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Featured researches published by Yoshikazu Teranishi.


Japanese Journal of Applied Physics | 2006

Production of Stable Ion Beam of Os3(CO)12 with Compact Metal-Cluster-Complex Ion Source

Yukio Fujiwara; Kouji Kondou; Yoshikazu Teranishi; Hidehiko Nonaka; Toshiyuki Fujimoto; Akira Kurokawa; Shingo Ichimura

Metal-cluster-complex ion beams were produced stably using a cluster ion source, which is compact enough to be installed in commonly used secondary ion mass spectrometry (SIMS) systems. As a metal cluster complex, triosmium dodecacarbonyl, Os3(CO)12, was utilized, which has a molecular weight of 906.7. Since precise temperature control is necessary to sublimate the metal cluster complex stably without thermal decomposition, the ion source was equipped with compact heat-removal devices in addition to an external heater. Experimental results showed that the crucible temperature of the metal cluster complex can be maintained at about 130 °C in continuous operation, which is an appropriate temperature for sublimation without the problem of decomposition. The ion source produced steady-state beams of Os3(CO)n+ (n=7 or 8) ions with a beam current exceeding 10 nA at 10 keV. Beam current increased with gas pressure, depending on the temperature of the crucible holding the metal cluster complex. The rate of the change in beam current was within a few percent per hour; hence, in view of stability, the ion source was confirmed as usable in SIMS. Furthermore, beam profile was investigated using a Faraday cup with a knife-edge as well as a GaAs/AlAs multilayer substrate as a beam target.


Japanese Journal of Applied Physics | 2006

Observation of Sputtered Si Surface Irradiated with Metal Cluster Complex Ions

Yoshikazu Teranishi; Kouji Kondou; Yukio Fujiwara; Hidehiko Nonaka; Misuhiro Tomita; Kazuhiro Yamamoto; Toshiyuki Fujimoto; Shingo Ichimura

In this paper, we report the result of surface sputtering of Si using a proto-type compact cluster ion source which has been developed using Os3(CO)12 as a low damage-sputtering source. The surface roughening of Si under the acceleration energy 10 key at incidence angles about 0/spl deg/ and 60/spl deg/ has been studied. The sputtered Si surface was observed by using AFM (atomic force microscope) and SEM (scanning electron microscope).


International Journal of Biological Macromolecules | 2013

Fabrication of high-density collagen fibril matrix gels by renaturation of triple-helix collagen from gelatin.

Yoshimi Ohyabu; Shunji Yunoki; Hirosuke Hatayama; Yoshikazu Teranishi

Collagen-based 3-D hydrogels often lack sufficient mechanical strength for tissue engineering. We developed a method for fabrication of high-density collagen fibril matrix (CFM) gels from concentrated solutions of uncleaved gelatin (UCG). Denatured random-coil UCG exhibited more rapid and efficient renaturation into collagen triple-helix than cleaved gelatin (CG) over a broad range of setting temperatures. The UCG solution formed opaque gels with high-density reconstituted collagen fibrils at 28-32 °C and transparent gels similar to CG at <25 °C. The unique gelation properties of UCG enabled the encapsulation of cultured cells in CFM of high solid volume (>5%) and elasticity (1.28 ± 0.15 kPa at 5% and 4.82 ± 0.38 kPa at 8%) with minimal cell loss. The elastic modulus of these gels was higher than that of conventional CFM containing 0.5% collagen. High-strength CFM may provide more durable hydrogels for tissue engineering and regenerative medicine.


Surface & Coatings Technology | 2014

HIPIMS deposition of TiAlN films on inner wall of micro-dies and its applicability in micro-sheet metal forming

Tetsuhide Shimizu; Hidetoshi Komiya; Tomotaro Watanabe; Yoshikazu Teranishi; Hiroshi Nagasaka; Kazuo Morikawa; Ming Yang


Materials Science and Engineering B-advanced Functional Solid-state Materials | 2009

Analysis of surface oxidation behavior at 500 °C under dry air of glass-like carbon heat-treated from 1200 to 3000 °C

Kazumasa Nakamura; Yasuhiro Tanabe; Manabu Fukushima; Yoshikazu Teranishi; Takashi Akatsu; Eiichi Yasuda


Archive | 2008

Mold for fine molding, base material for mold for fine molding, and manufacturing method of mold for fine molding

Masanori Ishizuka; Atsushi Mio; Yoshikazu Teranishi; 淳 三尾; 義一 寺西; 真典 石束


Thin Solid Films | 2015

Impact of pulse duration in high power impulse magnetron sputtering on the low-temperature growth of wurtzite phase (Ti,Al)N films with high hardness

Tetsuhide Shimizu; Yoshikazu Teranishi; Kazuo Morikawa; Hidetoshi Komiya; Tomotaro Watanabe; Hiroshi Nagasaka; Ming Yang


Journal of Superconductivity and Novel Magnetism | 2013

Low Temperature Properties of a Superconducting Niobium Coaxial Cable

Akihiro Kushino; Yoshikazu Teranishi; Soichi Kasai


Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms | 2009

Surface modification behaviors of glass-like carbon by oxygen ion implantation

Kazumasa Nakamura; Yoshikazu Teranishi; Yukako Wada; Ko-ichiro Tano; Isao Nakamura; Yasuhiro Tanabe; Eiichi Yasuda; Takashi Akatsu; Hitoshi Shindo


Journal of Sol-Gel Science and Technology | 2005

Oxidation Behavior of Si Nb C O Ceramics Prepared by the Pyrolysis of Methyltriethoxysilane Based Organic-Inorganic Hybrid Gel

Manabu Fukushima; Eiichi Yasuda; Yoshiyuki Nakamura; Masao Shimizu; Yoshikazu Teranishi; L.M. Manocha; Yasuhiro Tanabe

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Eiichi Yasuda

Tokyo Institute of Technology

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Manabu Fukushima

National Institute of Advanced Industrial Science and Technology

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Kazuo Morikawa

Industrial Technology Research Institute

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Hiroshi Nagasaka

Industrial Technology Research Institute

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Satoshi Kobayashi

Tokyo Metropolitan University

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Tetsuhide Shimizu

Tokyo Metropolitan University

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Ming Yang

Tokyo Metropolitan University

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Hidetoshi Komiya

Industrial Technology Research Institute

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