synthesized at a total pressure of 3 mbar grow preferentially in the 111 direction, while the one at 15 mbar favors the 112 direction. Specifically by dynamically changing the system pressure during the growth process morphological changes of the NW growth directions along their length have been demonstrated.

Atomic Scale Alignment of Copper-Germanide Contacts for Ge Nanowire Metal Oxide Field Effect Transistors

In this letter, we report on the formation, of copper-germanide/germanium nanowire (NW) heterostructures with atomically sharp interfaces. The copper-germanide (Cu3Ge) formation process is enabled by a chemical reaction between metallic Cu pads and vapor-liquid-solid (VLS) grown Ge-NWs. The atomic scale aligned formation of the Cu3Ge segments is controlled by in situ SEM monitoring at 310 degrees C thereby enabling length control of the intrinsic Ge-NW down to a few nanometers. The single crystal Cu3Ge/Ge/Cu3Ge heterostructures were used to fabricate p-type Ge-NW field effect transistors with Schottky Cu3Ge source/drain contacts. Temperature dependent I /V measurements revealed the metallic properties of the Cu3Ge contacts with a maximum current density of 5 x 10(7) A/cm2. According to the thermoionic emission theory, we determined an effective Schottky barrier height of 218 meV.

Ga∕Au alloy catalyst for single crystal silicon-nanowire epitaxy

Epitaxial growth of single crystalline silicon nanowires along the ⟨111⟩ directions was obtained on Si (100) and Si (111) substrates by gold-gallium-nanoparticle-catalyzed chemical vapor deposition with a SiH4 precursor. In comparison to the pure gold catalyst, the proportion of the nanowires growing perpendicular to the substrate is much higher and the wires show almost no kinks. The average diameter is smaller, and the diameter and length distributions are narrowly dispersed. By making a particular choice of growth conditions, it is possible to realize either rodlike or tapered silicon nanowires, which may be desirable for applications as field emitters.

Orientation specific synthesis of kinked silicon nanowires grown by the vapour-liquid-solid mechanism.

Kinked silicon nanowires (Si-NWs) were synthesized in a well reproducible manner using gold nanocluster-catalyzed quasi-one-dimensional growth on Si(111) substrates with silane (SiH(4)) as the precursor gas. The kinking is considered to be due to the change in the growth direction induced by the sudden change of the pressure during Si-NW synthesis. Structural high resolution transmission electron microscopy (HRTEM) characterization of the sample shows that epitaxial Si-NWs synthesized on Si(111) substrates at a total pressure of 3 mbar grow along the {111} direction, while the ones at 15 mbar favour the {112} direction. By dynamically changing the system pressure during the growth process morphological changes of the NW growth directions along their length have been shown, resulting in kinked nanowires. The crystallographic orientation relation of the kinking between the 3 and 15 mbar ranges has been analysed by TEM. It is shown that no defects or grain boundaries in the intersection between the two sections of the Si-NWs are necessary to form such kinks between different wire directions.

Ultrafast VLS growth of epitaxial β-Ga2O3 nanowires

Well-defined monoclinic nanostructures of beta- Ga(2)O(3) were grown in a chemical vapor deposition apparatus using metallic gallium and oxygen as sources. Stable growth conditions were deduced for nanorods, nanoribbons, nanowires and cones. The types of nanostructures are determined by the growth temperature. We suppose that the vapor-solid growth mechanism rules the growth of nanoribbons and rods. For the nanowires we observed catalytic gold droplets atop, characteristic for the VLS growth mechanism with an extremely high growth rate of up to 10 microm min(-1). Nanowires grown on Al(2)O(3) substrates showed an excellent tendency to grow epitaxially, mapping the hexagonal symmetry of Al(2)O(3)(0001).

Growth of branched single-crystalline GaAs whiskers on Si nanowire trunks

In this paper we present the hetero-epitaxial growth of single-crystalline GaAs whiskers on Si(111)-nanowire trunks forming hierarchical star-like structures with a six-fold symmetry. These hierarchical nanostructures have been successfully formed utilizing both vapor?liquid?solid (VLS) growth by low-pressure chemical vapor deposition (LPCVD) and molecular-beam epitaxy (MBE) techniques. High-resolution transmission electron microscopy (HRTEM) studies revealed the [111] growth direction of the core Si nanowires (Si-NWs) with six {112} facet planes. The sequentially grown branches are single-crystalline hexagonal GaAs nanowhiskers which grow preferably in the [0001] direction and are perpendicular to the {112} facets of the Si-NW backbone. Photoluminescence (PL) measurements confirm the good crystalline quality of the GaAs nanowhiskers and a blueshift of about 30?meV compared to bulk zinc blende-type GaAs. The ability to prepare rotationally branched NW structures should open new opportunities for both fundamental research and applications including monolithic three-dimensional nanoelectronics and nanophotonics.

Some aspects of substrate pretreatment for epitaxial Si nanowire growth.

We report on the influence of the surface pretreatment for vapor-liquid-solid growth of epitaxial silicon nanowires with gold catalyst and silane precursor on Si(111) substrates. In this paper we make it obvious that a thin native oxide layer on the Si substrate-as is present under most technological conditions-or a thin layer of oxide formed on top of the catalytic gold particle restrain nucleation and nanowire growth. High resolution transmission electron microscopy, and electron energy loss spectroscopy were utilized to demonstrate Si diffusion from the substrate through the catalytic Au layer and further the formation of a thin oxide layer atop. Based on this observation we present a sample pretreatment practice, making the catalyst insensitive for further oxide formation, thereby preserving epitaxy for nanowire synthesis.

High performance Ω-gated Ge nanowire MOSFET with quasi-metallic source/drain contacts

Ge nanowires (NWs) about 2 µm long and 35 nm in diameter are grown heteroepitaxially on Si(111) substrates in a hot wall low-pressure chemical vapor deposition (LP-CVD) system using Au as a catalyst and GeH(4) as precursor. Individual NWs are contacted to Cu pads via e-beam lithography, thermal evaporation and lift-off techniques. Self-aligned and atomically sharp quasi-metallic copper-germanide source/drain contacts are achieved by a thermal activated phase formation process. The Cu(3)Ge segments emerge from the Cu contact pads through axial diffusion of Cu which was controlled in situ by SEM, thus the active channel length of the MOSFET is adjusted without any restrictions from a lithographic process. Finally the conductivity of the channel is enhanced by Ga(+) implantation leading to a high performance Ω-gated Ge-NW MOSFET with saturation currents of a few microamperes.

Impact of fluence-rate related effects on the sputtering of silicon at elevated target temperatures

In this work we show how ion-beam-induced epitaxial recrystallization plays a role in focused ion-beam (FIB) sputtering of silicon at elevated temperatures. The sputtering process is the key to all high-precision machining of microstructures and nanostructures by FIBs. A fluence-rate effect observed for the sputtering of silicon at elevated temperatures arises from competition between stabilizing interactions between populations of defects produced by consecutive ion impingement (damage buildup) and dynamic self-annealing. By high-resolution transmission electron microscopy analysis we show that the damage, produced by exposure of silicon to a 50 kV focused gallium (Ga) ion beam at elevated target temperatures, departs quite substantially from the expected damage based on the distribution of energy within the substrate due to nuclear stopping. An amorphous layer observed at room temperature is completely absent at higher temperatures. In contrast to FIB exposure at room temperature the implanted layers co...

Strain relaxation dependent island nucleation rates during the Stranski–Krastanow growth of GaN on AlN by molecular beam epitaxy

This study reports on the correlation between strain relaxation and nucleation kinetics during the Stranski–Krastanow growth of GaN on (0001)AlN by plasma-assisted molecular beam epitaxy. Using reflection high-energy electron diffraction and real-time desorption mass spectrometry, the strain-related Ga adatom detachment and desorption rates were determined, giving information about the average GaN island nucleation rate. Two different regimes were found: one at low-temperature growth (690 720 °C), islands showed an abrupt relaxation mode, accompanied by a fast nucleation rate toward island sizes twice as large.