Yeong-kwan Kim

Method for manufacturing thin film using atomic layer deposition

Integrated circuit devices having buffer layers therein which contain metal oxide stabilized by heat treatment under low temperature

Method for forming dielectric film of capacitor having different thicknesses partly

Method for manufacturing thin film

Capacitor for a semiconductor device and method for forming the same

Method for forming a capacitor of a semiconductor device

Manufacture of thin film by atomic layer deposition

Dünnschichtherstellungsverfahren mit atomarer Schichtabscheidung Thin film forming method with atomic layer deposition

Dünnschichtherstellungsverfahren mit atomarer Schichtdeposition

A method for manufacturing a thin film