Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where Aksel Göhnermeier is active.

Publication


Featured researches published by Aksel Göhnermeier.


Journal of Micro-nanolithography Mems and Moems | 2005

Polarization influence on imaging

Michael Totzeck; Paul Gräupner; Tilmann Heil; Aksel Göhnermeier; Olaf Dittmann; Daniel Kraehmer; Vladimir Kamenov; Johannes Ruoff; Donis G. Flagello

We give a general introduction into polarized imaging and report on a Jones pupil approach for a complete evaluation of the resulting optical performance. The Jones pupil assigns a Jones matrix to each point of the exit pupil, describing the impact of both the global phase and the polarization on imaging. While we already can learn much about the optical system by taking a close look at the Jones pupil-and starting imaging simulations from it-a quantitative assessment is necessary for a complete evaluation of imaging. To do this, we generalize the concept of scalar Zernike aberrations to Jones-Zernike aberrations by expansion of the Jones pupil into vector polynomials. The resulting method is nonparaxial, i.e., the effect of the polarization-dependent contrast loss for high numerical apertures is included. The aberrations of the Jones matrix pupil are a suitable tool to identify the main drivers determining polarization performance. Furthermore, they enable us to compare the polarized and unpolarized performance of such a characterized lithographic system.


Optical Microlithography XVIII | 2005

How to describe polarization influence on imaging (Invited Paper)

Michael Totzeck; Paul Gräupner; Tilmann Heil; Aksel Göhnermeier; Olaf Dittmann; Daniel Krähmer; Vladimir Kamenov; Johannes Ruoff; Donis G. Flagello

We give a general introduction into polarized imaging and report on a Jones-pupil approach for a complete evaluation of the resulting optical performance. The Jones pupil assigns a Jones matrix to each point of the exit pupil describing the impact of both the global phase and the polarization on imaging. While we can learn already a lot about the optical system by taking a close look at the Jones pupil - and starting imaging simulations from it - a quantitative assessment is necessary for a complete evaluation of imaging. To do this, we generalize the concept of scalar Zernike aberrations to Jones-Zernike aberrations by expansion of the Jones pupil into vector polynomials. The resulting method is non-paraxial, i.e. the effect of the polarization dependent contrast loss for high numerical apertures is included. The aberrations of the Jones-matrix pupil are a suitable tool to identify the main drivers determining the polarization performance. Furthermore, they enable us to compare the polarized and the unpolarized performance of the such characterized lithographic system.


Nature Photonics | 2007

Semiconductor fabrication: Pushing deep ultraviolet lithography to its limits

Michael Totzeck; Wilhelm Ulrich; Aksel Göhnermeier; Winfried Kaiser


Archive | 2007

Projection exposure system e.g. step-and-scan system, for semiconductor lithography, has optical element e.g. lens, manipulated by actuator of manipulator e.g. Alvarez-element, where manipulator is designed in exchangeable manner

Bernhard Gellrich; Bernhard Geuppert; Aksel Göhnermeier; Dirk Hellweg; Stefan Hembacher; Jens Kugler; Guido Limbach; Ulrich Loering; Peter Meyer; Armin Schöppach; Franz Sorg; Ulrich Weber; Stefan Xalter


Archive | 2008

Optical system`s i.e. projection lens for microlithography, imaging characteristics improving method, involves arranging optical correction arrangement in proximity of pupil level of optical system

Aksel Göhnermeier


Archive | 2003

COATED OPTICAL ELEMENT FOR CORRECTIVE ACTION OBTAINED BY PRODUCING LAYER THICKNESS VARIATIONS OR BY REFRACTION FACTOR VARIATIONS IN SAID COATING

Gerd Reisinger; Alexandra Pazidis; Aksel Göhnermeier; Alexander Dinger; Thomas Petasch; Thure Böhm; Rainer Börret


Archive | 2013

Interference lithography device for use in patterning of light exit surface of wafer for high brightness LED, has phase/blaze grating with low period length, for coherent superposition of sub-beams in image plane

Aksel Göhnermeier


Archive | 2013

Korrekturvorrichtung zur Beeinflussung einer Intensität eines Beleuchtungslicht-Bündels

Boris Bittner; Aksel Göhnermeier; Sonja Schneider


Archive | 2012

Projektionsbelichtungsanlage der EUV-Mikrolithographie und Verfahren zur mikrolithographischen Belichtung

Marc Bienert; Heiko Feldmann; Aksel Göhnermeier; Oliver Natt; Johannes Ruoff


Archive | 2012

Exposure system for structured exposure of photosensitive layer to manufacture e.g. organic LED display during microlithography process, has light sources coupled with micro optics so that light is directed toward photosensitive layer

Aksel Göhnermeier

Collaboration


Dive into the Aksel Göhnermeier's collaboration.

Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Researchain Logo
Decentralizing Knowledge