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Yasuharu Murakami

Hitachi

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Publication

Featured researches published by Yasuharu Murakami.

Archive | 2001

Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board

Yasuharu Murakami; Takahiro Hidaka

Archive | 2005

Positive photosensitive resin composition, method for forming pattern, and electronic component

Takashi Hattori; Yasuharu Murakami; Hiroshi Matsutani; Masayuki Hitachi Chemical Co. Ltd. Ooe; Hajime Nakano

Photochemical and Photobiological Sciences | 2003

Excited state processes in a four-component photosensitive system based on a bisimidazole derivativeDedicated to Professor Jean Kossanyi on the occasion of his 70th birthday.

Xavier Allonas; Jean-Pierre Fouassier; Makoto Kaji; Yasuharu Murakami

Photochemical and Photobiological Sciences | 2003

Excited state processes in a four-component photosensitive system based on a bisimidazole derivative.

Xavier Allonas; Jean-Pierre Fouassier; Makoto Kaji; Yasuharu Murakami

Archive | 2008

Positive photosensitive resin composition, method for forming pattern, and electronic part

Takashi Hattori; Yasuharu Murakami; Hiroshi Matsutani; Masayuki Ooe; Hajime Nakano

Archive | 2012

Method for forming protective film on electrode for touch panel, photosensitive resin composition and photosensitive element, and method for manufacturing touch panel

Hiroyuki Tanaka; Yasuharu Murakami; Naoki Sasahara; Ikuo Mukai; Yoshimi Igarashi; Masahiko Ebihara; Hiroshi Yamazaki

Journal of Photopolymer Science and Technology | 2004

Preparation and Two-Photon Lithography of a Sulfur Containing Resin with High Refractive Index

Yasuharu Murakami; Christopher A. Coenjarts; Christopher K. Ober

Journal of Photopolymer Science and Technology | 2003

Photochemistry and Polymerization Efficiency of Bis-imidazole based Photoinitiator Systems

Xavier Allonas; Houssam Obeid; Jean-Pierre Fouassier; Makoto Kaji; Yasuhisa Ichihashi; Yasuharu Murakami

Archive | 2012

Method of forming protective film for touch panel electrode, photosensitive resin composition and photosensitive element, and method of manufacturing touch panel

Ikuo Mukai; Yasuharu Murakami; Naoki Sasahara; Hiroshi Yamazaki

Journal of Photopolymer Science and Technology | 2015

Study of Adhesion Properties of Cu on Photosensitive Insulation Film for Next Generation Packaging

Kenichi Iwashita; Tetsuya Katoh; Akihiro Nakamura; Yasuharu Murakami; Tomio Iwasaki; Yuka Sugimasa; Jun Nunoshige; Hiroshi Nakano

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Hiroshi Yamazaki

Hitachi

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Ikuo Mukai

Hitachi

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Naoki Sasahara

Hitachi

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Makoto Kaji

Hitachi

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Masahiko Ebihara

Hitachi

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Kenichi Iwashita

Hitachi

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Yoshimi Igarashi

Hitachi

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Jean-Pierre Fouassier

Centre national de la recherche scientifique

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Xavier Allonas

Centre national de la recherche scientifique

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Emiko Oota

Hitachi

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