Albert A. Burk

Silicon carbide power MOSFETs: Breakthrough performance from 900 V up to 15 kV

Since Cree, Inc.s 2^nd generation 4H-SiC MOSFETs were commercially released with a specific on-resistance (R_{ON, SP}) of 5 mΩ·cm² for a 1200 V-rating in early 2013, we have further optimized the device design and fabrication processes as well as greatly expanded the voltage ratings from 900 V up to 15 kV for a much wider range of high-power, high-frequency, and high-voltage energy-conversion and transmission applications. Using these next-generation SiC MOSFETs, we have now achieved new breakthrough performance for voltage ratings from 900 V up to 15 kV with a R_{ON, SP} as low as 2.3 mΩ·cm² for a breakdown voltage (BV) of 1230 V and 900 V-rating, 2.7 mΩ·cm² for a BV of 1620 V and 1200 V-rating, 3.38 mΩ·cm² for a BV of 1830 V and 1700 V-rating, 10.6 mΩ·cm² for a BV of 4160 V and 3300 V-rating, 123 mΩ·cm² for a BV of 12 kV and 10 kV-rating, and 208 mΩ·cm² for a BV of 15.5 kV and 15 kV-rating. In addition, due to the lack of current tailing during the bipolar device switching turn-off, the SiC MOSFETs reported in this work exhibit incredibly high frequency switching performance over their silicon counter parts.

10 kV and 15 kV silicon carbide power MOSFETs for next-generation energy conversion and transmission systems

Advanced high-voltage (10 kV-15 kV) silicon carbide (SiC) power MOSFETs described in this paper have the potential to significantly impact the system performance, size, weight, high-temperature reliability, and cost of next-generation energy conversion and transmission systems. In this paper, we report our recently developed 10 kV/20 A SiC MOSFETs with a chip size of 8.1 × 8.1 mm2 and a specific on-resistance (RON, SP) of 100 MΩ-cm2 at 25 °C. We also developed 15 kV/10 A SiC power MOSFETs with a chip size of 8 × 8 mm2 and a RON, SP of 204 mQ cm2 at 25 °C. To our knowledge, this 15 kV SiC MOSFET is the highest voltage rated unipolar power switch. Compared to the commercial 6.5 kV Silicon (Si) IGBTs, these 10 kV and 15 kV SiC MOSFETs exhibit extremely low switching losses even when they are switched at 2-3× higher voltage. The benefits of using these 10 kV and 15 kV SiC MOSFETs include simplifying from multilevel to two-level topology and removing the need for time-interleaving by improving the switching frequency from a few hundred Hz for Si based systems to ≥ 10 kHz for hard-switched SiC based systems.

22 kV, 1 cm 2 , 4H-SiC n-IGBTs with improved conductivity modulation

In this paper, we report our recently developed large area 4H-SiC n-IGBTs that have a chip size of 1 cm2 and an active conducting area of 0.37 cm2. A blocking voltage of 22.6 kV has been demonstrated with a leakage current of 9 μA at a gate bias of 0 V at room-temperature. This is the highest breakdown voltage of a single MOS-controlled semiconductor switch reported to date. To improve the conductivity modulation and lower the conduction losses during the on-state, a thermal oxidation process was applied to enhance the carrier lifetime prior to the device fabrication. Compared to the devices that did not receive this lifetime enhancement process, the lifetime enhanced devices displayed nearly 1 V lower forward voltage drop with little increase in switching energy and no degradation of static blocking characteristics. A specific differential on-resistance of 55 mΩ-cm2 at 20 A and 125 °C was achieved, suggesting that bipolar power devices with thick drift regions can benefit from further enhancement of the ambipolar carrier lifetime.

Development of 15 kV 4H-SiC IGBTs

We present our latest developments in ultra high voltage 4H-SiC IGBTs. A 6.7 mm x 6.7 mm 4H-SiC N-IGBT with an active area of 0.16 cm2 showed a blocking voltage of 12.5 kV, and demonstrated a room temperature differential specific on-resistance of 5.3 mΩ-cm2 with a gate bias of 20 V. A 4H-SiC P-IGBT exhibited a record high blocking voltage of 15 kV, while showing a differential specific on-resistance of 24 mΩ-cm2. A comparison between P- and N- IGBTs in 4H-SiC is provided in this paper.

Large Diameter 4H-SiC Substrates for Commercial Power Applications

The SiC power device market is predicted to grow exponentially in the next few years. In the development of substrates for this emerging commercial market, it is imperative to develop the product to meet the needs of the targeted application. In this paper we will discuss the status and requirements for SiC substrates for power devices such as Schottky and PiN diodes. For example, for the SiC Schottky device where current production is approaching 50 amp devices, there are several substrate material aspects that are key. These include: wafer diameter (3-inch and 100 mm), micropipe density (<1cm -2 for 3-inch substrates and as low as 30cm -2 for 100-mm substrates), dislocation density, and wafer cost.

Strategic Overview of High-Voltage SiC Power Device Development Aiming at Global Energy Savings

Advanced high-voltage (≥10 kV) silicon carbide (SiC) devices described in this paper have the potential to significantly impact the system size, weight, high-temperature reliability, and cost of modern variable-speed medium-voltage (MV) systems such as variable speed (VSD) drives for electric motors, integration of renewable energy including energy storage, micro-grids, traction control, and compact pulsed power systems. In this paper, we review the current status of the development of 10 kV-20 kV class power devices in SiC, including MOSFETs, JBS diodes, IGBTs, GTO thyristors, and PiN diodes at Cree. Advantages and weakness of each device are discussed and compared. A strategy for high-voltage SiC power device development is proposed.

SiC Epitaxial Layer Growth in a 6x150 mm Warm-Wall Planetary Reactor

Initial results are presented for SiC-epitaxial growths employing a novel 6x150-mm/10x100-mm Warm-Wall Planetary Vapor-Phase Epitaxial (VPE) Reactor. The increased areal throughput offered by this reactor and 150-mm diameter wafers, is intended to reduce the cost per unit area for SiC epitaxial layers, increasing the market penetration of already successful commercial SiC Schottky and MOSFET devices [1]. Growth rates of 20 micron/hr and short <2 hr fixed-cycle times (including rapid heat-up and cool-down ramps), while maintaining desirable epitaxial layer quality were achieved. No significant change in 150 mm diameter wafer shape is observed upon epitaxial growth consistent with good-quality, low-stress substrates and low (<5°C) cross-wafer epitaxial reactor temperature variation. Specular epitaxial layer morphology was obtained, with morphological defect densities consistent with projected 5x5 mm die yields as high as 80% and surface roughness, Ra, of 0.3 nm. Intrawafer thickness uniformity is good, averaging only 1.6% and within a run wafer-to-wafer thickness variation is 2.7%. N-type background doping densities less that 1E14 cm-3 have been measured by CV. Doping uniformity and wafer-to-wafer variation currently average ~12% requiring further improvement. The first 100 m thick 150-mm diameter epitaxial growths are reported.

9 kV, 1 cm2 SiC Gate Turn-Off Thyristors

In this paper, for the first time, we report a large area (1 cm2) SiC GTO with 9 kV blocking voltage fabricated on 100-mm 4H-SiC substrates with much reduced Basal Plane Dislocation (BPD) density. The static and dynamic characteristics are described. A forward drop of 3.7 V at 100 A (100 A/cm2) is measured at 25°C. A slight positive temperature coefficient of the forward drop is present at 300 A/cm2, indicating the possibility of paralleling multiple devices for higher current capability. The device exhibits extremely low leakage currents at high temperatures. The device has shown fast turn-on time of 53.9 nsec, and ~3.5 s of turn-off time, respectively. A stable forward voltage drop after electrical stress for >1000 hours has been achieved.

Large Area SiC Epitaxial Layer Growth in a Warm-Wall Planetary VPE Reactor

Experimental results are presented for SiC epitaxial layer growths employing a largearea, 7x3-inch, warm-wall planetary SiC-VPE reactor. This high-throughput reactor has been optimized for the growth of uniform 0.01 to 30-micron thick, specular, device-quality SiC epitaxial layers with background doping concentrations of <1x1014 cm-3. Multi-layer device profiles such as Schottky, MESFETs, SITs, and BJTs with n-type doping from ~1x1015 cm-3 to >1x1019 cm-3, p-type doping from ~3x1015 cm-3 to >1x1020 cm-3, and abrupt doping transitions (~1 decade/nm) are regularly grown in continuous growth runs. Intrawafer layer thickness and n-type doping uniformities of <1% and <5% s/mean have been achieved. Within a run, wafer-to-wafer thickness and doping variation are ~±1% and ~±5% respectively. Long term run-to-run variations while under process control are approximately ~3% s/mean for thickness and ~5% s/mean for doping. Latest results from an even larger 6x4-inch (100-mm) reactor are also presented.

Defect Status in SiC Manufacturing

Availability of high-quality, large diameter SiC wafers in quantity has bolstered the commercial application of and interest in both SiC- and nitride-based device technologies. Successful development of SiC devices requires low defect densities, which have been achieved only through significant advances in substrate and epitaxial layer quality. Cree has established viable materials technologies to attain these qualities on production wafers and further developments are imminent. Zero micropipe (ZMP) 100 mm 4HN-SiC substrates are commercially available and 1c dislocations densities were reduced to values as low as 175 cm-2. On these low defect substrates we have achieved repeatable production of thick epitaxial layers with defect densities of less than 1 cm-2 and as low as 0.2 cm-2. These accomplishments rely on precise monitoring of both material and manufacturing induced defects. Selective etch techniques and an optical surface analyzer is used to inspect these defects on our wafers. Results were verified by optical microscopy and x-ray topography.