A. Vilà

The complete Raman spectrum of nanometric SnO2 particles

14 and space group P4 2 /mnm. The unit cell consists of two metal atoms and four oxygen atoms. Each metal atom is situated amidst six oxygen atoms which approximately form the corners of a regular octahedron. Oxygen atoms are surrounded by three tin atoms which approximate the corners of an equilateral triangle. The lattice parameters are a5b 54.737 A, and c53.186 A. The ionic radii for O 22 and Sn 41 are 1.40 and 0.71 A, respectively. 1 The 6 unit cell atoms give a total of 18 branches for the vibrational modes in the first Brillouin zone. The mechanical representation of the normal vibration modes at the center of the Brillouin zone is given by 2,3 G5G 1 ~ A1g!1G 2 ~ A2g!1G 3 ~ B1g!1G 4 ~ B2g! 1G 5 ~ Eg!12G 1 ~ A2u!12G 4 ~ B1u!14G 5 ~ Eu!, ~1! using the Koster notation with the commonly used symmetry designations listed in parenthesis. The latter will be used throughout this article. Of these 18 modes, 2 are active in infrared ~the single A2u and the triply degenerate Eu), 4 are Raman active ~three nondegenerated modes, A1g , B1g , B2g , and a doubly degenerate Eg), and two are silent ( A2g , and B1u). One A2u and two Eu modes are acoustic. In the Raman active modes oxygen atoms vibrate while Sn atoms are at rest ~see Fig. 1 in Ref. 4!. The nondegenerate mode, A1g , B1g , and B2g , vibrate in the plane perpendicular to the c axis while the doubly degenerated E g mode vibrates in the direction of the c axis. The B 1g mode consists of rotation of the oxygen atoms around the c axis, with all six oxygen atoms of the octahedra participating in the vibration. In the A2g infrared active mode, Sn and oxygen atoms vibrate in the c axis direction, and in the Eu mode both Sn and O atoms vibrate in the plane perpendicular to the c axis. The silent modes correspond to vibrations of the Sn and O atoms in the direction of the c axis (B1u) or in the plane perpendicular to this direction ( A2g). According to the literature, the corresponding calculated or observed frequencies of the optical modes are presented in Table I. When the size of the SnO2 crystal is reduced, the infrared spectrum is modified because the interaction between electromagnetic radiation and the particles depends on the crystal’s size, shape, and state of aggregation. 8‐1 0 Experiments using Raman spectroscopy have also reported spectrum modification, at least partially. Low frequency bands have been observed previously in SnO2, 11 and several authors have reported the existence of bands not observed in single-crystal or polycrystalline SnO 2 which have been found to be closely related to grain size. 12‐15 However, some of these reports do not adequately explain the origin of the abnormal spectrum. The aim of this article is to present a complete Raman spectrum of SnO2 nanoparticles. The analysis comprises ~i! modification of the normal vibration modes active in Raman when the spectra are obtained from nanocrystals of SnO2 ~‘‘classical modes’’ !, ~ii! the disorder activated surface modes in the region around 475‐775 cm 21 , and ~iii! the appearance of the acoustic modes in the low-frequency region of the spectra.

High mobility indium free amorphous oxide thin film transistors

High mobility bottom gate thin film transistors (TFTs) with an amorphous gallium tin zinc oxide (a-GSZO) channel layer have been produced by rf magnetron cosputtering using a gallium zinc oxide (GZO) and tin (Sn) targets. The effect of postannealing temperatures (200, 250, and 300°C) was evaluated and compared with two series of TFTs produced at room temperature (S1) and 150°C (S2) during the channel deposition. From the results, it was observed that the effect of postannealing is crucial for both series of TFTs either for stability as well as for improving the electrical characteristics. The a-GSZO TFTs (W∕L=50∕50μm) operate in the enhancement mode (n-type), present a high saturation mobility of 24.6cm2∕Vs, a subthreshold gate swing voltage of 0.38V/decade, a turn-on voltage of −0.5V, a threshold voltage of 4.6V, and an Ion∕Ioff ratio of 8×107, satisfying all the requirements to be used as active-matrix backplane.

Gallium–Indium–Zinc-Oxide-Based Thin-Film Transistors: Influence of the Source/Drain Material

During the last years, oxide semiconductors have shown that they will have a key role in the future of electronics. In fact, several research groups have already presented working devices with remarkable electrical and optical properties based on these materials, mainly thin-film transistors (TFTs). Most of these TFTs use indium-tin oxide (ITO) as the material for source/drain electrodes. This paper focuses on the investigation of different materials to replace ITO in inverted-staggered TFTs based on gallium-indium-zinc oxide (GIZO) semiconductor. The analyzed electrode materials were indium-zinc oxide, Ti, Al, Mo, and Ti/Au, with each of these materials used in two different kinds of devices: one was annealed after GIZO channel deposition but prior to source/drain deposition, and the other was annealed at the end of device production. The results show an improvement on the electrical properties when the annealing is performed at the end (for instance, with Ti/Au electrodes, mobility rises from 19 to 25 cm2/V ldr s, and turn-on voltage drops from 4 to 2 V). Using time-of-flight secondary ion mass spectrometry (TOF-SIMS), we could confirm that some diffusion exists in the source/drain electrodes/semiconductor interface, which is in close agreement with the obtained electrical properties. In addition to TOF-SIMS results for relevant elements, electrical characterization is presented for each kind of device, including the extraction of source/drain series resistances and TFT intrinsic parameters, such as (intrinsic mobility) and VTi (intrinsic threshold voltage).

Thermal and mechanical analysis of micromachined gas sensors

In this paper, we present a complete thermomechanical study of a micromachined gas sensor substrate. The work has been carried out combining coupled electrothermomechanical three-dimensional finite element modelling simulations with electrical, infrared thermography and interferometric microscopy experimental measurements. The performances predicted by simulations, such as the power consumption (heating efficiency in air of 5.7 °C mW−1), the time response (19 ms), the membrane deflection during operation and the preferential failure sites in the micromachined substrate have been confirmed by experience. Their good agreement validates the model, and allows us to consider the adaptability of this design as a micromachined substrate for integrated gas sensors.

Microwave processing for the low cost, mass production of undoped and in situ catalytic doped nanosized SnO2 gas sensor powders

Abstract Nanosized tin oxide powders were obtained for application in thick film gas sensor technology. This requires an innovative technique, involving the use of microwave energy with a wavelength of 2.45 GHz, which produces doped or undoped powder precursors in just a few minutes. Further stabilisation treatments — conventional heating, OH-stimulated microwaves and combined treatments — were also considered. Reproducibility, low cost and suitability for mass production demonstrate the industrial and scientific feasibility of this new procedure. Material structural characterisation and electrical properties after gas exposure of improved sensors of Pt and Pd in situ doped, and undoped SnO 2 are introduced, showing the suitability of the material.

Insight on the SU-8 resist as passivation layer for transparent Ga2O3–In2O3–ZnO thin-film transistors

A nonvacuum and low temperature process for passivating transparent metal oxides based thin-film transistors is presented. This process uses the epoxy-based SU-8 resist which prevents device degradation against environmental conditions, vacuum or sputtering surface damage. The incorporation of SU-8 as a passivation layer is based on the ability of this polymer to provide features with high mechanical and chemical stability. With this approach, lithography is performed to pattern the resist over the active area of the device in order to form the passivation layer. The resulting transistors demonstrate very good electrical characteristics, such as μFE=61 cm2/V s, VON=−3 V, ON/OFF=4.4×109, and S=0.28 V/dec. Electrical behavior due to the SU-8/metal oxide interface characteristics is also reported on the basis of Fourier transform infrared analysis. In contrast, we demonstrate how sputtering of SiO2 as a passivation layer results in severely degraded devices that cannot be switched-off. In order to obtain pro...

Low-temperature sputtered mixtures of high-κ and high bandgap dielectrics for GIZO TFTs

— This paper discusses the properties of sputtered multicomponent amorphous dielectrics based on mixtures of high-κ and high-bandgap materials and their integration in oxide TFTs, with processing temperatures not exceeding 150°C. Even if Ta2O5 films are already amorphous, multicomponent materials such as Ta2O5—SiO2 and Ta2O5—Al2O3 allow an increase in the bandgap and the smoothness of the films, reducing their leakage current and improving (in the case of Ta2O5—SiO2) the dielectric/semiconductor interface properties when these dielectrics are integrated in TFTs. For HfO2- based dielectrics, the advantages of multicomponent materials are even clearer: while HfO2 films present a polycrystalline structure and a rough surface, HfO2—SiO2 films exhibit an amorphous structure and a very smooth surface. The integration of the multicomponent dielectrics in GIZO TFTs allows remarkable performance, comparable with that of GIZO TFTs using SiO2 deposited at 400°C by PECVD. For instance, with Ta2O5—SiO2 as the dielectric layer, field-effect mobility of 35 cm2/(V-sec), close to 0 V turn-on voltage, an on/off ratio higher than 106, a subthreshold slope of 0.24 V/dec, and a small/recoverable threshold voltage shifts under constant current (ID= 10 μA) stress during 24 hours are achieved. Initial results with multilayers of SiO2/HfO2—SiO2/SiO2 are also shown, allowing a lower leakage current with lower thickness and excellent device performance.

High temperature degradation of Pt/Ti electrodes in micro-hotplate gas sensors

This paper examines the high temperature degradation of Pt–Ti thin films which configure the electrodes of a micro-hotplate designed in agreement with those used for gas sensor applications. FEM simulations of the micro-hotplate have been combined with atomic force microscopy (AFM) and Auger electron spectroscopy (EAS) measurements. Experimentally, the main mechanical failure mechanisms that have been identified are hillocks and delaminations detected in the Pt–Ti micro-electrodes produced by the high thermo-mechanical stresses induced during the operation of the micro-hotplate. Additionally, concurrent with the annealing-induced Pt microstructure changes, Ti from the adhesion layer and N from the Si3N4, migrated into the Pt film. It was shown with AES that, for high temperature operations, the titanium and nitrogen reach the Pt surface. Mechanical failures affect the contact between electrodes and the gas sensing material, and the Ti and N diffusion modifies the electrodes electrical resistivity. It is expected that both kinds of effects alter the electrical connection between the sensing layer and the electrodes, thus influencing the operation of the whole gas sensor.

Deposition on micromachined silicon substrates of gas sensitive layers obtained by a wet chemical route: a CO/CH4 high performance sensor

Abstract This work reports the problems related to deposition of porous nanomaterials onto micromechanized silicon structures by a wet chemical route. Gas test results of the sensors made in this manner are presented and discussed. They show the viability of using wet chemical routes for developing a new generation of gas sensors that combine easily, and have modified sensing layers with the advantages of the micromechanized substrates. As an example, a satisfactory implementation of SnO 2 sensors for CO/CH 4 monitoring by means of microdropping is presented.

Exchange biasing and electric polarization with YMnO3

We report on the growth and functional characterizations of epitaxial thin films of the multiferroic YMnO3. We show that using Pt as a seed layer on SrTiO3(111) substrates, epitaxial YMnO3 films (0001) textured are obtained. An atomic force microscope has been used to polarize electric domains revealing the ferroelectric nature of the film. When a Permalloy layer is grown on top of the YMnO3(0001) film, clear indications of exchange bias and enhanced coercivity are observed at low temperature. The observation of coexisting antiferromagnetism and electrical polarization suggests that the biferroic character of YMnO3 can be exploited in novel devices.