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Ando Shigeru

Toshiba

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Archive | 1991

HIGH PURITY METALLIC MATERIAL, MANUFACTURE THEREOF, SPUTTERING TARGET USING SAME, AND WIRING NETWORK AND SEMICONDUCTIVE PACKAGE FORMED BY USING SAME

Ishigami Takashi; Kawai Mitsuo; Obata Minoru; Sato Michio; Yamanobe Takashi; Maki Toshihiro; Ando Shigeru; Yagi Noriaki

Archive | 2005

PROCESS FOR FABRICATING SEMICONDUCTOR ELEMENT, AND W MATERIAL FOR MAGNETRON SPUTTERING SYSTEM

Ishigami Takashi; Sato Michio; Obata Minoru; Miyauchi Masami; Kawai Mitsuo; Yamanobe Takashi; Maki Toshihiro; Yagi Noriaki; Ando Shigeru; Kobanawa Yoshiko

Archive | 1996

HIGH-PURITY METALLIC MATERIAL

Ishigami Takashi; Kawai Mitsuo; Obata Minoru; Sato Michio; Yamanobe Takashi; Maki Toshihiro; Ando Shigeru; Yagi Noriaki

Archive | 1999

INTERCONNECTION FILM FOR FORMING SEMICONDUCTOR ELEMENT AND SEMICONDUCTOR PACKAGE

Ishigami Takashi; Kawai Mitsuo; Obata Minoru; Sato Michio; Yamanobe Takashi; Maki Toshihiro; Ando Shigeru; Yagi Noriaki

Archive | 1999

HIGH-PURITY CONDUCTIVE FILM FOR SEMICONDUCTOR DEVICE AND FORMATION THEREOF, AND SEMICONDUCTOR DEVICE USING THE SAME

Ishigami Takashi; Sato Michio; Obata Minoru; Miyauchi Masami; Kawai Mitsuo; Yamanobe Takashi; Maki Toshihiro; Yagi Noriaki; Ando Shigeru; Kobanawa Yoshiko

Archive | 1998

WIRING COATING FOR FORMING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR PACKAGE

Ishigami Takashi; Kawai Mitsuo; Obata Minoru; Sato Michio; Yamanobe Takashi; Maki Toshihiro; Ando Shigeru; Yagi Noriaki

Archive | 1993

SEMICONDUCTOR ELEMENT HIGH PURITY CONDUCTIVE FILM AND SEMICONDUCTOR ELEMENT USING THEREOF

Ishigami Takashi; Sato Michio; Obata Minoru; Miyauchi Masami; Kawai Mitsuo; Yamanobe Takashi; Maki Toshihiro; Yagi Noriaki; Ando Shigeru; Kobanawa Yoshiko

Archive | 2005

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND Ti-W MATERIAL FOR MAGNETRON SPUTTERING SYSTEM

Ishigami Takashi; Sato Michio; Obata Minoru; Miyauchi Masami; Kawai Mitsuo; Yamanobe Takashi; Maki Toshihiro; Yagi Noriaki; Ando Shigeru; Kobanawa Yoshiko

Archive | 1991

Highly purified metal and sputtering target using the same

Ishigami Takashi; Obata Minoru; Kawai Mituo; Satou Michio; Yamanobe Takashi; Maki Toshihiro; Yagi Noriaki; Ando Shigeru

Archive | 2006

HIGH PURITY W SILICIDE MATERIAL FOR MAGNETRON SPUTTERING APPARATUS

Ishigami Takashi; Sato Michio; Obata Minoru; Miyauchi Masami; Kawai Mitsuo; Yamanobe Takashi; Maki Toshihiro; Yagi Noriaki; Ando Shigeru; Kobanawa Yoshiko

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Collaboration

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Ishigami Takashi

Toshiba

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Maki Toshihiro

Toshiba

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Obata Minoru

Toshiba

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Yamanobe Takashi

Toshiba

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Yagi Noriaki

Toshiba

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Sato Michio

Toshiba

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Kawai Mitsuo

Toshiba

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Miyauchi Masami

Toshiba

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Kawai Mituo

Toshiba

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Satou Michio

Toshiba

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