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Featured researches published by Akira Nakano.


international conference on micro electro mechanical systems | 1989

Normally close microvalve and micropump fabricated on a silicon wafer

Masayoshi Esashi; Shuichi Shoji; Akira Nakano

A normally closed microvalve and micropump were fabricated on a silicon wafer by micromachining techniques. Normally closed microvalve has a silicon diaphragm and a small piezoelectric actuator to drive it. The controllable gas flow rate is from 0.1 ml/min to 85 ml/min at a gas pressure of 0.75 kgf/cm/sup 2/. The micropump is a diaphragm-type pump which consists of two polysilicon one-way valves and a diaphragm driven by a small piezoelectric actuator. The maximum pumping flow rate and pressure are 20 mu l/min and 780 mmH/sub 2/O/cm/sup 2/, respectively.<<ETX>>


Sensors and Actuators | 1989

Normally closed microvalve and mircopump fabricated on a silicon wafer

Masayoshi Esashi; Shuichi Shoji; Akira Nakano

Abstract A normally closed microvalve and a micropump are fabricated on a silicon wafer by micro-machining techniques. The normally closed microvalve has a movable silicon diaphragm and a small piezoactuator to drive it. The controllable gas flow rate is from 0.1 ml/min to 85 ml/min at a gas pressure of 0.75 kgf/cm 2 . The micropump is a diaphragm-type pump, which consists of two polysilicon one-way valves and a diaphragm driven by a small piezoactuator. The maximum pumping flow rate and pressure are 20 μ/min and 780 mmH 2 O respectively.


Sensors and Actuators A-physical | 1990

Low-temperature silicon-to-silicon anodic bonding with intermediate low melting point glan

Masayoshi Esashi; Akira Nakano; Shuichi Shoji; Hiroyuki Hebiguchi

Abstract Room-temperature silicon-to-silicon bonding has been performed. It is an electrostatic bonding using sputtered low melting point glass as an intermediate layer. Wafers can be bonded at room temperature with an applied voltage of about 50 V. This technique is useful for the fabrication of intelligent sensors and microelectromechanical systems.


Archive | 2000

Roles of Apolipoprotein E Receptors in Lipoprotein Metabolism

Tokuo Yamamoto; Yousuke Inagaki; Ryoichi X. Ioka; Shiroh Z. Yoshioka; Kenta Magoori; Man-Jong Kang; Yuko Cho; Akira Nakano; Qiong Liu; Takahiro Fujino; Dong-Ho Kim

Two apolipoprotein E (apoE) specific receptors, designated as ‘very low density lipoprotein receptor’ (VLDLR) and ‘apoE receptor 2’ (apoER2), closely resemble the structure of the low density lipoprotein receptor (LDLR), but they are expressed in different tissues. VLDLR mRNA is abundant in heart, skeletal muscle, brain and adipose tissues, whereas apoER2 mRNA predominates in the brain. In chicken, VLDLR is expressed almost exclusively in oocytes and mediates the uptake of yolk precursors, VLDL and vitellogenin. In contrast to the chicken, where absence of VLDLR results in an inability to lay eggs, the phenotype of VLDLR knockout mice is rather modest, except for a marked reduction of triacylglycerol content in adipose tissue, suggesting that VLDLR plays a part in the uptake of fat into adipocytes. Characterization of the apoER2 gene in various species has revealed the occurrence of an exon loss during its evolution and suggests that exon loss has contributed to the evolution of genes containing repetitive sequences. In addition to apoER2 and VLDLR, we have identified a new LDLR related protein (LRP) that recognizes apoE. This new LRP is expressed in the liver and steroidogenic tissues, suggesting a role in the clearance of apoE-lipoproteins.


Journal of Biochemistry | 1998

A New Low Density Lipoprotein Receptor Related Protein, LRP5, Is Expressed in Hepatocytes and Adrenal Cortex, and Recognizes Apolipoprotein E

Dong-Ho Kim; Yousuke Inagaki; Takashi Suzuki; Ryoichi X. Ioka; Shiroh Z. Yoshioka; Kenta Magoori; Man-Jong Kang; Yuko Cho; Akira Nakano; Qiong Liu; Takahiro Fujino; Hiroyuki Suzuki; Hironobu Sasano; Tokuo T. Yamamoto


Archive | 1997

Inverse stagger or planar type thin-film transistor device and liquid-crystal display apparatus having floating gate electrode which is capacitively coupled with one or more input electrodes

Akira Nakano; Tadashi Shibata; Tadahiro Ohmi


Archive | 2001

Performance evaluation method for plasma processing apparatus for continuously maintaining a desired performance level

Akira Nakano; Tadahiro Ohmi


Archive | 1995

Method of sputtering a silicon nitride film

Koichi Fukuda; Tomofumi Oba; Masanori Miyazaki; Hirofumi Fukui; Chisato Iwasaki; Yasuhiko Kasama; Tadahiro Ohmi; Masaru Kubota; Hitoshi Kitagawa; Akira Nakano; Osamu Yoshida


Archive | 1994

Production of electrooptical element

Hirofumi Fukui; Hiroyuki Hebiguchi; Chisato Iwasaki; Masaru Kawabata; Akira Nakano; Kenji Yamamoto; 陽 仲野; 健二 山本; 千里 岩崎; 賢 川畑; 洋文 福井; 広行 蛇口


Archive | 2002

Plasma processing apparatus, driving method therefor and plasma processing method

Masa Kumagai; Akira Nakano; Tomofumi Oba; Tadahiro Omi; 陽 仲野; 知文 大場; 忠弘 大見; 雅 熊谷

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Koichi Fukuda

National Institute of Advanced Industrial Science and Technology

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