Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where Alexandra Pazidis is active.

Publication


Featured researches published by Alexandra Pazidis.


Optical Interference Coatings (2007), paper FA1 | 2007

High-Performance Optical Coatings for VUV Lithography Application

Christoph Zaczek; Alexandra Pazidis; Horst Feldermann

Top level requirements and challenges for the optical coatings in the latest generation of 193nm lithography optics are presented. Emphasis is placed on the influence of different parameters on the optical properties of such coatings.


Archive | 2008

Projection objective for immersion lithography

Karl-Stefan Weissenrieder; Alexander Hirnet; Alexandra Pazidis; Karl-Heinz Schuster; Christoph Zaczek; Michael Lill; Patrick Scheible; Harald Schink; Markus Brotsack; Ulrich Loering; Toralf Gruner; Guenter Scheible


Archive | 2005

Projection system with compensation of intensity variations and compensation element therefor

Patrick Scheible; Alexandra Pazidis; Reiner Garreis; Michael Totzeck; Heiko Feldmann; Paul Graeupner; Hans-Juergen Rostalski; Wolfgang Singer


Archive | 2008

Optical element, projection lens and associated projection exposure apparatus

Alexandra Pazidis; Stephan Six; Ruediger Duesing; Gennady Fedosenko


Archive | 2003

Objective lens consisting of crystal lenses

Aksel Goehnermeier; Alexandra Pazidis; Birgit Mecking; Christoph Zaczek; Daniel Kraehmer


Archive | 2004

Objective with crystal lenses

Aksel Goehnermeier; Alexandra Pazidis; Birgit Kuerz; Christoph Zaczek; Daniel Kraehmer


Archive | 2004

Refractive projection objective for production of semiconductor elements by immersion microlithography, comprises five lens groups and a system screen, forming a single-waist system of light beam diameters

Markus Brotsack; Toralf Gruner; Alexander Hirnet; Michael Lill; Ulrich Löring; Alexandra Pazidis; Patrick Scheible; Harald Schink; Karl-Heinz Schuster; Karl-Stefan Weissenrieder; Christoph Zaczek


Archive | 2006

Pellicle for use in a microlithographic exposure apparatus

Aksel Goehnermeier; Alexandra Pazidis


Archive | 2006

Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element

Christoph Zaczek; Alexandra Pazidis


Archive | 2005

Process for protecting a metallic mirror against degradation, and metallic mirror

Christoph Zaczek; Alexandra Pazidis; Jens Ullmann; Angelika Müllender; Markus Haidl; Horst Feldermann

Collaboration


Dive into the Alexandra Pazidis's collaboration.

Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Researchain Logo
Decentralizing Knowledge