Hyeongsik Park

Rubbing-free, vertically aligned nematic liquid crystal display controlled by in-plane field

We fabricated a homeotropically aligned nematic liquid crystal display with positive dielectric anisotropy, whose on and off states are controlled by in-plane field. The rubbing-free device, dark in voltage-off state, reveals bright uniformity in all directions due to the dual domainlike director configuration in the voltage-on state. The electro-optic characteristics of one prototype with excellent viewing angles are reported herein.

Influence of SnO2:F/ZnO:Al bi-layer as a front electrode on the properties of p-i-n amorphous silicon based thin film solar cells

The effect of aluminum doped zinc oxide film used between a fluorine doped tin oxide layer and a hydrogenated amorphous silicon carbide layer to improve the open circuit voltage (Voc) and fill factor (FF) for high efficiency thin film solar cells. The efficiency enhancement was accomplished by the insertion of high work-function layers engineered in the interfaces to raise FF as well as Voc. Therefore, we were able to obtain the conversion efficiency of 10.34% at 16.14 mA/cm2 of the current density (Jsc) and 70.37% of FF.

The mechanisms of negative oxygen ion formation from Al-doped ZnO target and the improvements in electrical and optical properties of thin films using off-axis dc magnetron sputtering at low temperature

Transparent conducting aluminum-doped zinc oxide (AZO) films have been prepared on glass substrates by dc magnetron sputtering using ceramic ZnO with 2 wt% Al2O3 target. The mechanism of negative oxygen ion generation on an AZO target surface and its influence on the conductivity of films were discussed. The negative ion generation on an AZO target was contributed by the surface ionization leading to the spot emission from Al atoms adsorbed on the AZO target surface. The contribution of negative ions’ current was mainly from the erosion area of the target due to its higher temperature. To reduce the damage caused by negative ion bombardment to film growth, an off-axis sputtering system was proposed, where the substrates were placed perpendicular to the target. The effects of distance (d) on the electrical properties of films were experimentally verified in detail. A low resistivity of 3.7 × 10 −4 � cm, an average transmittance above 85% in the visible range (300‐800 nm) and reflectance higher than 85% in the infrared range (2500‐4000 nm) were obtained for the films deposited at d = 2.5 cm. The overall analysis revealed that the generation of negative ions on the AZO target has a great influence on film growth, especially in the ultra-low pressure deposition process. Our work demonstrates the feasibility of reducing the negative effects of ion bombardment on the quality of films, which would be of great merit for industrial applications. (Some figures in this article are in colour only in the electronic version)

Impedance Spectroscopic Study of p-i-n Type a-Si Solar Cell by Doping Variation of p-Type Layer

We investigated p-i-n type amorphous silicon (a-Si) solar cell where the diborane flow rate of the p-type layer was varied and the solar cell was measured static/dynamic characteristics. The p/i interface of the thin film amorphous silicon solar cells was studied in terms of the coordination number of boron atoms in the p layer. p-type layer and p/i interface properties were obtained from the X-ray photoelectron spectroscopy (XPS) and impedance spectroscopy. One of the solar cells shows open circuit voltage (𝑉oc)=880 mV, short circuit current density (𝐽sc)=14.21 mA/cm2, fill factor (FF)=72.03%, and efficiency (𝜂)=8.8% while the p-type layer was doped with 0.1%. The impedance spectroscopic measurement showed that the diode ideality factor and built-in potential changed with change in diborane flow rate.

RF magnetron sputtered ITO:Zr thin films for the high efficiency a-Si:H/c-Si heterojunction solar cells

ITO and ITO:Zr films with various thicknesses were prepared on glass substrates by RF magnetron sputtering. We observed a decrease in sheet resistance with increasing film thickness that in good agreement with Fuchs-Sondheimer theory. The ITO films doped with ZrO2 (∼0.2 wt%) showed improvement in some of the electrical and optical properties of ITO films. The surface roughness of ITO:Zr films increased with increasing film thickness. ITO:Zr films with thickness of 120 nm showed highest work function of 5.13 eV, as estimated from XPS data. The ITO:Zr films were employed as front electrodes in HIT solar cells; the best device performance was found to be: Voc = 710 mV, Jsc = 34.44 mA/cm2, FF = 74.8%, η = 18.30% at a thickness of 120 nm. A maximum quantum efficiency (QE) of 89% was recorded for HIT solar cells at a wavelength of 700 nm for 120 nm thick ITO:Zr films.

Plasma Textured Glass Surface Morphologies for Amorphous Silicon Thin Film Solar Cells-A review

Copyright ©2016 KIEEME. All rights reserved. This is an open-access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/3.0) which permits unrestricted noncommercial use, distribution, and reproduction in any medium, provided the original work is properly cited. pISSN: 1229-7607 eISSN: 2092-7592 DOI: http://dx.doi.org/10.4313/TEEM.2016.17.2.98 OAK Central: http://central.oak.go.kr

Effect of wet textured glass surface morphology on the haze ratio and aspect ratio for amorphous silicon thin film solar cells

The impact of controlling the aspect ratio variation on glass substrate for a p-i-n a-Si:H solar cell was investigated and reported. Compared to a flat glass substrate (Corning Eagle XG), we demonstrate an increase of haze ratio from 1% to 79.1%, and an increment in the aspect ratio from 0.1 to 1.16, which is an increase to a high slope angle, using wet chemical etching. Optical transmittance measurements show a major improvement of from 92% to 96% for a wavelength of between 300 and 1100 nm, compared to the reference flat glass. A p-i-n a-Si:H solar cell was simulated using Advanced Semiconductor Analysis simulation based on these haze ratio and aspect ratio results, and yielded an increase in short-circuit current density (Jsc) from 15.38 to 18.74 mA/cm2, as the aspect ratio was increased from 0.1 to 0.84.

Front and Back TCO Research Review of a-Si/c-Si Heterojunction with Intrinsic Thin Layer (HIT) Solar Cell

In this paper, we report a technical approach regarding an amorphous silicon (a-Si)/crystalline silicon (c-Si) heterojunction solar cell to solve the previous issues, and we investigate the applications of front and back transparent conductive oxides (TCOs) on this high-efficiency solar cell. The presentation of front and rear-emitter structure solar cells is included, and we investigate the TCO-material candidates for the Si heterojunction (SHJ) solar cell according to the electrical and optical properties. A high-quality TCO film is very important because it is linked to the efficiency of the c-Si-based silicon solar cell. The intention here is the applying of a high-efficiency SHJ solar cell by fabricating the high-quality TCO materials of the investigation of this study.

Fabrication of honeycomb textured glass substrate and nanotexturing of zinc oxide front electrode for its application in high efficiency thin film amorphous silicon solar cell

Abstract. A significant part of broad band sunlight remains unabsorbed in a simple structured amorphous silicon solar cell. This absorption can be enhanced by adopting a light-trapping scheme with the help of a textured front surface and back reflector. For this purpose, honeycomb-type texture was fabricated on a glass surface by chemical etching. A 3  μm×3  μm honeycomb patterned optical-mask was used to create an image-pattern of an etch-mask on the glass surfaces. We used 0.5% hydrofluoric acid (HF) as an etchant solution with an optimized etching time ranging between 25 and 28 min. This single textured glass shows an enhancement in diffused transmission of light. In solar cell application, a 630-nm-thick Al-doped ZnO (AZO) layer was deposited over the textured glass surface. An additional random etching was carried out on the AZO with 1% HF acid solution for 10 s. This results to a double textured AZO superstrate on which solar cells were fabricated. The solar cells show higher short circuit current density to 17.2  mA/cm2. Finally, we obtained photovoltaic conversion efficiency of an optimized solar cell as 10.75% (with the corresponding Jsc as 17.03  mA/cm2).

The Compromise Condition for High Performance of the Single Silicon Heterojunction Solar Cells

For optimum performance of the hydrogenated amorphous silicon/crystalline silicon (a-Si : H/c-Si) heterojunction solar cells, featuring a doping concentration, localized states, as well as thickness of emitter layer are crucial, since Fermi level, surface passivated quality, and light absorption have to be compromised themselves. For this purpose, the effect of both doping concentration and thickness of emitter layer was investigated. It was found that with gas phase doping concentration and emitter layer thickness of 3% and 7 nm, solar cell efficiency in excess of 14.6% can be achieved. For high gas phase doping concentration, the degradation of open-circuit voltage as well as cell efficiency was obtained due to the higher disorder in the emitter layer. The heavily doped along with thicker in thickness of emitter layer results in light absorption on short wavelength, then diminishing short-circuit current density.