Ye Feng Yu

Magnetic and electric hotspots with silicon nanodimers

The study of the resonant behavior of silicon nanostructures provides a new route for achieving efficient control of both electric and magnetic components of light. We demonstrate experimentally and numerically that enhancement of localized electric and magnetic fields can be achieved in a silicon nanodimer. For the first time, we experimentally observe hotspots of the magnetic field at visible wavelengths for light polarized across the nanodimers primary axis, using near-field scanning optical microscopy.

Generalized Brewster effect in dielectric metasurfaces.

Polarization is a key property defining the state of light. It was discovered by Brewster, while studying light reflected from materials at different angles. This led to the first polarizers, based on Brewsters effect. Now, one of the trends in photonics is the study of miniaturized devices exhibiting similar, or improved, functionalities compared with bulk optical elements. In this work, it is theoretically predicted that a properly designed all-dielectric metasurface exhibits a generalized Brewsters effect potentially for any angle, wavelength and polarization of choice. The effect is experimentally demonstrated for an array of silicon nanodisks at visible wavelengths. The underlying physics is related to the suppressed scattering at certain angles due to the interference between the electric and magnetic dipole resonances excited in the nanoparticles. These findings open doors for Brewster phenomenon to new applications in photonics, which are not bonded to a specific polarization or angle of incidence.

A Metalens with a Near-Unity Numerical Aperture

The numerical aperture (NA) of a lens determines its ability to focus light and its resolving capability. Having a large NA is a very desirable quality for applications requiring small light-matter interaction volumes or large angular collections. Traditionally, a large NA lens based on light refraction requires precision bulk optics that ends up being expensive and is thus also a specialty item. In contrast, metasurfaces allow the lens designer to circumvent those issues producing high-NA lenses in an ultraflat fashion. However, so far, these have been limited to numerical apertures on the same order of magnitude as traditional optical components, with experimentally reported NA values of <0.9. Here we demonstrate, both numerically and experimentally, a new approach that results in a diffraction-limited flat lens with a near-unity numerical aperture (NA > 0.99) and subwavelength thickness (∼λ/3), operating with unpolarized light at 715 nm. To demonstrate its imaging capability, the designed lens is applied in a confocal configuration to map color centers in subdiffractive diamond nanocrystals. This work, based on diffractive elements that can efficiently bend light at angles as large as 82°, represents a step beyond traditional optical elements and existing flat optics, circumventing the efficiency drop associated with the standard, phase mapping approach.

Asymmetric Nanoantennas for Ultrahigh Angle Broadband Visible Light Bending

Wavefront manipulation in metasurfaces typically relies on phase mapping with a finite number of elements. In particular, a discretized linear phase profile may be used to obtain a beam bending functionality. However, discretization limits the applicability of this approach for high angle bending due to the drastic efficiency drop when the phase is mapped by a small number of elements. In this work, we discuss a novel concept for energy redistribution in diffraction gratings and its application in the visible spectrum range, which helps overcome the constraints of ultrahigh angle (above 80°) beam bending. Arranging asymmetric dielectric nanoantennas into diffractive gratings, we show that one can efficiently redistribute the power between the grating orders at will. This is achieved by precise engineering of the scattering pattern of the nanoantennas. The concept is numerically and experimentally demonstrated at visible frequencies using several designs of TiO2 (titanium dioxide) nanoantennas for medium (∼55°) and high (∼80°) angle light bending. Results show efficient broadband visible-light operation (blue and green range) of transmissive devices, reaching efficiencies of ∼90% and 50%, respectively, at the optimized wavelength. The presented design concept is general and can be applied for both transmission and reflection operation at any desired wavelength and polarization.

Resonant Light Guiding Along a Chain of Silicon Nanoparticles

Subwavelength confined waveguiding is experimentally demonstrated with high refractive index dielectric nanoparticles with photon energy propagation at distances beyond 500 μm. These particles have naturally occurring electric and magnetic dipole resonances. When they are placed in a 1D chain, the magnetic resonances of adjacent elements couple to each other, providing a means to transport energy at visible or NIR wavelengths in a confined mode. Chains of nanoparticles made of silicon were fabricated and guided waves were measured with near-field scanning optical microscopy. Propagation loss is quantified at 34 dB/mm for 720 nm and 5.5 dB/mm for 960 nm wavelengths with 150 and 220 nm diameter particles, respectively. Simulations confirm the unique properties of this waveguiding in comparison with photonic crystals. The resonant nature of the waveguide lays a foundation for integrated photonics beyond nanowire waveguides of silicon and silicon nitride. This technology is promising for more compact and deeper photonic integration such as right angle bends, more compact modulators, slow light and interfacing with single photon emitters for photonic integrated circuits, quantum communications, and biosensing.

Printing Beyond sRGB Color Gamut by Mimicking Silicon Nanostructures in Free-Space

Localized optical resonances in metallic nanostructures have been increasingly used in color printing, demonstrating unprecedented resolution but limited in color gamut. Here, we introduce a new nanostructure design, which broadens the gamut while retaining print resolution. Instead of metals, silicon nanostructures that exhibit localized magnetic and electric dipole resonances were fabricated on a silicon substrate coated with a Si3N4 index matching layer. Index matching allows a suppression of substrate effects, thus enabling Kerkers conditions to be met, that is, sharpened transitions in the reflectance spectra leading to saturated colors. This nanostructure design achieves a color gamut superior to sRGB, and is compatible with CMOS processes. The presented design could enable compact high-resolution color displays and filters, and the use of a Si3N4 antireflection coating can be readily extended to designs with nanostructures fabricated using other high-index materials.

Silicon Nanoparticles for Waveguiding

Guiding of photon energy on the subwavelength scale has long been a goal of the nanophotonics community. We present experimental results on guiding visible light using silicon nanoparticles with losses as low as 2.5dB/100 micrometers.

Quantum interference in the presence of a resonant medium

Interaction of light with media often occurs with a femtosecond response time. Its measurement by conventional techniques requires the use of femtosecond lasers and sophisticated time-gated optical detection1-3. Here we demonstrate that by exploiting quantum interference of entangled photons it is possible to measure the phase relaxation time of a media on the femtosecond time scale (down to 100 fs) using accessible continuous wave laser and single-photon counting. We insert the sample in the Hong-Ou-Mandel interferometer4 and infer the phase relaxation time from the modification of the two-photon interference pattern. In addition to its simplicity and ease of use, the technique does not require compensation of group velocity dispersion5-8 and does not induce photo-damage of the samples. This technique will be useful for characterization of ultrafast phase relaxation processes in material science, chemistry, and biology.Interaction of light with media often occurs with a femtosecond response time. Its measurement by conventional techniques requires the use of femtosecond lasers and sophisticated time-gated optical detection. Here we demonstrate that by exploiting quantum interference of entangled photons it is possible to measure the dephasing time of a resonant media on the femtosecond time scale (down to 100 fs) using accessible continuous wave laser and single-photon counting. We insert a sample in the Hong-Ou-Mandel interferometer and observe the modification of the two-photon interference pattern, which is driven by the coherent response of the medium, determined by the dephasing time. The dephasing time is then inferred from the observed pattern. This effect is distinctively different from the basic effect of spectral filtering, which was studied in earlier works. In addition to its ease of use, our technique does not require compensation of group velocity dispersion and does not induce photo-damage of the samples. Our technique will be useful for characterization of ultrafast phase relaxation processes in material science, chemistry, and biology.

Silicon NanoDimers for Magnetic and Electric Field Hotspots

Dielectric nanostructures with a high refractive index are of interest for ultimate control of light in the near-field. We demonstrate, experimentally and numerically, the existence of electric and magnetic field hotspots near silicon nanodimers.

Plasmonic nanoparticle lithography: Fast resist-free laser technique for large-scale sub-50 nm hole array fabrication

Cheap large-scale fabrication of ordered nanostructures is important for multiple applications in photonics and biomedicine including optical filters, solar cells, plasmonic biosensors, and DNA sequencing. Existing methods are either expensive or have strict limitations on the feature size and fabrication complexity. Here, we present a laser-based technique, plasmonic nanoparticle lithography, which is capable of rapid fabrication of large-scale arrays of sub-50 nm holes on various substrates. It is based on near-field enhancement and melting induced under ordered arrays of plasmonic nanoparticles, which are brought into contact or in close proximity to a desired material and acting as optical near-field lenses. The nanoparticles are arranged in ordered patterns on a flexible substrate and can be attached and removed from the patterned sample surface. At optimized laser fluence, the nanohole patterning process does not create any observable changes to the nanoparticles and they have been applied multiple times as reusable near-field masks. This resist-free nanolithography technique provides a simple and cheap solution for large-scale nanofabrication.Cheap large-scale fabrication of ordered nanostructures is important for multiple applications in photonics and biomedicine including optical filters, solar cells, plasmonic biosensors, and DNA sequencing. Existing methods are either expensive or have strict limitations on the feature size and fabrication complexity. Here, we present a laser-based technique, plasmonic nanoparticle lithography, which is capable of rapid fabrication of large-scale arrays of sub-50 nm holes on various substrates. It is based on near-field enhancement and melting induced under ordered arrays of plasmonic nanoparticles, which are brought into contact or in close proximity to a desired material and acting as optical near-field lenses. The nanoparticles are arranged in ordered patterns on a flexible substrate and can be attached and removed from the patterned sample surface. At optimized laser fluence, the nanohole patterning proc...