Is this you? Create Your Porfile
Avatar

Yuzo Koda

Canon Inc.

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Yuzo Koda is active.

Explore More

Publication

Featured researches published by Yuzo Koda.

Archive | 1996

Photovoltaic element and fabrication process thereof

Ryo Hayashi; Yasushi Fujioka; Shotaro Okabe; Masahiro Kanai; Jinsho Matsuyama; Akira Sakai; Yuzo Koda; Tadashi Hori; Takahiro Yajima

Archive | 2002

Silicon film, semiconductor device, and process for forming silicon films

Takaharu Kondo; Shotaro Okabe; Masafumi Sano; Akira Sakai; Yuzo Koda; Ryo Hayashi; Shuichiro Sugiyama; Koichiro Moriyama

Archive | 2002

Process for forming a silicon-based film on a substrate using a temperature gradient across the substrate axis

Takaharu Kondo; Shotaro Okabe; Masafumi Sano; Akira Sakai; Yuzo Koda; Ryo Hayashi; Shuichiro Sugiyama; Koichiro Moriyama

Archive | 1991

Method for repairing an electrically short-circuited semiconductor device, and process for producing a semiconductor device utilizing said method

Keishi Saito; Tatsuyuki Aoike; Mitsuyuki Niwa; Toshimitsu Kariya; Yuzo Koda

Archive | 2002

Methods of forming semiconductor element, and semiconductor elements

Takaharu Kondo; Masafumi Sano; Akira Sakai; Koichi Matsuda; Yuzo Koda; Tadashi Hori

Archive | 2000

Semiconductor element and method for forming the same

Yuzo Koda; Takaharu Kondo; Koichi Matsuda; Akira Sakai; Sunao Yoshisato; 勇蔵 幸田; 高一 松田; 直 芳里; 隆治 近藤; 明 酒井

Archive | 1999

Deposition of semiconductor layer by plasma process

Yasushi Fujioka; Shotaro Okabe; Masahiro Kanai; Akira Sakai; Tadashi Sawayama; Yuzo Koda; Takahiro Yajima

Archive | 1994

Si- and/or Ge-containing non-single crystalline semiconductor film with an average radius of 3.5 A or less as for microvoids contained therein and a microvoid density 1×10.sup.(19) (cm-3) or less

Keishi Saito; Tatsuyuki Aoike; Mitsuyuki Niwa; Toshimitsu Kariya; Yuzo Koda

Archive | 2001

Apparatus and method for forming a deposited film by means of plasma CVD

Takahiro Yajima; Masahiro Kanai; Yuzo Koda; Takeshi Shishido

Archive | 2001

Exhaust processing method, plasma processing method and plasma processing apparatus

Takeshi Shishido; Shotaro Okabe; Masahiro Kanai; Yuzo Koda; Yasuyoshi Takai; Tadashi Hori; Koichiro Moriyama; Hidetoshi Tsuzuki; Hiroyuki Ozaki

Explore More

Collaboration

Dive into the Yuzo Koda's collaboration.

Top Co-Authors
Avatar

Akira Sakai

Canon Inc.

View shared research outputs
Top Co-Authors
Avatar

Shotaro Okabe

Canon Inc.

View shared research outputs
Top Co-Authors
Avatar

Masahiro Kanai

Canon Inc.

View shared research outputs
Top Co-Authors
Avatar

Takahiro Yajima

Canon Inc.

View shared research outputs
Top Co-Authors
Avatar

Yasushi Fujioka

Canon Inc.

View shared research outputs
Top Co-Authors
Avatar

Tadashi Sawayama

Canon Inc.

View shared research outputs
Top Co-Authors
Avatar

Keishi Saito

Canon Inc.

View shared research outputs
Top Co-Authors
Avatar

Toshimitsu Kariya

Canon Inc.

View shared research outputs
Top Co-Authors
Avatar

Tatsuyuki Aoike

Canon Inc.

View shared research outputs
Top Co-Authors
Avatar

Koichiro Moriyama

Canon Inc.

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge