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Featured researches published by Young Joon Cho.


Metals and Materials International | 2013

Enhanced boron gettering effect of n-type solar grade Si wafers by in situ oxidation

Young Joon Cho; Hyo Sik Chang

To investigate the gettering effect of n-type (phosphorous-doped) crystalline Czochralski-silicon (Cz-Si) wafers, we made boron emitters by diffusing boron into them and, subsequently, oxidized the boron-diffused n-type crystalline silicon wafers by in situ wet and dry oxidation. After oxidation, we measured the minority carrier lifetime by using microwave photoconductivity decay (μ-PCD), open-circuit voltage by quasi-steady-static photoconductance and the sheet resistance by a 4 point probe, respectively. We suggested the boron diffusion and in situ oxidation conditions to achieve longer lifetimes. We can obtain the equivalent lifetime to conventional oxidation through the quartz tube designed for boron doping and in-situ oxidation. The uniformity of sheet resistance under 3% was achieved at relatively low temperature and the lifetime of 21.6 μs was also obtained by boron gettering effect and passivation of oxide layer.


Reaction Kinetics and Catalysis Letters | 1999

Accelerated phosphodiester cleavage of bis(p-nitrophenyl)-phosphate by receptors

Hyeong-Won Ryu; Young Joon Cho; Dae Young Kim; Thong-Sung Ko

Phosphodiester cleavage of BNPP can be accelerated by various degradative receptors including enzymes. In the hydrolytic cleavage of BNPP, a bell-shaped receptor concentration-rate profile composed of a positive-catalysis phase at low receptor concentrations and a negative-catalysis phase at excess receptor concentration was observed. The negative catalysis can be explained by nonproductive binding, leading to an increase of the activation energy barrier and a decrease of the reaction rate.


Reaction Kinetics and Catalysis Letters | 1998

Accelerated hydrolysis of esters catalyzed by receptors, I nonenzymatic cleavage ofp-nitrophenyl acetate by polypeptides

Hyeong-Won Ryu; Young Joon Cho; Thong-Sung Ko

The hydrolysis kinetics ofp-nitrophenyl acetate by basic polypeptides with a variety of amino acid residues were analyzed. The results suggest that the tertiary structure of microenvironment brought about by random coil assembly is more important as a binding site than the number of basic residues (catalytic sites).


Korean Journal of Materials Research | 2015

결정질 실리콘 태양전지 적용을 위한 ALD-Al2O3 패시베이션 막의 산화질화막 적층 특성

Kuk-Hyun Cho; Young Joon Cho; Hyo Sik Chang

Silicon oxynitride that can be deposited two times faster than general SiNx:H layer was applied to fabricate the passivation protection layer of atomic layer deposition (ALD) Al2O3. The protection layer is deposited by plasma-enhanced chemical vapor deposition to protect Al2O3 passivation layer from a high temperature metallization process for contact firing in screen-printed silicon solar cell. In this study, we studied passivation performance of ALD Al2O3 film as functions of process temperature and RF plasma effect in plasma-enhanced chemical vapor deposition system. Al2O3/SiON stacks coated at 400 oC showed higher lifetime values in the as-stacked state. In contrast, a high quality Al2O3/SiON stack was obtained with a plasma power of 400 W and a capping-deposition temperature of 200 oC after the firing process. The best lifetime was achieved with stack films fired at 850 oC. These results demonstrated the potential of the Al2O3/SiON passivated layer for crystalline silicon solar cells.


Applied Science and Convergence Technology | 2014

Atomic Layer Deposition of HfO₂ Films on Ge

Young Joon Cho; Hyo Sik Chang

We investigated the growth characteristics and interfacial properties of HfO₂ films deposited on Ge substrate through atomic layer deposited (ALD) by using an in-situ medium energyion scattering analysis. The growth kinetics of HfO₂ grown on a GeO₂/Ge substrate through ALD is similar to that grown on an SiO₂/Si substrate. However, the incubation period of HfO₂ deposition on Ge is shorter than that on Si. The HfO₂ grown on the GeO/Ge substrate shows a significant diffusion of Hf atoms into the substrate interface and GeO volatilization after annealing at 700℃. The presence of low-quality Ge oxide or suboxide may degrade the electrical performance of device.


Reaction Kinetics and Catalysis Letters | 1999

Accelerated hydrolysis of esters catalyzed by receptors, II. Degradation of RNA by polyvinylpyrrolidone

Sung-Sik You; Hyeong-Won Ryu; Young Joon Cho; Dae Young Kim; Thong-Sung Ko

The nonenzymatic hydrolysis of RNA by polyvinylpyrrolidone (PVP) has been investigated. A bell-shaped kinetics was observed when the first order rate constant of the reaction was ploted as a function of PVP concentration, which means the kinetic feature of PVP as a degradative receptor distinct from those of degradative enzymes (e.g., ribonuclease).


Surface & Coatings Technology | 2016

Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell

Young Joon Cho; Hamchorom Cha; Hyo Sik Chang


Thin Solid Films | 2014

Selective deposition contact patterning using atomic layer deposition for the fabrication of crystalline silicon solar cells

Young Joon Cho; Woong-Chul Shin; Hyo Sik Chang


Journal of the Korean Physical Society | 2015

Erratum: Effects of plasma-enhanced chemical vapor deposition (PECVD) on the carrier lifetime of Al2O3 passivation stack

Kuk-Hyun Cho; Young Joon Cho; Hyo Sik Chang; Kyung Joong Kim; Hee Eun Song


Physica Status Solidi (c) | 2012

Reduction of surface reflectivity in multi-crystalline silicon solar cells by wet nano-texturing

Young Joon Cho; Hyo Sik Chang

Collaboration


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Hyo Sik Chang

Chungnam National University

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Hyeong-Won Ryu

Chungnam National University

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Thong-Sung Ko

Chungnam National University

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Dae Young Kim

Soonchunhyang University

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Kuk-Hyun Cho

Chungnam National University

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Hamchorom Cha

Chungnam National University

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Kyung Joong Kim

Korea Research Institute of Standards and Science

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Min Yi Kim

Chungnam National University

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