Yoshihiko Doi
Sumitomo Electric Industries
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Publication
Featured researches published by Yoshihiko Doi.
Thin Solid Films | 1978
Mitsunori Kobayashi; Yoshihiko Doi
Abstract The ion plating process was employed in this study for the coating of cemented carbide inserts with a layer of TiN or TiC about 5 μm thick in order to make a comparison with the chemical vapor deposition process employed at Sumitomo Electric Industries. The study demonstrates that the wear resistance of carbides coated by ion plating is similar to that of carbides coated by chemical vapor deposition. However, the toughness obtained by ion plating is superior to that of chemically vapor-deposited coatings.
Archive | 1981
Mitsunori Kobayashi; Yoshihiko Doi
Archive | 1978
Mitsunori Kobayashi; Yoshihiko Doi; Masaaki Tobioka; Takaharu Yamamoto
Archive | 1981
Yoshihiko Doi; Yoshiki Maeda; Mitsunori Kobayashi
Archive | 1976
Yoshihiko Doi; Yasuhiro Saito; Mitsunori Kobayashi; Seiki Hiraoka
Archive | 1981
Yoshihiko Doi; Toshikazu Hirayama; Yasushi Miyawaki; Masao Maruyama
Archive | 1982
Yoshihiko Doi; Nobuo Ogasa; Akira Ohtsuka; Tadashi Igarashi
Archive | 1981
Akira Yamakawa; Akira Doi; Yoshihiko Doi
Archive | 1997
Yoshiharu Yamamoto; Nobuaki Asada; Yoshihiko Doi
Archive | 1987
Akira Yamakawa; Yoshihiko Doi; Masaya Miyake
