Yoko Kuramitsu
Fujitsu
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Publication
Featured researches published by Yoko Kuramitsu.
Japanese Journal of Applied Physics | 1996
Koji Nozaki; Keiji Watanabe; Takahisa Namiki; Miwa Igarashi; Yoko Kuramitsu; Ei Yano
A positive chemically amplified resist for 193-nm lithography has been developed. The resist consists of a copolymer of tetrahydro-4-methyl-2-oxo- 2H-pyran-4-yl methacrylate and 2-methyl-2-adamantyl methacrylate and a photoacid generator. The acid-catalyzed deprotection of the protective groups leads to a large polarity change in the exposed region of the resist films and it allows for high-contrast patterning with high sensitivity. Using an ArF excimer laser exposure system, a 0.17-µ m lines and spaces pattern has been resolved.
Archive | 1997
Koji Nozaki; Ei Yano; Keiji Watanabe; Takahisa Namiki; Miwa Igarashi; Yoko Kuramitsu; Satoshi Takechi; Akiko Kotachi; Makoto Takahashi
Archive | 2001
Takahisa Namiki; Ei Yano; Keiji Watanabe; Koji Nozaki; Miwa Igarashi; Yoko Kuramitsu
Archive | 1994
Yoshikazu Igarashi; Yoko Kuramitsu; Takahisa Namiki; Koji Nozaki; Keiji Watabe; Ei Yano; 崇久 並木; 美和 五十嵐; 庸子 倉光; 慶二 渡部; 映 矢野; 耕司 野崎
Archive | 1999
Keiji Watanabe; Koji Nozaki; Miwa Igarashi; Yoko Kuramitsu; E I Yano; Takahisa Namiki; Hiroshi Shirataki; Keita Ohtsuka; Michiaki Kanamine; Yuji Uehara
Archive | 1996
Koji Nozaki; Ei Yano; Keiji Watanabe; Takahisa Namiki; Miwa Igarashi; Yoko Kuramitsu; Satoshi Takechi; Akiko Kotachi; Makoto Takahashi
Archive | 1998
Koji Nozaki; Ei Yano; Keiji Watanabe; Takahisa Namiki; Miwa Igarashi; Yoko Kuramitsu
Archive | 1996
Koji Nozaki; Ei Yano; Keiji Watanabe; Takahisa Namiki; Miwa Igarashi; Yoko Kuramitsu; Satoshi Takechi; Akiko Kotachi; Makoto Takahashi
Archive | 1998
Koji Nozaki; Ei Yano; Keiji Watanabe; Takahisa Namiki; Miwa Igarashi; Yoko Kuramitsu
Archive | 1997
Keiji Watanabe; Yasuhiro Yoneda; Takashi Maruyama; Keiko Yano; Tomio Nakamura; Shigeru Shimizu; Takashi Saitoh; Takahisa Namiki; Ei Yano; Miwa Igarashi; Yoko Kuramitsu
