Yoshimitsu Ushimi
Tohoku University
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Featured researches published by Yoshimitsu Ushimi.
Surface Science | 1999
Kazuyuki Sakamoto; Daiyu Kondo; Yoshimitsu Ushimi; Akio Kimura; Akito Kakizaki; Shozo Suto
We report here the temperature-dependent measurements of the valence spectra, and the C Is and the Si 2p core-level spectra of the C 60 adsorbed Si(111)-(7 × 7) surface, using photoelectron spectroscopy. At 300 K the valence spectra show the physisorption of most C 60 molecules for a one monolayer C 60 film. After annealing the sample at 1120 K the molecular orbitals disappear due to the breakdown of the C 60 cage. The C Is and Si 2p core-level spectra obtained at the same temperature indicate the progress of SiC formation at the interface between C 60 and the Si(111) surface. After annealing at 1170 K, the formation of SiC islands is confirmed by the binding energies of the peaks observed in the valence and C Is core-level spectra.
Journal of Electron Spectroscopy and Related Phenomena | 1999
Kazuyuki Sakamoto; Daiyu Kondo; Yoshimitsu Ushimi; Masashi Harada; Akio Kimura; Akito Kakizaki; Shozo Suto
Abstract We have investigated the electronic structure and the thermal dependence of C 60 molecules adsorbed on a Si(111)–(7×7) surface using photoelectron spectroscopy. At room temperature, the binding energies of the molecular orbitals and the C 1 s core level of the 1.0 monolayer (ML) film are the same as those of the 5.0 ML C 60 film. This result indicates that most of C 60 molecules interact with the Si surface by van der Waals force at a coverage of 1.0 ML. After annealing the 1.0 ML C 60 film at 500 K, the full-width at half maximum of the molecular orbitals becomes broader indicating the chemisorption at this temperature. Moreover, the highest occupied molecular orbital (HOMO) of a C 60 molecule splits into two peaks that are assigned to be the shifted HOMO and the bonding state with the polarization-dependent measurements and the Si 2 p core level spectrum. The molecular orbitals and the C 1 s core level shift to lower binding energies. These results indicate that the chemisorption between C 60 molecules and the surfaces has both covalent and ionic characters at 500 K. We attribute the transition in the bonding nature of C 60 molecules to the thermal induced change in surface structure during the annealing process.
Japanese Journal of Applied Physics | 1999
Daiyu Kondo; Kazuyuki Sakamoto; Yoshimitsu Ushimi; Masashi Harada; Akio Kimura; Akito Kakizaki; Shozo Suto
We report here the temperature-dependent electronic structure of C60 molecules adsorbed on a Si(001)-(2×1) surface, measured by photoelectron spectroscopy. At room temperature, the valence spectra reveal that the interaction between a 1 monolayer (ML) C60 film and a Si(001)-(2×1) surface is mainly a physisorption. After annealing the 1 ML C60 film adsorbed on a Si(001)-(2×1) surface at 500 K, in the valence spectra the highest occupied molecular orbital (HOMO) of a C60 molecule splits into two peaks. The binding energies of the two peaks are 1.6 and 2.1 eV. We assign the 1.6-eV peak to the shifted HOMO and the 2.1-eV peak to the bonding state between C60 molecules and a Si(001)-(2×1) surface from the polarization-dependent measurement and the Si 2p core level spectrum. Moreover, the molecular orbitals and the C 1s core level of a C60 molecule shift to the lower binding energy side. These results indicate that the interaction between C60 molecules and the Si(001)-(2×1) surface changes from physisorption to chemisorption, which has both covalent and ionic characters, at 500 K.
Physical Review B | 1999
Kazuyuki Sakamoto; Daiyu Kondo; Yoshimitsu Ushimi; Masashi Harada; Akio Kimura; Akito Kakizaki; Shozo Suto
Archive | 2002
Hiroyuki Fujino; Takashi Hayashi; Kenichi Kamisaka; Hideki Kawamura; Daisuke Nakamura; Tadashi Nomura; Masaki Takeuchi; Yoshimitsu Ushimi; Hajime Yamada; Yukio Yoshino; 健一 上坂; 大佐 中村; 幸夫 吉野; 一 山田; 孝至 林; 秀樹 河村; 義光 牛見; 雅樹 竹内; 博之 藤野; 忠志 野村
Archive | 2007
Yoshimitsu Ushimi; Naoko Aizawa; Hiroyuki Fujino; Hajime Yamada
Physical Review B | 1999
Kazuyuki Sakamoto; Satoshi Doi; Yoshimitsu Ushimi; Kenichi Ohno; Han Woong Yeom; Toshiaki Ohta; Shozo Suto; Wakio Uchida
Archive | 2002
Takashi Hayashi; Kenichi Kamisaka; Hideki Kawamura; Daisuke Nakamura; Tadashi Nomura; Masaki Takeuchi; Yoshimitsu Ushimi; Hajime Yamada; Yukio Yoshino; 上坂 健一; 中村 大佐; 吉野 幸夫; 山田 一; 林 孝至; 河村 秀樹; 牛見 義光; 竹内 雅樹; 野村 忠志
Archive | 2005
Masato Tose; Yoshimitsu Ushimi; 誠人 戸瀬; 義光 牛見
Archive | 2007
Naoko Aizawa; Hiroyuki Fujino; Yoshimitsu Ushimi; Hajime Yamada