Yoshinobu Kawata

Chemical vapor deposition method, and chemical vapor deposition treatment system and chemical vapor deposition apparatus therefor

Chemical coating apparatus

Apparatus for manufacturing semiconductor and method of manufacturing semiconductor

Reaction chamber for a chemical vapor deposition apparatus and a chemical vapor deposition apparatus using such a reaction chamber

Reaktionskammer für eine Vorrichtung zur chemischen Gasphasenabscheidung

Reaction chamber for chemical vapour deposition - comprises wafer heating appts., gas supply head, reaction chamber element, waste gas outlet

Device for semiconductor production and method for semiconductor production

CVD to deliver reaction gas to form film of given compsn. - in which reaction zone is insulated from ambient air and reaction zone is linked to outlet channel

Einrichtung zur Halbleiterherstellung und Verfahren zur Halbleiterherstellung

Einrichtung und Verfahren zum Herstellen eines Halbleiters Apparatus and method for manufacturing a semiconductor