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Dive into the research topics where Andreas Miler is active.

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Featured researches published by Andreas Miler.


Journal of Applied Physics | 2005

Facet degradation of GaN heterostructure laser diodes

Thomas Schoedl; Ulrich T. Schwarz; V. Kümmler; Michael Furitsch; Andreas Leber; Andreas Miler; Alfred Lell; Volker Härle

We investigated the degradation of cleaved facets of (Al,In)GaN laser diodes in different atmospheres. We found that operation in water-free atmospheres with sufficient oxygen shows a slow degradation. Operation in atmospheres with water vapor causes a fast degradation and an oxidation on the facet. This deposition is a permanent damage to the laser diode. If the laser diode is operated in pure nitrogen, we find a thick deposition on the facet, which shows high absorption. This deposition can be removed by either high optical output powers or by operation in atmospheres with sufficient oxygen. We also explain the influence of these coatings to the degradation behavior and see these coatings as the reason for unstable kinks in the L–I characteristics during operation.


Physica Status Solidi (a) | 2006

Comparison of degradation mechanisms of blue-violet laser diodes grown on SiC and GaN substrates

Michael Furitsch; Adrian Stefan Avramescu; Christoph Eichler; Karl Engl; Andreas Leber; Andreas Miler; Christian Rumbolz; Georg Brüderl; Uwe Strauß; Alfred Lell; Volker Härle


Journal of Crystal Growth | 2006

Influence of an in situ-deposited SiNx intermediate layer inside GaN and AlGaN layers on SiC substrates

Karl Engl; Martin Beer; Nikolaus Gmeinwieser; Ulrich T. Schwarz; Josef Zweck; Werner Wegscheider; Stephan Miller; Andreas Miler; Hans-Juergen Lugauer; G. Brüderl; Alfred Lell; Volker Härle


Physica Status Solidi (a) | 2006

Development of AlInGaN based blue–violet lasers on GaN and SiC substrates

Christian Rumbolz; Georg Brüderl; Andreas Leber; Christoph Eichler; Michael Furitsch; Adrian Stefan Avramescu; Andreas Miler; Alfred Lell; Uwe Strauß; Volker Härle


Archive | 2006

Semiconductor-layer structure useful in optoelectronic component, comprises a super lattice out of alternating piled layers of a first and a second type

Christoph Eichler; Alfred Lell; Andreas Miler; Marc Schillgalies


Archive | 2007

Semiconductor layer structure having superlattice

Christoph Eichler; Alfred Lell; Andreas Miler; Mark Schillgalies; レル アルフレート; ミーラー アンドレアス; アイヒラー クリストフ; シルガリース マルク


Archive | 2007

SEMICONDUCTOR LAYER STRUCTURE WITH OVER LATTICE

Christoph Eichler; Alfred Lell; Andreas Miler; Marc Schillgalies


Archive | 2007

LD or LED with superlattice cladding layer

Christoph Eichler; Alfred Lell; Andreas Miler; Marc Schillgalies


Archive | 2007

Semiconductor layer structure with overlay grid

Christoph Eichler; Alfred Lell; Andreas Miler; Marc Schillgalies


Archive | 2006

Semiconductor layer structure for optoelectronic component e.g. LED and laser diode, has stacked layers of two types comprising layer thicknesses that are increased with increased distance of active layers by layer to layer

Christoph Eichler; Alfred Lell; Andreas Miler; Marc Schillgalies

Collaboration


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Alfred Lell

Osram Opto Semiconductors GmbH

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Christoph Eichler

Osram Opto Semiconductors GmbH

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Marc Schillgalies

Osram Opto Semiconductors GmbH

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Volker Härle

Osram Opto Semiconductors GmbH

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Andreas Leber

Osram Opto Semiconductors GmbH

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Michael Furitsch

Osram Opto Semiconductors GmbH

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Adrian Stefan Avramescu

Osram Opto Semiconductors GmbH

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Christian Rumbolz

Osram Opto Semiconductors GmbH

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Georg Brüderl

Osram Opto Semiconductors GmbH

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Karl Engl

Osram Opto Semiconductors GmbH

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