Anh Huy Tuan Le

RF magnetron sputtered ITO:Zr thin films for the high efficiency a-Si:H/c-Si heterojunction solar cells

ITO and ITO:Zr films with various thicknesses were prepared on glass substrates by RF magnetron sputtering. We observed a decrease in sheet resistance with increasing film thickness that in good agreement with Fuchs-Sondheimer theory. The ITO films doped with ZrO2 (∼0.2 wt%) showed improvement in some of the electrical and optical properties of ITO films. The surface roughness of ITO:Zr films increased with increasing film thickness. ITO:Zr films with thickness of 120 nm showed highest work function of 5.13 eV, as estimated from XPS data. The ITO:Zr films were employed as front electrodes in HIT solar cells; the best device performance was found to be: Voc = 710 mV, Jsc = 34.44 mA/cm2, FF = 74.8%, η = 18.30% at a thickness of 120 nm. A maximum quantum efficiency (QE) of 89% was recorded for HIT solar cells at a wavelength of 700 nm for 120 nm thick ITO:Zr films.

Plasma Textured Glass Surface Morphologies for Amorphous Silicon Thin Film Solar Cells-A review

Copyright ©2016 KIEEME. All rights reserved. This is an open-access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/3.0) which permits unrestricted noncommercial use, distribution, and reproduction in any medium, provided the original work is properly cited. pISSN: 1229-7607 eISSN: 2092-7592 DOI: http://dx.doi.org/10.4313/TEEM.2016.17.2.98 OAK Central: http://central.oak.go.kr

Al2O3/SiON stack layers for effective surface passivation and anti-reflection of high efficiency n-type c-Si solar cells

Excellent surface passivation and anti-reflection properties of double-stack layers is a prerequisite for high efficiency of n-type c-Si solar cells. The high positive fixed charge (Q f) density of N-rich hydrogenated amorphous silicon nitride (a-SiNx:H) films plays a poor role in boron emitter passivation. The more the refractive index ( n ) of a-SiNx:H is decreased, the more the positive Q f of a-SiNx:H is increased. Hydrogenated amorphous silicon oxynitride (SiON) films possess the properties of amorphous silicon oxide (a-SiOx) and a-SiNx:H with variable n and less positive Q f compared with a-SiNx:H. In this study, we investigated the passivation and anti-reflection properties of Al2O3/SiON stacks. Initially, a SiON layer was deposited by plasma enhanced chemical vapor deposition with variable n and its chemical composition was analyzed by Fourier transform infrared spectroscopy. Then, the SiON layer was deposited as a capping layer on a 10 nm thick Al2O3 layer, and the electrical and optical properties were analyzed. The SiON capping layer with n = 1.47 and a thickness of 70 nm resulted in an interface trap density of 4.74 = 1010 cm−2 eV−1 and Q f of −2.59 = 1012 cm−2 with a substantial improvement in lifetime of 1.52 ms after industrial firing. The incorporation of an Al2O3/SiON stack on the front side of the n-type solar cells results in an energy conversion efficiency of 18.34% compared to the one with Al2O3/a-SiNx:H showing 17.55% efficiency. The short circuit current density and open circuit voltage increase by up to 0.83 mA cm−2 and 12 mV, respectively, compared to the Al2O3/a-SiNx:H stack on the front side of the n-type solar cells due to the good anti-reflection and front side surface passivation.

Fabrication of honeycomb textured glass substrate and nanotexturing of zinc oxide front electrode for its application in high efficiency thin film amorphous silicon solar cell

Abstract. A significant part of broad band sunlight remains unabsorbed in a simple structured amorphous silicon solar cell. This absorption can be enhanced by adopting a light-trapping scheme with the help of a textured front surface and back reflector. For this purpose, honeycomb-type texture was fabricated on a glass surface by chemical etching. A 3  μm×3  μm honeycomb patterned optical-mask was used to create an image-pattern of an etch-mask on the glass surfaces. We used 0.5% hydrofluoric acid (HF) as an etchant solution with an optimized etching time ranging between 25 and 28 min. This single textured glass shows an enhancement in diffused transmission of light. In solar cell application, a 630-nm-thick Al-doped ZnO (AZO) layer was deposited over the textured glass surface. An additional random etching was carried out on the AZO with 1% HF acid solution for 10 s. This results to a double textured AZO superstrate on which solar cells were fabricated. The solar cells show higher short circuit current density to 17.2  mA/cm2. Finally, we obtained photovoltaic conversion efficiency of an optimized solar cell as 10.75% (with the corresponding Jsc as 17.03  mA/cm2).

High performance non-volatile memory with the control of charge trapping states in an amorphous InSnZnO active channel

In this study, the influence of interface states between an indium tin zinc oxide (ITZO) active layer and a gate insulator on memory characteristics was examined as a function of annealing temperature. The annealing nonvolatile memory (NVM) devices have shown the best electrical characteristics such as high field effect mobility (27.22 cm2 V−1 s−1), low threshold voltage (0.15 V), low subthreshold slope (0.17 V dec−1), and high on/off current ratio (7.57 × 107) in comparison with as-deposited devices. By annealing at 250 °C, the number of ITZO/insulator interface trap densities was reduced. The effect of the remaining trap states on the retention characteristic of memory devices is negligible. The performance of NVM devices using different annealing temperatures of ITZO and a multi-stack gate insulator SiO2/SiOx/SiOxNy with Si-rich SiOx for the charge storage layer was also reported. The 250 °C annealed ITZO-based NVM device showed a retention exceeding ~94% of the threshold voltage shift after 104 s and greater than ~90% after 10 years with a low operating voltage of +11 V at only 1 μs programming duration time. Therefore, the NVM devices, which were fabricated by the low ITZO/insulator interface trap densities, were highly suitable for potential application in memory systems.

Reduction in Photocurrent Loss and Improvement in Performance of Single Junction Solar Cell Due to Multistep Grading of Hydrogenated Amorphous Silicon Germanium Active Layer

Single junction solar cells were fabricated with intrinsic hydrogenated amorphous silicon germanium (a-SiGe:H) as the active layer, that shows a 10% photovoltaic conversion efficiency. The a-SiGe:H active layer of the solar cells of type-A had constant band gap materials while that of type-B had a four step graded band gap by composition gradient (CG). The cells with composition gradient show an enhancement in fill factor and open circuit voltage (V oc) by 5% and 20 mV respectively, with respect to a cell without the graded band gap active layer. Such an enhanced device performance is attributed to reduction in recombination loss of photo-generated electron hole pairs. The effect of this photo-current loss was investigated in the electrical bias dependent external quantum efficiencies (EQE), illumination dependent current-voltage measurements and dark current-voltage characteristics. The device parameters like reverse saturation current density (J o), series resistance (R s) and diode quality factor (n) were also estimated. In comparison to the cell without the composition gradient, the EQE shows a reduced recombination loss across the whole wavelength range for the cell with the CG. Furthermore, the introduction of the CG results in a significantly increased shunt resistance from 720 to 1200 Ω.cm 2. The estimated n values of the cells under dark operating condition, decreases from 1.8 to 1.7 along with J o from 3 × 10 −7 down to 4.5 × 10 −8 A/cm 2 with CG, while the same parameters decreased from 3.73 to 3.06, 2.96 × 10 −6 to 3.05 × 10 −7 A/cm 2 respectively under AM1.5G insolation.

High Efficiency Inorganic/Inorganic Amorphous Silicon/Heterojunction Silicon Tandem Solar Cells

We investigated high-efficiency two-terminal tandem photovoltaic (PV) devices consisting of a p/i/n thin film silicon top sub-cell (p/i/n-TFS) and a heterojunction with an intrinsic thin-layer (HIT) bottom sub-cell. We used computer simulations and experimentation. The short-circuit current density (Jsc) of the top sub-cell limits the Jsc of the p/i/n-TFS/HIT tandem PV device. In order to improve the Jsc of the top sub-cell, we used a buffer-layer at the p/i and i/n interface and a graded forward-profile (f-p) band gap hydrogenated amorphous silicon germanium active layer, namely i-layer, in the top sub-cell. These two approaches showed a remarkable raise of the top sub-cell’s Jsc, leading to the increase of the Jsc of the PV tandem device. Furthermore, in order to minimize the optical loss, we employed a double-layer anti-reflective coating (DL-ARC) with a magnesium fluoride/indium tin oxide double layer on the front surface. The reduction in broadband reflection on the front surface (with the DL-ARC) and the enhanced optical absorption in the long wavelength region (with the graded f-p band gap) resulted in the high Jsc, which helped achieve the efficiency up to 16.04% for inorganic-inorganic c-Si-based tandem PV devices.

HF etched glass substrates for improved thin-film solar cells

A hemisphere-array textured glass substrate was fabricated for the development of an improved thin-film (TF) silicon solar cell. The HF-H2SO4-etchant system influenced the light path owing to the formation of the strong fluorine-containing HSO3F acid. In particular, the etching system of the various HF concentration with a constant H2SO4 solution is related to make an improvement of optical transmittance and light trapping structure without a uniform pattern. According to the specular transmittance measurements, the haze ratio was maintained for the glass sample etched with 35% HF in the longer-wavelength region. The proposed substrate was implemented in a TF-Si solar cell, and an improved conversion efficiency was observed according to the short-circuit current density owing to the increase in the haze ratio. This morphology, therefore, induces more scattering at the front side of the cell and leads to an improvement of the open circuit voltage gain for the HF 25% cell. It will be helpful to understand the application of thin film solar cell based on the HF-H2SO4 etching system for the readers.

Light scattering through multi-textured periodic glass surface morphologies for a-Si thin film solar cells

Front transparent conductive oxide (TCO) films play a vital role in amorphous silicon based thin film solar cells due to their high transparency, conductivity and excellent light scattering properties. The precise surface morphology with better step coverage for the front TCO films is a hot research topic now a days. Since the low step coverage of TCO films suffered non uniformity and hence low performance of amorphous silicon thin film solar cells (a-Si TFSCs). We report novel multi-textured periodic textured glass surface morphologies with high transmittance and better step coverage of AZO films for the a-Si TFSCs. The SF6/Ar plasma etching of glass substrates was used for the high roughness and haze ratio while wet (Buffered Hydro Fluoric acid (BHF)) chemical etching was performed for the better step coverage by controlling the shape of textured glass surface morphology. The pyramid shaped textured glass surface morphologies offered the lowest sheet resistance, high transmittance and roughness for the RF magnetron sputtered AZO films. The AZO films showed the highest total transmittance and haze ratio of 90.19% and 54.29% in the visible wavelength region with lowest sheet resistance of 6.242 Ω/□ for 800 nm thickness. The AZO films deposited on the pyramid glass surface showed the better step coverage. The minor variation in sheet resistance and resistivity of the AZO films was related to the step coverage of the AZO films that is closely related with the shape and angle of the surface morphology. The AZO films with low sheet resistance, high transmittance and step coverage can be employed to improve the performance of future a-Si thin film solar cells.

Study on the Structural and Mechanical Characteristics of ITO Films Deposited by Pulsed DC Magnetron Sputtering

The mechanical properties of ITO films such as adhesion and internal stress are very important for the commercial application of solar cell devices. We report high quality pulsed DC magnetron sputtered ITO films deposited on silicon and glass substrates with low resistivity and high transmittance for various working pressures ranging from 0.96 to 3.0 mTorr. ITO films showed the lowest resistivity of 2.68×10-4 Ω·cm, high hall mobility of 46.89 cm2/V.s, and high transmittance (>85%) for the ITO films deposited at a low working pressure of 0.99 mTorr. The ITO films deposited at a low working (0.96 mTorr) pressure had both amorphous and polycrystalline structures and were found to have compressive stress while the ITO films deposited at higher temperature than 0.99 mTorr was mixture of amorphous and polycrystalline and was found to have tensile stress.