Toshihiko Minami

Chemical vapor deposition method, and chemical vapor deposition treatment system and chemical vapor deposition apparatus therefor

Semiconductor manufacturing system with exhaust pipe, deposit elimination method for use with semiconductor manufacturing system, and method of manufacturing semiconductor device

Apparatus for uniformly distributing plasma over a substrate

Method of manufacturing a semiconductor device with a planar interlayer insulating film

Reaction chamber for a chemical vapor deposition apparatus and a chemical vapor deposition apparatus using such a reaction chamber

Reaktionskammer für eine Vorrichtung zur chemischen Gasphasenabscheidung

Reaction chamber for chemical vapour deposition - comprises wafer heating appts., gas supply head, reaction chamber element, waste gas outlet

Semiconductor manufacturing device, deposit removing method therein and manufacturing method for semiconductor device

CVD to deliver reaction gas to form film of given compsn. - in which reaction zone is insulated from ambient air and reaction zone is linked to outlet channel

Reaction chamber for chemical, vapor growth apparatus and chemical vapor growth apparatus using the same